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Hizawa

Shunichi Hizawa, Nagano-Ken JP

Patent application number	Description	Published
20110204091	Liquid Ejecting Apparatus - A waste liquid absorption material is laid within a waste liquid receptacle, and a portion of the waste liquid absorption material into which liquid flows is heated, causing the temperature of that portion to rise. This makes it possible to instigate a temperature difference between one side and the other side of capillary tubes within the waste liquid absorption material through which the liquid permeates, which makes it easy for the liquid to move from the high-temperature side to the low-temperature side of the waste liquid absorption material due to the thermocapillary phenomenon. This in turn makes it possible to increase the speed at which the liquid is absorbed by the waste liquid absorption material.	08-25-2011

Takeshi Hizawa, Sakura-Shi JP

Patent application number	Description	Published
20110071307	PROCESS FOR PRODUCING EPOXY (METHA)ACRYLATE - An object of the present invention is to provide a process for producing an epoxy (meth)acrylate safely with good productivity, and the invention provides a process for continuously producing an epoxy (meth)acrylate, containing causing a mixed liquid of a compound (A) having a carboxyl group and a (meth)acryloyl group and a compound (B) having an epoxy group to pass continuously and densely through a tubular microchannel formed in a heat-conducting reaction device, and reacting the carboxyl group of the compound (A) with the epoxy group of the compound (B), in which the tubular microchannel in the reaction device has a space size making a fluid cross-sectional area, through which the mixed liquid passes densely, of from 0.1 to 4.0 mm	03-24-2011
20110087041	PROCESS FOR PRODUCING URETHANE (METHA)ACRYLATE - An object of the present invention is to provide a process for producing a urethane (meth)acrylate safely with good productivity, and for achieving the object, the invention provides a process for continuously producing a urethane (meth)acrylate, containing causing a mixed liquid of a compound (A) having a hydroxyl group and a (meth)acryloyl group and a compound (B) having an isocyanate group to pass continuously and densely through a tubular microchannel formed in a heat-conducting reaction device, and reacting the hydroxyl group of the compound (A) with the isocyanate group of the compound (B), in which the tubular microchannel in the reaction device has a space size making a fluid cross-sectional area, through which the mixed liquid passes densely, of from 0.1 to 4.0 mm	04-14-2011

Takeshi Hizawa, Kanagawa JP

Patent application number	Description	Published
20080231253	Cumulative Chemical/Physical Phenomenon Detecting Apparatus - A sensitivity of a cumulative chemical/physical phenomenon detecting apparatus is improved. Prior to transferring charges at a sensing section to a floating diffusion section, the charges remaining at the sensing section are removed from the sensing section by a potential barrier formed between the sensing section and a charge injection adjusting section.	09-25-2008

Takeshi Hizawa, Mie-Gun JP

Patent application number	Description	Published
20120094493	METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE - A method of manufacturing a semiconductor device in which an insulating film is filled between patterns etched into a workpiece structure is disclosed. The method includes cleaning etch residues residing between the etched patterns by a first chemical liquid; rinsing the workpiece structure cleaned by the first chemical liquid by a rinse liquid; and coating the workpiece structure rinsed by the rinse liquid with a coating liquid for formation of the insulating film. The cleaning to the coating are carried out within the same processing chamber such that a liquid constantly exists between the patterns of the workpiece structure.	04-19-2012