Holfeld
Christian Holfeld, Dresden DE
Patent application number | Description | Published |
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20080318138 | EUV Mask and Method for Repairing an EUV Mask - An EUV mask comprises a substrate, a reflective multilayer on the substrate, a phase-shifting material disposed above the multilayer in at least one first portion of the substrate, and a masking material disposed above the multilayer in second portions of the substrate and corresponding to mask patterns of an EUV mask. There is also provided a method for repairing an EUV mask including a substrate, a reflective multilayer on the substrate and at least one defect beneath or within the multilayer. The method includes the steps of determining the position of a defect area of the substrate, in which a phase-shift difference of an exposure radiation is caused by the defect, and depositing a phase-shifting material above the multilayer in at least one first portion of the substrate, the first portion at least partially comprising the defect area. | 12-25-2008 |
Donald R. Holfeld, Mount Laurel, NJ US
Patent application number | Description | Published |
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20100237857 | STRINGLINE AND CROSS-LEVEL GAUGE - A tool and method for inspecting a track having a first rail and a second rail. The tool has a first mounting device which is attached to a first rail of the track. A cord attached to the mounting device is tensioned and positioning the cord in a proper position, allowing an inspector to measure a first distance between a defined point on the cord and the first rail or the second rail to determine if anomalies are present in the track. | 09-23-2010 |
Georg Holfeld, Dresden DE
Patent application number | Description | Published |
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20120267694 | INTEGRATED CIRCUIT ARRANGEMENTS - An integrated circuit arrangement is provided, including a transistor including a gate region; and a wavelength conversion element, wherein the wavelength conversion element may include the same material or same materials as the gate region of the transistor. | 10-25-2012 |
Joerg Holfeld, Dresden DE
Patent application number | Description | Published |
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20100272169 | COMPENSATING CARRIER FREQUENCY OFFSETS IN OFDM SYSTEMS - In an OFDM system a plurality of subcarriers interferes with a considered subcarrier in case of carrier frequency offsets. A method and a corresponding receiver topology are disclosed for reducing the interference caused by frequency offsets of the subcarriers, wherein in a decision feedback equalizer the resources for computing the interference of subcarriers are adaptively allocated, such that only the most interfering subcarriers are considered when subtracting the interfering symbols from considered subcarrier symbols. | 10-28-2010 |
Johannes Holfeld, Vienna AT
Patent application number | Description | Published |
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20110177576 | SHOCK WAVE CELL TREATMENT DEVICE AND METHOD TO ENHANCE CELL REPLICATION | 07-21-2011 |