| Patent application number | Description | Published |
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| 20090058594 | MANAGEMENT SYSTEM - A management system manages use of management object provided in facilities by using an information storage medium of a user. An entrance management apparatus, provided in the vicinity of an entrance of the facilities, stores use permission information for permitting the use of the management object on an information storage medium when the user enters the facilities. In the facilities, a use management apparatus, provided for each management object, controls availability or unavailability of the management object based on the use permission information stored on the information storage medium. Additionally, the use management apparatus stores, in the information storage medium, use information showing that the management object is used. Further, a room leaving management apparatus, provided in the vicinity of an exit of the facilities, manages leaving of the user based on the use information stored on the information storage medium. When the user leaves the facilities, it is controlled whether or not the user can leave the facilities, and use history information is stored, based on the use information. | 03-05-2009 |
| 20110093928 | MANAGEMENT SYSTEM - A management system manages use of management object provided in facilities by using an information storage medium of a user. An entrance management apparatus, provided in the vicinity of an entrance of the facilities, stores use permission information for permitting the use of the management object on an information storage medium when the user enters the facilities. In the facilities, a use management apparatus, provided for each management object, controls availability or unavailability of the management object based on the use permission information stored on the information storage medium. Additionally, the use management apparatus stores, in the information storage medium, use information showing that the management object is used. Further, a room leaving management apparatus, provided in the vicinity of an exit of the facilities, manages leaving of the user based on the use information stored on the information storage medium. When the user leaves the facilities, it is controlled whether or not the user can leave the facilities, and use history information is stored, based on the use information. | 04-21-2011 |
| Patent application number | Description | Published |
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| 20090281237 | POLYCARBOSILANE, METHOD FOR PRODUCING SAME, SILICA COMPOSITION FOR COATING APPLICATION, AND SILICA FILM - A polycarbosilane has a main chain in which silicon atoms and carbon atoms are alternately repeated, and includes a structural unit shown by the following general formula (1), a structural unit shown by the following general formula (2), a structural unit shown by the following general formula (3), and a structural unit shown by the following general formula (4). | 11-12-2009 |
| 20100007025 | ORGANIC SILICA FILM AND METHOD FOR FORMING SAME, COMPOSITION FOR FORMING INSULATING FILM OF SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING SAME, WIRING STRUCTURE AND SEMICONDUCTOR DEVICE - An insulating-film-forming composition for a semiconductor device comprising an organic silica sol with a carbon atom content of 11 to 17 atom % and an organic solvent is disclosed. The organic silica sol comprises a hydrolysis-condensation product P1 and a hydrolysis-condensation product P2. The hydrolysis-condensation product P1 is obtained by hydrolyzing and condensing (A) a silane monomer comprising a hydrolyzable group and (B) a polycarbosilane comprising a hydrolyzable group in the presence of (C) a basic catalyst, and the hydrolysis-condensation product P2 is obtained by hydrolyzing and condensing (D) a silane monomer comprising a hydrolyzable group. | 01-14-2010 |
| 20100174103 | MATERIAL FOR FORMING SILICON-CONTAINING FILM, AND SILICON-CONTAINING INSULATING FILM AND METHOD FOR FORMING THE SAME - A silicon-containing film-forming material includes at least one organosilane compound shown by the following general formula (1). | 07-08-2010 |
| 20100261925 | METHOD FOR PRODUCING SILICON COMPOUND - A method of producing a silicon compound shown by the following general formula (7) includes reacting an organomagnesium compound shown by the following general formula (1) with an organosilane compound shown by the following general formula (2) in a solvent that contains at least one compound selected from a compound shown by the following general formula (3), a compound shown by the following general formula (4), a compound shown by the following general formula (5), and a compound shown by the following general formula (6). | 10-14-2010 |
