| Patent application number | Description | Published |
|---|
| 20080272275 | Optical devices and related systems and methods - The disclosure relates to a light beam intensity non-uniformity correction device that includes an optical element having a light entrance face with an antireflective property. According to the invention the antireflective property is locally amended in order to enhance light beam intensity uniformity. The disclosure further relates to a method for amending intensity distribution of a light beam in an optical system having one or more optical elements, where the method includes: a) assembling the optical system with the one or more optical elements arranged in predetermined positions, b) measuring intensity distribution, c) calculating locally required increase or decrease in absorption and/or reflection of one of the optical elements to amend measured intensity distribution into a predetermined intensity distribution, d) removing the optical element from the optical system, e) locally amending absorption and/or reflection of the one of the optical elements according to the calculation, f) installing the optical element in the predetermined position in the optical system. | 11-06-2008 |
| 20090002833 | Optical System and Method for Shaping a Profile of a Laser Beam - An optical system for shaping an incoming beam having a divergence with an angular distribution at least in a first direction comprises at least one angle selective optical element for clipping the angular distribution in the at least first direction. The approach according to the present invention bases on using an angle-selective device operated by the principle of total internal reflection to reduce divergence of the incoming beam, in contrast to a spatially-selective device as for example a field-stop or slit. The method according to the present invention has the advantage that no physical sharp edges have to be exposed at high energy densities. Thus, thermal impact and demands on the optical elements to withstand a high power laser beam are significantly reduced. | 01-01-2009 |
| 20090103196 | Optical Delay Module for Lengthening the Propagation Path of a Light Beam and Pulse Multiplication or Elongation Module - The invention relates to an optical delay module for lengthening the propagation path of a light beam comprises a first spherical mirror and a second spherical mirror, the first spherical mirror and the second spherical mirror having equal radii of curvature, the first and the second mirror being arranged on a common axis of symmetry with concave sides of the first and second mirrors being situated opposite one another at a distance from one another which corresponds to the radii of curvature of the first and second mirrors. The module also includes a coupling-in area for coupling the light beam into a space between the first and second mirrors and a coupling-out area for coupling the light beam out of the space between the first and second mirrors. The propagation path of the light beam between the coupling-in area and the coupling-out area corresponding at least approximately to quadruple the mirror distance, at least one optical arrangement arranged between the first and second mirrors, the optical arrangement being arranged to transfer the light beam between the first and second mirrors in such a way that the propagation path of the light beam without masking out of beam parts between the coupling-in area and the coupling-out area corresponds approximately to 2N times the mirror distance, where N is an integer >2. | 04-23-2009 |
| 20090231718 | OPTICAL ILLUMINATION SYSTEM FOR CREATING A LINE BEAM - In one aspect, the disclosure features an optical system configured to create from a beam of light an intensity distribution on a surface, whereby the optical system comprises at least a first optical element which splits the incident beam into a plurality of beams some of which at least partially overlap in a first direction on said surface and whereby the optical system further comprises at least a second optical element which displaces at least one of said beams in a second direction on said surface. | 09-17-2009 |
| 20090244712 | OPTICAL SYSTEM AND METHOD FOR SHAPING A PROFILE OF ALASER BEAM - An optical system for shaping an incoming beam having a divergence with an angular distribution at least in a first direction comprises at least one angle selective optical element ( | 10-01-2009 |
| 20100024865 | CONTINUOUS COATING INSTALLATION, METHODS FOR PRODUCING CRYSTALLINE SOLAR CELLS, AND SOLAR CELL - A continuous coating installation is disclosed. The installation includes a vacuum chamber having a supply opening for supplying a substrate to be coated and a discharge opening for discharging the coated substrate. The installation also includes a physical vapour deposition device for coating a surface of the substrate, and a laser crystallization system for simultaneously illuminating at least one sub-partial area of a currently coated partial area of the surface of the substrate with at least one laser beam. The installation further includes a transport device for transporting the substrate in a feedthrough direction from the supply opening to the discharge opening and for continuously or discontinuously moving the substrate during the coating thereof in the feedthrough direction. | 02-04-2010 |
| 20100079765 | METHOD FOR MEASURING A SPECTRUM OF A NARROWBAND LIGHT SOURCE, AND SPECTROMETER ARRANGEMENT - A spectrometer arrangement for measuring a spectrum of a light beam emitted by a narrowband light source, such as a bandwidth-narrowed laser, includes at least one etalon, a beam splitter for splitting the light beam into a first partial beam and a second partial beam, one or more optical directing elements for directing the first partial beam n times and the second partial beam (n+k) times through the at least one etalon, wherein n and k are integers ≧1. The spectrometer arrangement further has at least one light-sensitive detector and an evaluation device for evaluating the spectra—recorded by the at least one detector—of the first partial beam that has passed through the at least one etalon n times and of the second partial beam that has passed through the at least one etalon (n+k) times in order to determine the light spectrum corrected for the apparatus function of the at least one etalon. | 04-01-2010 |
