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Hong Yee Low, Singapore SG

Hong Yee Low, Singapore SG

Patent application numberDescriptionPublished
20090047478Hierarchical Nanopatters by Nanoimprint Lithography - A method for forming hierarchical patterns on an article by nanoimprinting is disclosed. The method includes using a first mould to form a primary pattern on the article at a first temperature and a first pressure, the first temperature and the first pressure being able to reduce the elastic modulus of the article; and using a second mould to form a second pattern on the primary pattern at a second temperature that is below the article's glass transition temperature, the forming of the second pattern being at a second pressure.02-19-2009
20090298712ARRAY OF MICROCAPSULES FOR CONTROLLED LOADING OF MACROMOLECULES, NANOPARTICLES AND OTHER NANOSCALE ITEMS AND A METHOD OF FABRICATING IT - The invention provides a microcapsule array comprising a plurality of microcapsules immobilised on a surface, optionally in microwells in said surface. Each of the microcapsules comprises an outer layer or shell defining a microcapsule interior, said outer layer having a permeability towards a nanoscale species which is dependent on an environmental condition to which said array is exposed.12-03-2009
20100129608Modification of Surface Wetting Properties of a Substrate - A method of modifying the wetting properties of the surface of a substrate, the method comprising the step of applying a first mold having an imprint forming surface to said substrate to form a first imprint thereon, said imprint forming surface being chosen to modify the wetting properties of the substrate surface.05-27-2010
20100193993METHOD OF MAKING A SECONDARY IMPRINT ON AN IMPRINTED POLYMER - There is disclosed a method of making an imprint on a polymer structure comprising the step of pressing a mold having a defined surface pattern against the surface of a primary imprint of a polymer structure to form a secondary imprint thereon.08-05-2010
20100291723METHOD OF MANUFACTURING AN ORGANIC ELECTRONIC OR OPTOELECTRONIC DEVICE - A method of manufacturing an organic electronic or optoelectronic device, the method comprising the steps of: (a) providing a substrate having a plurality of banks formed thereon with alternating well formations formed therebetween, the surface of said banks having imprint formations formed thereon of a dimension conferring a selected wetting property to the surface of said banks that is different from the surface of said wells; and (b) depositing an organic solution into said well formations, wherein the wetting property of said banks causes any organic solution deposited thereon to be at least partially repelled.11-18-2010
20110031658METHOD OF REDUCING THE DIMENSION OF AN IMPRINT STRUCTURE ON A SUBSTRATE - A method of reducing the dimension of an imprint structure on a substrate, the method comprising the steps of: 02-10-2011
20110140305METHOD OF LOW TEMPERATURE IMPRINTING PROCESS WITH HIGH PATTERN TRANSFER YIELD - The present invention is directed to novel methods of imprinting substrate-supported or freestanding structures at low cost, with high pattern transfer yield, and using low processing temperature. Such methods overcome many of the above-described limitations of the prior art. Generally, such methods of the present invention employ a sacrificial layer of film.06-16-2011
20110236639METHOD OF MAKING AN IMPRINT ON A POLYMER STRUCTURE - There is disclosed a method of making an imprint on a polymer structure comprising the steps of: a) providing an imprinted substrate mold having a defined imprinted surface pattern on a first side and a defined imprinted surface pattern on a second side, opposite to the first side; b) pressing a polymer structure against the first side of the imprinted substrate mold to form an imprint thereon; and c) pressing another polymer structure against the second side of the imprinted substrate mold to form an imprint thereon.09-29-2011

Patent applications by Hong Yee Low, Singapore SG