| Patent application number | Description | Published |
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| 20080274605 | METHOD OF MANUFACTURING SILICON NITRIDE FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE - A method of manufacturing a silicon nitride film that forms a silicon nitride film on a surface of a substrate comprises sequentially repeating first through third steps. The first step includes feeding a first gas containing silicon and nitrogen to the surface of the substrate. The second step includes feeding a second gas containing nitrogen to the surface of the substrate. The third step includes feeding a third gas containing hydrogen to the surface of the substrate. | 11-06-2008 |
| 20110039026 | FILM DEPOSITION APPARATUS, FILM DEPOSITION METHOD, AND COMPUTER READABLE STORAGE MEDIUM - A silicon oxide film is deposited by rotating a rotation table on which a wafer W is placed to allow BTBAS gas to be adsorbed on an upper surface of the wafer W and supply a O | 02-17-2011 |
| 20110104395 | FILM DEPOSITION APPARATUS, FILM DEPOSITION METHOD, AND STORAGE MEDIUM - In a film deposition apparatus where bis (tertiary-butylamino) silane (BTBAS) gas is adsorbed on a wafer and then O | 05-05-2011 |
| 20110139074 | FILM DEPOSITION APPARATUS - A film deposition apparatus includes a turntable provided in the chamber and having on a first surface a substrate receiving area in which a substrate is placed; first and second reaction gas supplying portions supplying first and second reaction gases to the first surface, respectively; a separation gas supplying portion provided between the first reaction gas supplying portion and the second reaction gas supplying portion and supplying a separation gas that separates the first reaction gas and the second reaction gas; an evacuation port that evacuates the chamber; a space defining member provided for at least one of the first and second reaction gas supplying portions and defining a first space between the at least one of the first and second reaction gas supplying portions and the turntable and a second space so that the separation gas is likely to flow through the second space rather than the first space. | 06-16-2011 |
| 20110155056 | FILM DEPOSITION APPARATUS - A film deposition apparatus has a vacuum chamber in which a turntable placing plural substrates is rotated, the plural substrates come into contact with plural reaction gases supplied to plural process areas and thin films are deposited on surfaces of the plural substrates, and has plural reaction gas supplying portions for supplying the plural processing gases, a separation gas supplying portion for supplying a separation gas and an evacuation mechanism for ejecting the plural processing gases and the separation gas, wherein the plural process areas includes a first process area for causing a first reaction gas to adsorb on the surfaces of the plural substrates, and a second process area, having an area larger than the first process area, for causing the first reaction gas having adsorbed the surfaces of the plural substrates and a second reaction gas to react, and depositing the films on the surfaces of the plural substrates. | 06-30-2011 |
| 20110155057 | PLASMA PROCESS APPARATUS - A plasma process apparatus for processing a substrate by using plasma including a vacuum chamber in which the processing of the substrate is performed, a turntable inside the vacuum chamber, the turntable having at least one substrate receiving area, a rotation mechanism rotating the turntable, a gas supplying part supplying plasma generation gas to the substrate receiving area, a main plasma generating part ionizing the plasma generation gas, being provided in a position opposite to a passing area of the substrate receiving area, and extending in a rod-like manner from a center portion of the turntable to an outer circumferential portion of the turntable, an auxiliary plasma generating part compensating for insufficient plasma of the main plasma generating part, the auxiliary plasma generating part being separated from the main plasma generating part in a circumferential direction of the vacuum chamber, and an evacuating part evacuating the vacuum chamber. | 06-30-2011 |
| 20110155062 | FILM DEPOSITION APPARATUS - A film deposition apparatus includes a turntable including a substrate placement region at its surface; first and second reaction gas supply parts disposed in first and second supply regions in a chamber and supplying first and second reaction gases onto the surface, respectively; a separation region disposed between the first and second supply regions, the separation region including a separation gas supply part ejecting a separation gas separating the first and second reaction gases and a ceiling surface forming a separation space to supply the separation gas to the first and second supply regions; and first and second evacuation ports provided for the first and second supply regions. At least one of the first and second evacuation ports is disposed so as to guide the separation gas, supplied to the corresponding supply region, toward and along a direction in which the corresponding reaction gas supply part extends. | 06-30-2011 |
| 20110159187 | FILM DEPOSITION APPARATUS AND FILM DEPOSITION METHOD - A film deposition apparatus includes a separation member that extends to cover a rotation center of the turntable and two different points on a circumference of the turntable above the turntable, thereby separating the inside of the chamber into a first area and a second area; a first reaction gas supplying portion that supplies a first reaction gas toward the turntable in the first area; a second reaction gas supplying portion that supplies a second reaction gas toward the turntable in the second area; a first evacuation port that evacuates the first reaction gas and the first separation gas that converges with the first reaction gas; and a second evacuation port that evacuates the second reaction gas and the first separation gas that converges with the second reaction gas. | 06-30-2011 |
| 20110159188 | FILM DEPOSITION APPARATUS, FILM DEPOSITION METHOD, AND COMPUTER-READABLE STORAGE MEDIUM - A film deposition apparatus rotates a turntable and each gas nozzle relatively to each other at a rotational speed of 100 rpm or higher when depositing a titanium nitride film, to speed up a reaction gas supply cycle or a film deposition cycle of a reaction product. A next film of the reaction product is deposited before the grain size of the reaction product already generated on a substrate surface begins to grow due to crystallization of the already generated reaction product. | 06-30-2011 |
| Patent application number | Description | Published |
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| 20080310876 | IMAGE FORMING SYSTEM AND MAINTENANCE EXECUTION PROGRAM - There is provided an image forming system that are capable of preventing a user or operator from forgetting to carry out a maintenance operation based on required sub-maintenance items after execution of a maintenance operation based on an associated maintenance item, such as component replacement, cleaning, or adjustment. A table of maintenance items and sub-maintenance items associated with respective ones of the maintenance items is stored in a ROM. When a CPU determines that a maintenance operation based on a selected one of the maintenance items has been completed, the CPU determines whether or not there is any sub-maintenance item associated with the selected maintenance item, by referring to the table. When it is determined that there is one or more sub-maintenance items associated with the selected maintenance item, a CPU provides control to display the sub-maintenance item or items in an operating/display unit. | 12-18-2008 |
| 20100226679 | IMAGE FORMING SYSTEM AND MAINTENANCE EXECUTION PROGRAM - There is provided an image forming system that are capable of preventing a user or operator from forgetting to carry out a maintenance operation based on required sub-maintenance items after execution of a maintenance operation based on an associated maintenance item, such as component replacement, cleaning, or adjustment. A table of maintenance items and sub-maintenance items associated with respective ones of the maintenance items is stored in a ROM. When a CPU determines that a maintenance operation based on a selected one of the maintenance items has been completed, the CPU determines whether or not there is any sub-maintenance item associated with the selected maintenance item, by referring to the table. When it is determined that there is one or more sub-maintenance items associated with the selected maintenance item, a CPU provides control to display the sub-maintenance item or items in an operating/display unit. | 09-09-2010 |
