Patent application number | Description | Published |
20090000707 | SEMI-SOLID PROCESSING OF BULK METALLIC GLASS MATRIX COMPOSITES - A method of forming bulk metallic glass engineering materials, and more particularly a method for forming coarsening microstructures within said engineering materials is provided. Specifically, the method forms ‘designed composites’ by introducing ‘soft’ elastic/plastic inhomogeneities in a metallic glass matrix to initiate local shear banding around the inhomogeneity, and matching of microstructural length scales (for example, L and S) to the characteristic length scale R | 01-01-2009 |
20110203704 | BULK METALLIC GLASS MATRIX COMPOSITES - A method of forming bulk metallic glass engineering materials, and more particularly a method for forming coarsening microstructures within said engineering materials is provided. Specifically, the method forms ‘designed composites’ by introducing ‘soft’ elastic/plastic inhomogeneities in a metallic glass matrix to initiate local shear banding around the inhomogeneity, and matching of microstructural length scales (for example, L and S) to the characteristic length scale R | 08-25-2011 |
20120288728 | Thermoplastic Joining and Assembly of Bulk Metallic Glass Composites Through Capacitive Discharge - Systems and methods for joining BMG Composites are disclosed. Specifically, the joining of BMG Composites is implemented so as to preserve the amorphicity of their matrix phase and the microstructure of their particulate phase. Implementation of the joining method with respect to the construction of modular cellular structures that comprise BMG Composites is also discussed. | 11-15-2012 |
20130025746 | TWIN ROLL SHEET CASTING OF BULK METALLIC GLASSES AND COMPOSITES IN AN INERT ENVIRONMENT - Sheet casting of metallic glasses and twin roll sheet casting of bulk metallic glasses and composite in an inert environment. Samples may be heated by RF to a temperature in the semi-solid region. After semi-solid processing, the partial liquid then may be poured or injected to achieve the desired shape. Plates of metallic glasses and/or metallic glass matrix composites may be formed (for example, through diecasting) and serve as a pre-form for rolling. In this configuration, the plates may be lowered through a radio frequency coil into compressing wheels, directly next to or below the coil. As the plates pass through the coil they may heat to above the glass transition temperature. Next, they may be fed into the rolling wheel to thermoplasically form the plates into thinner sheets. | 01-31-2013 |
20130139964 | AMORPHOUS METALS AND COMPOSITES AS MIRRORS AND MIRROR ASSEMBLIES - A mirror or mirror assembly fabricated by molding, pressing, assembling, or depositing one or more bulk metal glass (BMG), bulk metal glass composite (BMGMC), or amorphous metal (AM) parts and where the optical surface and backing of the mirror can be fabricated without machining or polishing by utilizing the unique molding capabilities of this class of materials. | 06-06-2013 |
20140020794 | SYSTEMS AND METHODS FOR IMPLEMENTING BULK METALLIC GLASS-BASED MACROSCALE COMPLIANT MECHANISMS - Systems and methods in accordance with embodiments of the invention implement bulk metallic glass-based macroscale compliant mechanisms. In one embodiment, a bulk metallic glass-based macroscale compliant mechanism includes: a flexible member that is strained during the normal operation of the compliant mechanism; where the flexible member has a thickness of 0.5 mm; where the flexible member comprises a bulk metallic glass-based material; and where the bulk metallic glass-based material can survive a fatigue test that includes 1000 cycles under a bending loading mode at an applied stress to ultimate strength ratio of 0.25. | 01-23-2014 |
20140093674 | SYSTEMS AND METHODS IMPLEMENTING WEAR-RESISTANT COPPER-BASED MATERIALS - Systems and methods in accordance with embodiments of the invention implement copper-based materials in applications where resistance to wear is desired. In one embodiment, a wear-resistant gear includes a gear defined by a rotatable body having teeth disposed on an outer surface of the rotatable body, where the gear body is formed at least in part from a material including copper and X, where X is one of zirconium, titanium, hafnium, rutherfordium, and mixtures thereof and where the atomic ratio of copper to X is approximately between 2:3 and 3:2. | 04-03-2014 |
20140202595 | SYSTEMS AND METHODS FOR FABRICATING OBJECTS INCLUDING AMORPHOUS METAL USING TECHNIQUES AKIN TO ADDITIVE MANUFACTURING - Systems and methods in accordance with embodiments of the invention fabricate objects including amorphous metals using techniques akin to additive manufacturing. In one embodiment, a method of fabricating an object that includes an amorphous metal includes: applying a first layer of molten metallic alloy to a surface; cooling the first layer of molten metallic alloy such that it solidifies and thereby forms a first layer including amorphous metal; subsequently applying at least one layer of molten metallic alloy onto a layer including amorphous metal; cooling each subsequently applied layer of molten metallic alloy such that it solidifies and thereby forms a layer including amorphous metal prior to the application of any adjacent layer of molten metallic alloy; where the aggregate of the solidified layers including amorphous metal forms a desired shape in the object to be fabricated; and removing at least the first layer including amorphous metal from the surface. | 07-24-2014 |
20150047463 | SYSTEMS AND METHODS FOR IMPLEMENTING BULK METALLIC GLASS-BASED MACROSCALE GEARS - Systems and methods in accordance with embodiments of the invention implement bulk metallic glass-based macroscale gears. In one embodiment, a method of fabricating a bulk metallic glass-based macroscale gear, where at least either the thickness of the gear is greater than 3 mm or the diameter of the gear is greater than 9 mm, includes: obtaining design parameters of the gear to be formed; selecting a bulk metallic glass from which the gear will be formed based on the obtained design parameters, where the selected bulk metallic glass is characterized by a resistance to standard modes of wear and a resistance to brittle fracture such that a gear can be formed from the selected bulk metallic glass that accords with the obtained design parameters; and fabricating the gear from the selected bulk metallic glass that accords with the obtained design parameters. | 02-19-2015 |
Patent application number | Description | Published |
20140246809 | SYSTEMS AND METHODS IMPLEMENTING ADDITIVE MANUFACTURING PROCESSES THAT UTILIZE MULTIPLE BUILD HEADS - Systems and methods in accordance with embodiments implement additive manufacturing processes that utilize multiple build heads. In one embodiment, an additive manufacturing apparatus includes: a plurality of build heads, each of which being adapted to cause the formation of a structure onto a surface; a substrate; and a translation system, where the translation system is associated with at least one of the plurality of build heads and the substrate, such that the spatial relationship between the plurality of build heads and the substrate can be controlled. | 09-04-2014 |
20140312098 | SYSTEMS AND METHODS FOR FABRICATING STRUCTURES INCLUDING METALLIC GLASS-BASED MATERIALS USING ULTRASONIC WELDING - Systems and methods in accordance with embodiments of the invention fabricate objects including metallic glass-based materials using ultrasonic welding. In one embodiment, a method of fabricating an object that includes a metallic glass-based material includes: ultrasonically welding at least one ribbon to a surface; where at least one ribbon that is ultrasonically welded to a surface has a thickness of less than approximately 150 μm; and where at least one ribbon that is ultrasonically welded to a surface includes a metallic glass-based material. | 10-23-2014 |
20140342179 | SYSTEMS AND METHODS FOR SHAPING SHEET MATERIALS THAT INCLUDE METALLIC GLASS-BASED MATERIALS - Systems and methods in accordance with embodiments of the invention advantageously shape sheet materials that include metallic glass-based materials. In one embodiment, a method of shaping a sheet of material including a metallic glass-based material includes: heating a metallic glass-based material within a first region within a sheet of material to a temperature greater than the glass transition temperature of the metallic glass-based material; where the sheet of material has a thickness of between 0.1 mm and 10 mm; where at least some portion of the sheet of material does not include metallic glass-based material that is heated above its respective glass transition temperature when the metallic glass-based material within the first region is heated above its respective glass transition temperature; and deforming the metallic glass-based material within the first region while the temperature of the metallic glass-based material within the first region is greater than its respective glass transition temperature. | 11-20-2014 |
20150014885 | SYSTEMS AND METHODS FOR ADDITIVE MANUFACTURING PROCESSES THAT STRATEGICALLY BUILDUP OBJECTS - Systems and methods in accordance with embodiments of the invention implement additive manufacturing techniques that employ different sets of deposition characteristics and/or material formation characteristics during the additive manufacture of an object so as to strategically build up the object. In many embodiments, material used to build up an object is deposited at different deposition rates during the additive manufacture of the object, and the object is thereby strategically built up. In one embodiment, a method of additively manufacturing an object includes: depositing material onto a surface at a first deposition rate so as to define a first region of the object to be additively manufactured; and depositing material onto a surface at a second deposition rate so as to define a second region of the object to be additively manufactured; where the second deposition rate is different from the first deposition rate. | 01-15-2015 |
20150044084 | METHODS FOR FABRICATING GRADIENT ALLOY ARTICLES WITH MULTI-FUNCTIONAL PROPERTIES - Systems and methods for fabricating multi-functional articles comprised of additively formed gradient materials are provided. The fabrication of multi-functional articles using the additive deposition of gradient alloys represents a paradigm shift from the traditional way that metal alloys and metal/metal alloy parts are fabricated. Since a gradient alloy that transitions from one metal to a different metal cannot be fabricated through any conventional metallurgy techniques, the technique presents many applications. Moreover, the embodiments described identify a broad range of properties and applications. | 02-12-2015 |
20150075744 | SYSTEMS AND METHODS FOR FABRICATING STRUCTURES INCLUDING METALLIC GLASS-BASED MATERIALS USING LOW PRESSURE CASTING - Systems and methods in accordance with embodiments of the invention fabricate objects including metallic glass-based materials using low-pressure casting techniques. In one embodiment, a method of fabricating an object that includes a metallic glass-based material includes: introducing molten alloy into a mold cavity defined by a mold using a low enough pressure such that the molten alloy does not conform to features of the mold cavity that are smaller than 100 μm; and cooling the molten alloy such that it solidifies, the solid including a metallic glass-based material. | 03-19-2015 |
Patent application number | Description | Published |
20090113555 | DVD Replications System and Method - A system and method for replicating protected content on media includes a controller for enabling replicating of media content from partial encoded content received at a location of the controller. A media recorder is coupled to the controller and including a modulation process ( | 04-30-2009 |
20090122684 | Disc Authentication by Grayscale Image in Data Area Obtained by Modulation Rule Variation (Old Title) - The present principles provide a way to place a multilevel grayscale image, visible with the bare eye in the data area of an optical disc. This feature can be used to authenticate a legitimate disc, since the image features are lost when copying a disc either with a PC recording drive or by a pirate creating a data set to be used on a laser beam recorder to produce forged ROM discs. The modulation rules are selectively varied during disc writing in a way to change the distribution of pit/land lengths, so that the at three (3) different diffraction properties are generated, and therefore produce at least three (3) distinct looks to the bare eye. | 05-14-2009 |
20100183895 | DUAL METAL OPTICAL DISCS - An optical disc having at least two metal-containing layers with different compositions and partially overlapping areal extents in the plane of the disc and method of forming the disc are described. The optical disc with dual metallization exhibits visually distinct regions suitable for use for identification purposes. | 07-22-2010 |
20100188272 | Method and apparatus for embedding second code into optical disc data by data modulation rule variation - There are provided a method and apparatus for embedding a second level code into a first level code of an optical disc by data modulation rule variation. The apparatus includes a multi-level, varying rule based modulator ( | 07-29-2010 |
20100322055 | OPTICAL DISC WITH PRE-RECORDED AND RECORDABLE REGIONS AND METHOD OF FORMING THE DISC - An optical disc having a region with pre-recorded data and a recordable region, a method of fabricating the disc, a stamper for forming a disc master, and a recording device for use with the disc are disclosed. Data recorded in the recordable region may be used for activation of the disc, providing unique identification or enhancing program content on the disc. | 12-23-2010 |
20130234364 | OPTICALLY VARIABLE DEVICE MASTERING SYSTEM, METHOD OF AUTHENTICATING ARTICLES EMPLOYING THE SAME, AND RESULTANT ARTICLE - A method is provided for mastering optically variable devices (OVDs) used to authenticate optical discs. The method generally includes the steps of providing a laser beam recorder (LBR), introducing a substrate to the LBR, and exposing a portion of the substrate to the LBR, The mastering system thus includes the LBR, which has a laser that emits a beam, a processor or computer for programming or otherwise controlling the beam in order to expose the substrate and create the desired optical effect. Depending on the material used for the substrate, the exposure is then developed, if necessary, and processed to generate a master for the OVD. The OVD can then be replicated in order to provide authentic resultant products or articles, such as optical discs. | 09-12-2013 |
Patent application number | Description | Published |
20090238998 | COAXIAL MICROWAVE ASSISTED DEPOSITION AND ETCH SYSTEMS - Disclosed are systems for achieving improved film properties by introducing additional processing parameters, such as a movable position for the microwave source and pulsing power to the microwave source, and extending the operational ranges and processing windows with the assistance of the microwave source. A coaxial microwave antenna is used for radiating microwaves to assist in physical vapor deposition (PVD) or chemical vapor deposition (CVD) systems. The system may use a coaxial microwave antenna inside a processing chamber, with the antenna being movable between a substrate and a plasma source, such as a sputtering target, a planar capacitively generated plasma source, or an inductively coupled source. In a special case when only a microwave plasma source is present, the position of the microwave antenna is movable relative to a substrate. The coaxial microwave antenna adjacent to the plasma source can assist the ionization more homogeneously and allow substantially uniform deposition over large areas. | 09-24-2009 |
20100313951 | CARBON NANOTUBE-BASED SOLAR CELLS - Solar cells are provided with carbon nanotubes (CNTs) which are used: to define a micron/sub-micron geometry of the solar cells; and/or as charge transporters for efficiently removing charge carriers from the absorber layer to reduce the rate of electron-hole recombination in the absorber layer. A solar cell may comprise: a substrate; a multiplicity of areas of metal catalyst on the surface of the substrate; a multiplicity of carbon nanotube bundles formed on the multiplicity of areas of metal catalyst, each bundle including carbon nanotubes aligned roughly perpendicular to the surface of the substrate; and a photoactive solar cell layer formed over the carbon nanotube bundles and exposed surfaces of the substrate, wherein the photoactive solar cell layer is continuous over the carbon nanotube bundles and the exposed surfaces of the substrate. The photoactive solar cell layer may be comprised of amorphous silicon p/i/n thin films; although, concepts of the present invention are also applicable to solar cells with absorber layers of microcrystalline silicon, SiGe, carbon doped microcrystalline silicon, CIS, CIGS, CISSe and various p-type II-VI binary compounds and ternary and quaternary compounds. | 12-16-2010 |
20110131792 | SHADOW MASK ALIGNMENT AND MANAGEMENT SYSTEM - A magnetic handling assembly for thin-film processing of a substrate, a system and method for assembling and disassembling a shadow mask to cover a top of a workpiece for exposure to a processing condition. The assembly may include a magnetic handling carrier and a shadow mask disposed over, and magnetically coupled to, the magnetic handling carrier to cover a top of a workpiece that is to be disposed between the shadow mask and the magnetic handling carrier when exposed to a processing condition. A system includes a first chamber with a first support to hold the shadow mask, a second support to hold a handling carrier, and an alignment system to align the shadow mask a workpiece to be disposed between the carrier and shadow mask. The first and second supports are moveable relative to each other. | 06-09-2011 |
20110226617 | DIELECTRIC DEPOSITION USING A REMOTE PLASMA SOURCE - A sputter deposition system comprises a vacuum chamber including a vacuum pump for maintaining a vacuum in the vacuum chamber, a gas inlet for supplying process gases to the vacuum chamber, a sputter target and a substrate holder within the vacuum chamber, and a plasma source attached to the vacuum chamber and positioned remotely from the sputter target, the plasma source being configured to form a high density plasma beam extending into the vacuum chamber. The plasma source may include a rectangular cross-section source chamber, an electromagnet, and a radio frequency coil, wherein the rectangular cross-section source chamber and the radio frequency coil are configured to give the high density plasma beam an elongated ovate cross-section. Furthermore, the surface of the sputter target may be configured in a non-planar form to provide uniform plasma energy deposition into the target and/or uniform sputter deposition at the surface of a substrate on the substrate holder. The sputter deposition system may include a plasma spreading system for reshaping the high density plasma beam for complete and uniform coverage of the sputter target. | 09-22-2011 |
20120152727 | Alkali Metal Deposition System - A deposition system for alkali and alkaline earth metals may include a metal sputter target including cooling channels, a substrate holder configured to hold a substrate facing and parallel to the metal sputter target, and multiple power sources configured to apply energy to a plasma ignited between the substrate and the metal sputter target. The target may have a cover configured to fit over the target material, the cover may include a handle for automated removal and replacement of the cover within the deposition system, and a valve for providing access to the volume between the target material and the cover for pumping, purging or pressurizing the gas within the volume. Sputter gas may include noble gas with an atomic weight less than that of the metal target. | 06-21-2012 |
20130056347 | COOLING RING FOR PHYSICAL VAPOR DEPOSITION CHAMBER TARGET - Apparatus and method for physical vapor deposition are provided. In some embodiments, a cooling ring to cool a target in a physical vapor deposition chamber may include an annular body having a central opening; an inlet port coupled to the body; an outlet port coupled to the body; a coolant channel disposed in the body and having a first end coupled to the inlet port and a second end coupled to the outlet port; and a cap coupled to the body and substantially spanning the central opening, wherein the cap includes a center hole. | 03-07-2013 |
20130192524 | Continuous Substrate Processing System - A processing chamber having a plurality of movable substrate carriers stacked therein for continuously processing a plurality of substrates is provided. The movable substrate carrier is capable of being transported from outside of the processing chamber, e.g., being transferred from a load luck chamber, into the processing chamber and out of the processing chamber, e.g., being transferred into another load luck chamber. Process gases delivered into the processing chamber are spatially separated into a plurality of processing slots, and/or temporally controlled. The processing chamber can be part of a multi-chamber substrate processing system. | 08-01-2013 |
20130192761 | Rotary Substrate Processing System - A substrate processing system for processing multiple substrates is provided and generally includes at least one processing platform and at least one staging platform. Each substrate is positioned on a substrate carrier disposed on a substrate support assembly. Multiple substrate carriers, each is configured to carry a substrate thereon, are positioned on the surface of the substrate support assembly. The processing platform and the staging platform, each includes a separate substrate support assembly, which can be rotated by a separate rotary track mechanism. Each rotary track mechanism is capable of supporting the substrate support assembly and continuously rotating multiple substrates carried by the substrate carriers and disposed on the substrate support assembly. Each substrate is thus processed through at least one shower head station and at least one buffer station, which are positioned at a distance above the rotary track mechanism of the processing platform. Each substrate can be transferred between the processing platform and the staging platform and in and out the substrate processing system. | 08-01-2013 |
20130196078 | Multi-Chamber Substrate Processing System - A substrate processing system for processing multiple substrates is provided and generally includes at least one substrate processing platform and at least one substrate staging platform. The substrate processing platform includes a rotary track system capable of supporting multiple substrate support assemblies and continuously rotating the substrate support assemblies, each carrying a substrate thereon. Each substrate is positioned on a substrates support assembly disposed on the rotary track system and being processed through at least one shower head station and at least one buffer station, which are positioned atop the rotary track system of the substrate processing platform. Multiple substrates disposed on the substrate support assemblies are processed in and out the substrate processing platform. The substrate staging platform includes at least one dual-substrate processing station, each dual-substrate processing station includes two substrate support assemblies for supporting two substrates thereon. | 08-01-2013 |
20140038431 | APPARATUS AND METHODS FOR MICROWAVE PROCESSING OF SEMICONDUCTOR SUBSTRATES - Methods and apparatus for radiation processing of semiconductor substrates using microwave or millimeter wave energy are provided. The microwave or millimeter wave energy may have a frequency between about 600 MHz and about 1 THz. Alternating current from a magnetron is coupled to a leaky microwave emitter that has an inner conductor and an outer conductor, the outer conductor having openings with a dimension smaller than a wavelength of the emitted radiation. The inner and outer conductors are separated by an insulating material. Interference patterns produced by the microwave emissions may be uniformized by phase modulating the power to the emitter and/or by frequency modulating the frequency of the power itself. Power from a single generator may be divided to two or more emitters by a power divider. | 02-06-2014 |
20140071581 | PORTABLE ELECTROSTATIC CHUCK CARRIER FOR THIN SUBSTRATES - Embodiments of a portable electrostatic chuck for use in a substrate process chamber to support an ultra-thin substrate when disposed thereon are provided herein. In some embodiments, a portable electrostatic chuck may include a carrier comprising a dielectric material; an electrically conductive layer disposed on a top surface of the carrier; a dielectric layer disposed over the electrically conductive layer, such that the electrically conductive layer is disposed between the carrier and the dielectric layer; and at least one conductor coupled to the electrically conductive layer, wherein the portable electrostatic chuck is configured to electrostatically retain the ultra-thin substrate to the portable electrostatic chuck, wherein the portable electrostatic chuck is further configured to be handled and moved by substrate processing equipment outside of the substrate process chamber, and wherein the portable electrostatic chuck is sized to support large ultra-thin substrates. | 03-13-2014 |
20140268080 | PLANARIZED EXTREME ULTRAVIOLET LITHOGRAPHY BLANK, AND MANUFACTURING AND LITHOGRAPHY SYSTEMS THEREFOR - An integrated extreme ultraviolet (EUV) blank production system includes: a vacuum chamber for placing a substrate in a vacuum; a first deposition system for depositing a planarization layer having a planarized top surface over the substrate; and a second deposition system for depositing a multi-layer stack on the planarization layer without removing the substrate from the vacuum. The EUV blank is in an EUV lithography system includes: an extreme ultraviolet light source; a mirror for directing light from the EUV source; a reticle stage for placing a EUV mask blank with a planarization layer; and a wafer stage for placing a wafer. The EUV blank includes: a substrate; a planarization layer to compensate for imperfections related to the surface of the substrate, the planarization layer having a flat top surface; and a multi-layer stack on the planarization layer. | 09-18-2014 |
20140268081 | AMORPHOUS LAYER EXTREME ULTRAVIOLET LITHOGRAPHY BLANK, AND MANUFACTURING AND LITHOGRAPHY SYSTEMS THEREFOR - An integrated extreme ultraviolet blank production system includes: a vacuum chamber for placing a substrate in a vacuum; a deposition system for depositing a multi-layer stack without removing the substrate from the vacuum; and a treatment system for treating a layer on the multi-layer stack to be deposited as an amorphous metallic layer. A physical vapor deposition chamber for manufacturing an extreme ultraviolet mask blank includes: a target, comprising molybdenum alloyed with boron. An extreme ultraviolet lithography system includes: an extreme ultraviolet light source; a mirror for directing light from the extreme ultraviolet light source; a reticle stage for placing an extreme ultraviolet mask blank with a multi-layer stack having an amorphous metallic layer; and a wafer stage for placing a wafer. An extreme ultraviolet blank includes: a substrate; a multi-layer stack having an amorphous metallic layer; and capping layers over the multi-layer stack. | 09-18-2014 |
20140268083 | ULTRA-SMOOTH LAYER ULTRAVIOLET LITHOGRAPHY MIRRORS AND BLANKS, AND MANUFACTURING AND LITHOGRAPHY SYSTEMS THEREFOR - An extreme ultraviolet mirror or blank production system includes: a first deposition system for depositing a planarization layer over a semiconductor substrate; a second deposition system for depositing an ultra-smooth layer over the planarization layer, the ultra-smooth layer having reorganized molecules; and a third deposition system for depositing a multi-layer stack over the ultra-smooth layer. The extreme ultraviolet blank includes: a substrate; a planarization layer over the substrate; an ultra-smooth layer over the planarization layer, the ultra-smooth layer having reorganized molecules; a multi-layer stack; and capping layers over the multi-layer stack. An extreme ultraviolet lithography system includes: an extreme ultraviolet light source; a mirror for directing light from the extreme ultraviolet light source; a reticle stage for placing an extreme ultraviolet mask blank with a planarization layer and an ultra-smooth layer over the planarization layer; and a wafer stage for placing a wafer. | 09-18-2014 |
20140272684 | EXTREME ULTRAVIOLET LITHOGRAPHY MASK BLANK MANUFACTURING SYSTEM AND METHOD OF OPERATION THEREFOR - A processing system includes: a vacuum chamber; a plurality of processing systems attached around the vacuum chamber; and a wafer handling system in the vacuum chamber for moving the wafer among the plurality of processing systems without exiting from a vacuum. A physical vapor deposition system for manufacturing an extreme ultraviolet blank comprising: a target comprising molybdenum, molybdenum alloy, or a combination thereof. | 09-18-2014 |
20150235847 | GROWING GRAPHENE ON SUBSTRATES - Embodiments described herein provide methods and apparatus for forming graphitic carbon such as graphene on a substrate. The method includes providing a precursor comprising a linear conjugated hydrocarbon, depositing a hydrocarbon layer from the precursor on the substrate, and forming graphene from the hydrocarbon layer by applying energy to the substrate. The precursor may include template molecules such as polynuclear aromatics, and may be deposited on the substrate by spinning on, by spraying, by flowing, by dipping, or by condensing. The energy may be applied as radiant energy, thermal energy, or plasma energy. | 08-20-2015 |