Hisashi Inoue
Hisashi Inoue, Nara JP
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20090103898 | CONTENT SHOOTING APPARATUS - In a content shooting apparatus (Acc) for recording content data (Sav) containing video, audio, or data onto an information recording medium ( | 04-23-2009 |
20100091113 | CONTENT SHOOTING APPARATUS - A content shooting apparatus is provided which is suitable for generating a digest meeting the user's desire. | 04-15-2010 |
Hisashi Inoue, Tokyo JP
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20090124087 | Vertical plasma processing apparatus and method for using same - A vertical plasma processing apparatus for a semiconductor process for performing a plasma process on target substrates all together includes an exciting mechanism configured to turn at least part of a process gas into plasma. The exciting mechanism includes first and second electrodes provided to a plasma generation box and facing each other with a plasma generation area interposed therebetween, and an RF power supply configured to supply an RF power for plasma generation to the first and second electrodes and including first and second output terminals serving as grounded and non-grounded terminals, respectively. A switching mechanism is configured to switch between a first state where the first and second electrodes are connected to the first and second output terminals, respectively, and a second state where the first and second electrodes are connected to the second and first output terminals, respectively. | 05-14-2009 |
20090250005 | REACTION TUBE AND HEAT PROCESSING APPARATUS FOR A SEMICONDUCTOR PROCESS - A reaction tube for a semiconductor process for performing a heat process on a plurality of target objects stacked at intervals under a vacuum state is integrally made of an electrically insulating and heat-resistant material. The reaction tube includes a cylindrical sidewall that has a load port at a lower end for loading and unloading the target objects to and from the reaction tube, and a circular ceiling wall that closes an upper end of the sidewall and has a flat inner surface extending in a direction perpendicular to an axial direction of the sidewall. The ceiling wall has an annular groove formed in a peripheral region of an outer surface along the sidewall. | 10-08-2009 |
Hisashi Inoue, Tokyo-To JP
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20090081887 | Heat treatment method and heat treatment apparatus - The number of substrates held by a substrate holder is increased compared with conventional techniques while uniformity of a heat treatment is ensured. The substrate holder holds a plurality of substrates at predetermined vertical intervals. The substrate holder is carried into a heat treating furnace. A predetermined heat treatment is performed on the substrates. The substrate holder has two holder constituting bodies. Each of the holder constituting bodies has a plurality of columns and substrate holding sections. The columns are arranged on the circumference of the same imaginary circle. The substrate holding sections hold circumferential portions of the respective substrates. One of the holder constituting bodies holds the substrates under the condition that front surfaces of the substrates face upward, while the other of the holder constituting bodies holds the substrates under the condition that back surfaces of the substrates face upward. The substrate with the front surface facing upward and the substrate with the back surface facing upward are alternately arranged in a vertical direction. At least one of the holder constituting bodies moves in the vertical direction to change the positions of the holder constituting bodies relative to each other. A distance between one of a first pair of substrates that are vertically adjacent to each other and have the respective front surfaces facing each other and the other of the first pair of substrates is set to ensure uniformity of the treatment and larger than a distance between one of a second pair of substrates that are vertically adjacent to each other and have the respective back surfaces facing each other and the other of the second pair of substrates. | 03-26-2009 |
20110162633 | HEAT TREATMENT METHOD AND HEAT TREATMENT APPARATUS - A heat treatment apparatus has a substrate holder with two holder constituting bodies that each have a plurality of columns and substrate holding sections. One of the holder constituting bodies holds substrates so that their front surfaces face upward, while the other holds the substrates so that their back surfaces face upward. At least one of the holder constituting bodies moves vertically to change the positions of the holder constituting bodies relative to each other. A distance between one of a first pair of vertically-adjacent substrates with respective front surfaces facing each other and the other of the first pair of substrates is set to ensure treatment uniformity and to be larger than a distance between one of a second pair of vertically-adjacent substrates with their respective back surfaces facing each other and the other of the second pair of substrates. | 07-07-2011 |
20140220503 | HEAT TREATMENT METHOD AND HEAT TREATMENT APPARATUS - A substrate holder has two holder constituting bodies, each having a plurality of columns arranged on an imaginary circle, and substrate holding sections that hold circumferential portions of respective substrates. The holder constituting bodies hold the substrates so that either their front surfaces or their back surfaces face upward with a substrate having an upward facing front and a substrate having an upward facing rear being alternately arranged in a vertical direction. At least one of the holder constituting bodies moves in the vertical direction to change the positions of the holder constituting bodies relative to each other. A distance between a first pair of vertically adjacent substrates with their respective front surfaces facing each other is set to ensure treatment uniformity, and to be larger than a distance between a second pair of vertically adjacent substrates with their respective back surfaces facing each other. | 08-07-2014 |
Hisashi Inoue, Fukuoka JP
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20080273627 | Information-Detecting Apparatus and Method - An information-detecting apparatus ( | 11-06-2008 |
20090074230 | Electronic watermark embedding device and detection device, detection method, detection program, and intergrated circuit device thereof - An electronic watermark technique which allows precise detection of electronic watermark information from image having any size is provided. In an electronic watermark embedding device | 03-19-2009 |
Hisashi Inoue, Fuchu-Shi JP
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20080255683 | Heat processing apparatus, method of automatically tuning control constants, and storage medium - A heat processing apparatus comprises: a reaction vessel; a heating unit disposed in the reaction vessel and configured to heat the processing region; a temperature detection part configured to detect a temperature of the processing region; and a control part configured to control the heating unit by a PID control. The control part includes: a rule table that is prepared such that predicted change amounts of a temperature property item when a temperature of the processing region is increased up to a target value, and change ratios of PID constants are correspondingly related to each other; a performance unit configured to repeatedly perform: a step of obtaining a temperature profile based on a temperature detected value of the temperature detection part and calculating a difference between an actually measured value and a target value of the temperature property item based on the temperature profile; and a step of, when the difference is over an allowable range and larger than a prescribed value, referring to the rule table and changing the PID constants to reset new PID constants by a change ratio corresponding to an predicted change amount of the temperature property item relative to the difference; until the difference can fall within the allowable range. The control part also includes an updating unit configured to update, when there is a difference between an actually measured change amount of the temperature property item with reference to the rule table and an predicted change amount of the temperature property item that has been predicted in the preceding cycle, the corresponding relationship between the PID constants and the predicted change amounts of the temperature property item described in the rule table, based on the actually measured change amount. | 10-16-2008 |
20120329291 | HEAT TREATMENT METHOD AND HEAT TREATMENT APPARATUS - A substrate holder has two holder constituting bodies, each having a plurality of columns arranged on an imaginary circle, and substrate holding sections that hold circumferential portions of respective substrates. The holder constituting bodies hold the substrates so that either their front surfaces or their back surfaces face upward with a substrate having an upward facing front and a substrate having an upward facing rear being alternately arranged in a vertical direction. At least one of the holder constituting bodies moves in the vertical direction to change the positions of the holder constituting bodies relative to each other. A distance between a first pair of vertically adjacent substrates with their respective front surfaces facing each other is set to ensure treatment uniformity, and to be larger than a distance between a second pair of vertically adjacent substrates with their respective back surfaces facing each other. | 12-27-2012 |
Hisashi Inoue, Nirasaki-Shi JP
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20110129604 | DIRECT OXIDATION METHOD FOR SEMICONDUCTOR PROCESS - An oxidation method for performing direct oxidation includes respectively supplying an oxidizing gas and a deoxidizing gas to the process field, and directly oxidizing a surface target substrates by use of oxygen radicals and hydroxyl group radicals generated by a reaction between the oxidizing gas and the deoxidizing gas. The oxidizing gas is supplied through an oxidizing gas nozzle extending over a vertical length corresponding to the process field and is spouted from a plurality of gas spouting holes formed on the oxidizing gas nozzle and arrayed over the vertical length corresponding to the process field. The deoxidizing gas is supplied through a plurality of deoxidizing gas nozzles having different heights respectively corresponding to a plurality of zones of the process field arrayed vertically and is spouted from gas spouting holes respectively formed on the deoxidizing gas nozzles each at height of a corresponding zone. | 06-02-2011 |
Hisashi Inoue, Torrance, CA US
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20130077561 | Multi-Operator System for Accessing Satellite Resources - A satellite control system comprising a communications system and an information management system. The communications system is configured to receive commands from a plurality of operators. The communications system is further configured to send the commands to a satellite using a number of communications links. The information management system may be configured to avoid conflicts between the commands sent by the communications system to the satellite from different operators in the plurality of operators that cause an undesired operation of the satellite. The information management system may be configured to provide a desired level of security for information sent between the plurality of operators and the satellite. | 03-28-2013 |
Hisashi Inoue, Takatsuki-Shi JP
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20130294577 | WAVELENGTH DISPERSIVE X-RAY FLUORESCENCE SPECTROMETER - In the wavelength dispersive X-ray fluorescence spectrometer of the present invention, a counting loss correcting unit ( | 11-07-2013 |