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Hitoshi Nakamura

Hitoshi Nakamura, Hachioji JP

Patent application numberDescriptionPublished
20090059985EL SEMICONDUCTOR DEVICE - An n-type cladding layer structure which has good luminescence properties without the use of substances corresponding to RoHS Directive and a high Cl-doping efficiency, i.e. which facilitates the manufacture of a semiconductor optical element and device with low crystal defects and high reliability, and an active layer and a p-type cladding layer therefor are provided. The n-type layer being lattice matched to an InP substrate and containing Group II-VI compound as a main ingredient is a Group II-VI compound semiconductor, in which the Group II elements consist of Mg, Zn, and Be and the Group VI elements consist of Se and Te. The n-type layer of the present invention is characterized by a large energy gap, high energy of the bottom of a conduction band that is effective for suppress the Type II luminescence, high carrier concentration, and low crystal defects attributed to a good quality crystallinity.03-05-2009
20090141763SEMICONDUCTOR LASER - There is disclosed a Be-containing II-VI group semiconductor laser that has a laminated structure formed on an InP substrate to continuously emit at room temperature without crystal degradation. A basic structure of the semiconductor laser is formed over the InP substrate by use of a lattice-matched II-VI group semiconductor including Be. An active layer and cladding layers are formed to be a double heterostructure with a type I band lineup, in order to increase the efficiency for injecting carriers into the active layer. The active layer and the cladding layers are also formed to enhance the light confinement to the active layer, in which the Mg composition of the p-type cladding layer is set to Mg<0.2.06-04-2009
20110096383LIGHT BEAM SCANNING IMAGE PROJECTION APPARATUS - The object of the invention included in the present application is to automatically prevent the deterioration of the image even when the image quality of the projected image is deteriorated due to the replacement of the light source or the like. The following light beam scanning image projection apparatus is one means for achieving the object. In the light beam scanning image projection apparatus including a plurality of light sources which emit the light beams of respectively different wavelengths, a driving section which modulates the intensity of each light beam in accordance with the image signal, the light axis alignment means which aligns the light axes of each light beam, and scanning means which scans the light beams, the light axis alignment means includes: a plurality of optical elements; and an adjusting section which adjusts at least one of a position and a gradient of at least one of the optical elements, and the light beam scanning image projection apparatus further includes: detecting means which detects a shift between a spot center of each light beam and a center reference point; and position correction means which controls the adjusting section based on a detection result in the detecting means to adjust at least one of the position and the gradient of at least one of the optical elements of the light axis alignment means, thereby aligning the light axes of each light beam.04-28-2011

Patent applications by Hitoshi Nakamura, Hachioji JP

Hitoshi Nakamura, Yokohama-Shi JP

Patent application numberDescriptionPublished
20100038249METHOD FOR REPROCESSING SPENT NUCLEAR FUEL AND CENTRIFUGAL EXTRACTOR THEREFOR - A spent nuclear fuel is reprocessed by dissolving a spent nuclear fuel in an aqueous nitric acid solution and separating and recovering nuclides contained in the resulting fuel solution by solvent extraction. A spent nuclear fuel reprocessing method includes: an electrolytic valence adjustment step in which nuclides contained in the fuel solution is electrolytically reduced without removing fission products or minor actinides until valence of plutonium is at a level at which solvent extraction efficiency is low by using the valence of plutonium contained in the fuel solution as a parameter; and a nuclide separation step in which, by using an extraction solvent which extracts uranium contained in the fuel solution, uranium is distributed from the fuel solution subjected to the electrolytic valence adjustment step to the extraction solvent.02-18-2010
20100314260PROCESS FOR PRODUCING RARE METAL AND PRODUCTION SYSTEM THEREOF - According to one embodiment, a process for producing rare metals includes the steps of: electrolyzing an electrolytic solution to extract a Re oxide at a cathode; recovering the Re oxide, and electrolyzing the Re oxide in a molten salt electrolyte to extract metallic Re; recovering a Nd containing residue solution; treating the Nd containing residue solution to produce Nd oxide; electrolyzing the Nd oxide in a molten salt electrolyte to extract metallic Nd; recovering a Dy containing residue solution; treating the Dy containing residue solution to produce Dy oxide; and electrolyzing the Dy oxide in a molten salt electrolyte to extract metallic Dy.12-16-2010
20110108434METHOD OF PRODUCING METAL ZIRCONIUM - An object of the present invention is to provide a method of producing metal zirconium, the method having a fewer steps and a smaller amount of secondary wastes generated, wherein the metal zirconium is obtained from a zirconium compound containing hafnium. A method of producing metal zirconium according to the present invention includes: a separation step of separating a hafnium oxychloride from a first substance containing a zirconium oxychloride and a hafnium oxychloride to obtain a second substance having a higher content of the zirconium oxychloride; a calcination step of calcining the second substance to obtain a third substance containing at least any of a zirconium oxychloride and a zirconium oxide; and a direct reduction step of holding the third substance in a molten salt with the third substance brought into contact with a cathode and applying a voltage between the cathode and an anode to directly reduce the third substance to obtain metal zirconium.05-12-2011

Patent applications by Hitoshi Nakamura, Yokohama-Shi JP

Hitoshi Nakamura, Tokyo JP

Patent application numberDescriptionPublished
20080199983METHOD FOR MANUFACTURING A SEMICONDUCTOR LASER - A method of manufacturing semiconductor laser device including a GaN wafer includes forming a semiconductor layer on the GaN wafer and on which ridge portions are formed. Grooves are formed in the semiconductor layer such that each groove is disposed in line with the scribe marks, between each of the ridge portions and an upstream scribe mark. The grooves are curved and convex outwardly towards a downstream side, and each groove has an apex on a cleavage line. The side extending from the apex preferably does not form an angle of 60 degrees with respect to a cleavage direction or the cleavage line.08-21-2008
20080247434SEMICONDUCTOR LIGHT-EMITTING DEVICE - A semiconductor light-emitting device capable of increasing the carrier concentration of a p-type cladding layer and improving light-emitting efficiency is provided. A semiconductor light-emitting device is made of a Group II-VI compound semiconductor, and the semiconductor light-emitting device includes an active layer between an n-type cladding layer and a p-type cladding layer, in which the active layer has a Type II superlattice structure, and the junctions between the active layer and the n-type cladding layer and between the active layer and the p-type cladding layer each have a Type I structure, and the p-type cladding layer includes tellurium (Te) as a Group VI element.10-09-2008
20080298415SEMICONDUCTOR DEVICE - A semiconductor device having high reliability, a long lifetime and superior light emitting characteristics by applying a novel material to a p-type cladding layer is provided. A semiconductor device includes a p-type semiconductor layer on an InP substrate, in which the p-type semiconductor layer has a laminate structure formed by alternately laminating a first semiconductor layer mainly including Be12-04-2008
20090111203METHOD FOR MANUFACTURING SEMICONDUCTOR LIGHT EMITTING DEVICE - A laminated structure having light-emitting units is formed on a single-crystal wafer. Electrode patterns are formed on the single-crystal wafer opposite the light-emitting units. Dummy patterns are formed on the single-crystal wafer at a location spaced apart from a location opposite the light-emitting units, and offset from a desired cleavage line intersecting the light-emitting units. A scratch is formed on the desired cleavage line. The wafer is cleaved, originating on the scratch, along the cleavage line orientation, in the direction from the dummy pattern, toward the light-emitting units.04-30-2009
20090309978Receiver, situation-of-installation notification method, and transmitting and receiving system - A receiver includes: a band detection unit that detects a frequency band within which the receiver can be connected to a transmitter by radio; a quality detection unit that detects the transmission quality level of video data, which is transmitted from the transmitter, using the frequency band detected by the band detection unit; and a notification unit that notifies an area in which the frequency band within which the receiver can be connected to the transmitter by radio is detected and the transmission quality level is detected to be higher than a predetermined threshold.12-17-2009
20100040103SEMICONDUCTOR DEVICE - The present invention provides a semiconductor device including: a semiconductor layer including an n-type first cladding layer, an n-type second cladding layer, an active layer, a p-type first cladding layer, and a p-type second cladding layer in this order on an InP substrate. The n-type first cladding layer and the n-type second cladding layer satisfy formulas (1) to (4) below, or the p-type first cladding layer and the p-type second cladding layer satisfy formulas (5) to (8) below.02-18-2010
20100248448METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES - A method of manufacturing semiconductor devices by cleaving a semiconductor wafer along a crystal orientation of the semiconductor wafer includes forming a semiconductor layer on the semiconductor wafer, forming an insulating film on the semiconductor layer such that the insulating film includes an insulating film thinned region extending parallel to the crystal orientation and that is thinner than other regions of the insulating film, forming an electrode on the insulating film and that crosses the insulating film thinned region, forming a cut in the insulating film thinned region, the cut serving as a starting point for cleaving, and cleaving the semiconductor wafer such that cleaving starts at the cut and propagates along the insulating film thinned region.09-30-2010

Patent applications by Hitoshi Nakamura, Tokyo JP

Hitoshi Nakamura, Fukuoka JP

Patent application numberDescriptionPublished
20100200619SLIDING NOZZLE DEVICE AND PLATE USED FOR THE DEVICE - It is intended to develop a technique of pressing and fixing a plate by a uniform force to suppress the occurrence of a crack around a nozzle hole of the plate during use, and provide a sliding nozzle device capable of improving durability of the plate, and a plate for use in the sliding nozzle device. The sliding nozzle device comprises a plate (08-12-2010

Hitoshi Nakamura, Otawara-Shi JP

Patent application numberDescriptionPublished
20100074394X-RAY COMPUTERIZED TOMOGRAPHY APPARATUS, BREATHING INDICATION APPARATUS AND MEDICAL IMAGING APPARATUS - An X-ray computed tomographic apparatus includes a gantry 03-25-2010

Hitoshi Nakamura, Kanagawa JP

Patent application numberDescriptionPublished
20090135548Positive Electrode for Electric Double Layer Capacitors, and Electric Double Layer Capacitors - The present invention provides a positive electrode for electric double layer capacitors which can improve basic characteristics, such as energy density, of electric double layer capacitors and also can improve electric double layer capacitors in useful life and stability under high temperatures. Provided is a positive electrode for electric double layer capacitors comprising as electrode active materials a carbonaceous material having a ratio of rhombohedral crystal structure to hexagonal crystal structure in crystal structure of carbon within the range of not less than 20%.05-28-2009
20090294299SPENT FUEL REPROCESSING METHOD - A spent fuel reprocessing method has a dissolution step of dissolving the spent fuel in nitric acid solution, an electrolysis/valence adjustment step of reducing Pu to trivalent, maintaining the pentavalent of Np, a uranium extraction step of collecting UO12-03-2009
20100008695IMAGE FORMING APPARATUS - An image forming apparatus having a liquid-cooled cooling system prevents problems caused by a potential leakage of coolant used in the liquid-cooled cooling system. The liquid-cooled cooling system cools a heat-generating image forming portion using the coolant, which is circulated by a pump through a circulating path. The cooling system includes a heat-receiving member disposed in thermal contact with the image forming portion to absorb heat generated by the image forming portion. The heat-receiving member is connected with the circulating path via a joint. The joint is disposed within an enclosed space between the image forming portion and an electrical component drive portion for driving or controlling the image forming portion, so that the image forming portion and the electrical component drive portion can be protected from the coolant in the event of coolant leakage via the joint.01-14-2010

Patent applications by Hitoshi Nakamura, Kanagawa JP

Hitoshi Nakamura, Chiba JP

Patent application numberDescriptionPublished
20090130618Castable Refractory - To provide a long-life refractory capable of maintaining durability under severe conditions. The castable refractory comprises a mixture containing at least one of 2 to 10 mass % of silicon carbide and 3 to 10 mass % of chamotte, as an auxiliary raw material, and a binder material, with the remaining balance being one or more main raw materials selected from corundum, mullite, bauxite, chamotte, talc and silica, and is used in an environment exposed to an alkali component-containing hot gas atmosphere. In an alkali component-containing gas atmosphere at a high temperature (750° C. or more), silicon carbide and/or chamotte are vitrified to a thickness of 1 mm or less in the surface layer of the refractory to prevent the alkali component-containing gas from intruding inside of the refractory.05-21-2009

Hitoshi Nakamura, Kyoto-Shi JP

Patent application numberDescriptionPublished
20080203654PAPER MULTI-FEED DETECTION APPARATUS AND PAPER MULTI-FEED DETECTION METHOD - A paper multi-feed detection apparatus and a paper multi-feed detection method are provided for preventing the detection capability from being deteriorated by a noise factor and improving the detection precision even where an area around the feeding path has no extra space in terms of the shape and there are many noise-generating factors because of a demand for a smaller size of the device. An ultrasonic transmission opening formed in one of two feeding guide plates is large so as to discharge outside a reflected wave which returns through the ultrasonic transmission opening, and an ultrasonic receiving opening formed in the other feeding guide plate is smaller than a receiving face area of a receiver for receiving the ultrasonic wave.08-28-2008

Hitoshi Nakamura, Kawasaki-Shi JP

Patent application numberDescriptionPublished
20110147572ROTARY ENCODER AND ROTATION MECHANISM INCLUDING THE SAME - A rotary encoder includes two first detection units disposed at positions that are symmetrical about a rotation axis, each of the first detection units outputting an incremental signal, and second detection unit that outputs an absolute signal φ06-23-2011

Hitoshi Nakamura, Nagasaki-Ken JP

Patent application numberDescriptionPublished
20120087839EXHAUST GAS TREATMENT SYSTEM - It is intended to provide an exhaust gas treatment system, which allows for VOC removal at lower temperatures and thereby improves the durability of catalysts and suppresses carbon monoxide generation at the final outlet of the system. The present invention provides a treatment system of an exhaust gas containing a nitrogen oxide, carbon monoxide, and a volatile organic compound comprising: an exhaust gas treatment means for removing the nitrogen oxide by reduction with ammonia and partially oxidizing the VOC to CO; and a CO/VOC removal means for oxidizing the CO and partially unreacted VOC, in this order from the upstream flow of the exhaust gas.04-12-2012