Patent application number | Description | Published |
20090239053 | METHOD OF CUTTING OUT CHIPS FOR A PLURALITY OF SENSOR ELEMENTS FROM LAMINATED BODY, METHOD OF MANUFACTURING SENSOR ELEMENT, AND SENSOR ELEMENT - A sensor element is formed by cutting a laminated body and heating with the cutting taking place in a state where a difference in resistance on sides of a cutting component is as small as possible. That is, a uniform cutting is where resistance added to both sides of the cutting component is substantially the same. When uniform cutting cannot be performed, a nonuniform cutting in a state where resistance added to both sides of the cutting component is different is performed. Consequently, a surface perpendicular to a longitudinal direction of the sensor element is trapezoidal. | 09-24-2009 |
20090242400 | GAS SENSOR, NOx SENSOR AND METHOD OF MANUFACTURING GAS SENSOR - It is an object of the present invention to provide a NOx sensor for accurately obtaining the resistance value of a heater. When a second layer is laminated immediately above a first layer on which the heater for electrically heating the proximity of an inner space of the NOx sensor and two heater leads having substantially same shape which are energizing paths to the heater are formed, the second layer on which at least one of leads is formed out of a first lead for electrically connecting a reference electrode to outside, a second lead for electrically connecting a measuring electrode to outside, and a third lead for electrically connecting a plurality of pump electrodes to outside, the lead formed on the second layer is arranged so as not to overlap any of two heater leads in a laminating direction of the first layer and the second layer. | 10-01-2009 |
20110100523 | MEASURING EQUIPMENT AND METHOD FOR FORMING LAMINATED BODY - A method for improving an accuracy of measurement of the thickness of a green sheet, and additionally improving yield of a green sheet used for formation of a laminated body is provided. The thickness of each of a plurality of ceramic green sheets is measured, and an average and a variation of obtained thickness measurement values are checked against predetermined ranking criteria. Thereby, a ranking is performed in which the plurality of ceramic green sheets are classified into a plurality of ranks set in the ranking criteria. When forming the laminated body, only a ceramic green sheet belonging to at least one of the ranks which is in advance allowed to be used is used as a ceramic green sheet constituting each layer of the laminated body. | 05-05-2011 |
20110174049 | INSPECTION APPARATUS FOR SENSOR ELEMENT, AND METHOD FOR INSPECTING ELECTRICAL CHARACTERISTICS OF SENSOR ELEMENT - An inspection apparatus including a cylindrical chamber having an opening part and a bottomed end part. The chamber includes an element insertion/extraction part, a tapered part, and a gas introduction part. The element insertion/extraction part is a tubular space continuous from the opening part. The tapered part is connected to the element insertion/extraction part, and is a space having a tapered shape in a cross-sectional view sectioned perpendicularly so that a lengthwise direction is larger toward the inner side. The gas introduction part is a tubular space continuously extending from the tapered part to a bottom portion. A sensor element is inserted into the chamber such that a front end thereof reaches the tapered part while a gap is formed between the sensor element and the chamber, and in this condition, an inspection gas is supplied to the chamber through a supply port provided in the gas introduction part. | 07-21-2011 |
Patent application number | Description | Published |
20080212452 | OPTICAL PICKUP APPARATUS - An optical pickup apparatus comprising: an objective lens configured to focus laser light having the Gaussian distribution properties emitted from a laser diode to a signal recording layer of an optical disc; and an adjustment coating formed on a surface of an incident face of the objective lens on which the laser light is to be made incident, the adjustment coating being configured to adjust transmittance of the laser light passing through the objective lens, the adjustment coating being formed on the surface of the incident face such that the transmittance is lowered as a numerical aperture of the objective lens is reduced. | 09-04-2008 |
20100149947 | Laser Converging Apparatus, Optical Pickup Device, and Optical Disc Recording/Reproducing Apparatus - A laser converging apparatus comprising: a nonpolarizing hologram element having a first area defined by a numerical aperture corresponding to a thickness of a first protective layer of a first disk medium and a second area inside the first area, the second area defined by a numerical aperture corresponding to a thickness of a second protective layer (>the thickness of the first protective layer) of a second disk medium, the second area having a hologram pattern for diffracting laser light into zero order light and high-order diffracted light having the order of primary or higher; an objective lens having the numerical aperture corresponding to the thickness of the first protective layer, the objective lens converging the laser light having passed through a part of the first area other than the second area and the zero order light having passed through the second area onto an information surface on one side of the first protective layer, the objective lens converging the high-order diffracted light having passed through the second area onto an information surface on one side of the second protective layer; and a holder that holds the nonpolarizing hologram element and the objective lens. | 06-17-2010 |
20110191794 | OPTICAL PICKUP APPARATUS - An optical-pickup apparatus includes first and second objective lenses that focus first and second laser light on information-recording layers of first and second optical discs, the second optical disc having an information-recording format different from that of the first optical disc; and a lens holder that integrally holds the first and second objective lenses in an adjacent manner, a disc surface of the first optical disc and of the second optical disc being substantially parallel to confronting faces of the first and second objective lenses, that confront the disc surface, a minimum distance between the disc surface and the confronting faces in a direction of an optical axis of the turntable being greater than a thickness of the turntable in a direction of a rotation axis of the turntable, either one or both of the first and second objective lenses configured to focus bluish-violet laser light on an optical disc. | 08-04-2011 |
20110222389 | LASER CONVERGING APPARATUS, OPTICAL PICKUP DEVICE, AND OPTICAL DISC RECORDING/REPRODUCING APPARATUS - A laser converging apparatus includes a polarizing hologram element having a first area defined by a numerical aperture corresponding to a thickness of a first protective layer of a first disk medium and a second area inside the first area, the second area defined by a numerical aperture corresponding to a thickness of a second protective layer (>the thickness of the first protective layer) of a second disk medium. A wavelength selecting nonpolarizing hologram element has a third area defined by a numerical aperture corresponding to a thickness of a third protective layer (>the thickness of the first protective layer) of a third disk medium. The laser converging apparatus also includes an objective lens having the numerical aperture corresponding to the thickness of the first protective layer, and a holder that holds the polarizing hologram element, the nonpolarizing hologram element, and the objective lens. | 09-15-2011 |
20120026847 | Optical Device, Manufacturing Method Thereof, Optically Assisted Magnetic Recording Head and Magnetic Recorder - Disclosed is an optical device including a concave surface formed of a part of a cylindrically curved surface, and the concave surface is a reflection surface. | 02-02-2012 |
20120170441 | OPTICAL PICKUP APPARATUS - An optical pickup apparatus includes an objective lens having a numeric aperture and an incident face. An antireflection coating is formed on the incident face. A collimating lens converts laser light from a laser diode into parallel light, and causes the parallel light to be made incident on the incident face through the antireflection coating. The thickness of the antireflection coating causes a transmittance of laser light that enters the objective lens to be: set at a first predetermined transmittance value, when the numeric aperture is between zero and a first predetermined numeric aperture value; set to correlate linearly with the numeric aperture when the numeric aperture is between the first predetermined numeric aperture value and a second predetermined numeric aperture value; and set at a second predetermined transmittance value, when the numeric aperture is between the second predetermined numeric aperture value and a third predetermined numeric aperture value. | 07-05-2012 |
20150016709 | Pattern Sensing Device and Semiconductor Sensing System - An object of the invention is to provide a pattern measuring device for generating appropriate reference pattern data while suppressing an increase in the manufacturing cost that would occur when manufacturing conditions are finely changed. A pattern measuring device has an arithmetic processing unit for measuring a pattern formed on a sample. The arithmetic processing unit, on the basis of signals obtained with a charged particle beam device, acquires or generates image data or contour line data on a plurality of circuit patterns created under different manufacturing conditions of a manufacturing apparatus, and generates reference data to be used for measurement of a circuit pattern from the image data or contour line data. | 01-15-2015 |
20150110406 | MEASUREMENT METHOD, IMAGE PROCESSING DEVICE, AND CHARGED PARTICLE BEAM APPARATUS - An error of an outline point due to a brightness fluctuation cannot be corrected by a simple method such as a method of adding a certain amount of offset. However, in recent years as the miniaturization of the pattern represented by a resist pattern has progressed, it has been difficult to appropriately determine a region that serves as a reference. An outline of the resist pattern is extracted from an image of the resist pattern obtained by a charged particle beam apparatus in consideration of influence of the brightness fluctuation. That is, a plurality of brightness profiles in the vicinity of edge points configuring the outline are obtained and an evaluation value of a shape of the brightness profile in the vicinity of a specific edge is obtained based on the plurality of brightness profiles, and the outline of a specific edge point is corrected, based on the evaluation value. | 04-23-2015 |
20150228063 | Pattern Inspecting and Measuring Device and Program - Provided is a pattern inspecting and measuring device that decreases the influence of noise and the like and increases the reliability of an inspection or measurement result during inspection or measurement using the position of an edge extracted from image data obtained by imaging a pattern as the object of inspection or measurement. For this purpose, in the pattern inspecting and measuring device in which inspection or measurement of an inspection or measurement object pattern is performed using the position of the edge extracted, with the use of an edge extraction parameter, from the image data obtained by imaging the inspection or measurement object pattern, the edge extraction parameter is generated using a reference pattern having a shape as an inspection or measurement reference and the image data. | 08-13-2015 |
20160005157 | Pattern-Measuring Apparatus and Semiconductor-Measuring System - An object of the present invention is to provide a pattern-measuring apparatus and a semiconductor-measuring system which are able to obtain an evaluation result for suitably selecting processing with respect to a semiconductor device. In the present invention for attaining the object described above, there is proposed a pattern-measuring apparatus including an arithmetic device which compares a circuit pattern of an electronic device with a reference pattern, in which the arithmetic device classifies the circuit pattern in processing unit of the circuit pattern on the basis of a comparison of a measurement result between the circuit pattern and the reference pattern with at least two threshold values. | 01-07-2016 |
20160087211 | METHOD FOR FORMING PATTERN OF ORGANIC ELECTROLUMINESCENT ELEMENT - A method includes forming an emission pattern on an organic electroluminescent element including an organic functional layer between two electrodes by light irradiation to the organic electroluminescent element, and controlling at least one of light intensity and exposure time as variable factors during the light irradiation based on reciprocity failure characteristics involving modification of a function of the organic functional layer due to the light irradiation. | 03-24-2016 |
Patent application number | Description | Published |
20080224035 | Pattern displacement measuring method and pattern measuring device - An evaluation method and apparatus is provided for evaluating a displacement between patterns of a pattern image by using design data representative of a plurality of patterns superimposed ideally. A first distance is measured for an upper layer pattern between a line segment of the design data and an edge of the charged particle radiation image, a second distance is measured for a lower layer pattern between a line segment of the design data and an edge of the charged particle radiation image; and an superimposition displacement is detected between the upper layer pattern and lower layer pattern in accordance with the first distance and second distance. | 09-18-2008 |
20100140472 | PATTERN DISPLACEMENT MEASURING METHOD AND PATTERN MEASURING DEVICE - An evaluation method and apparatus is provided for evaluating a displacement between patterns of a pattern image by using design data representative of a plurality of patterns superimposed ideally. A first distance is measured for an upper layer pattern between a line segment of the design data and an edge of the charged particle radiation image, a second distance is measured for a lower layer pattern between a line segment of the design data and an edge of the charged particle radiation image; and an superimposition displacement is detected between the upper layer pattern and lower layer pattern in accordance with the first distance and second distance. | 06-10-2010 |
20110150345 | PATTERN MATCHING METHOD AND COMPUTER PROGRAM FOR EXECUTING PATTERN MATCHING - A pattern matching method which is capable of selecting a suitable measurement object pattern, even on a sample containing a periodic structure, and a computer program for making a computer execute the pattern matching. In a pattern matching method which executes matching between the design data-based first image of an object sample, and a second image, whether or not a periodic structure is included in a region to execute the matching is determined, so as to select a pattern, based on distance between an original point which is set in said image, and the pattern configuring said periodic structure, in the case where the periodic structure is included in said region, and to select a pattern based on coincidence of the pattern in said image, in the case where the periodic structure is not included in said region, and a computer program product. | 06-23-2011 |
20120092483 | SYSTEM AND METHOD OF IMAGE PROCESSING, AND SCANNING ELECTRON MICROSCOPE - A scanning electron microscope comprises an image processing system for carrying out a pattern matching between a first image and a second image. The image processing system comprises: a paint-divided image generator for generating a paint divided image based on the first image; a gravity point distribution image generator for carrying out a smoothing process of the paint divided image and generating a gravity point distribution image; an edge line segment group generation unit for generating a group of edge line segments based on the second image; a matching score calculation unit for calculating a matching score based on the gravity point distribution image and the group of edge line segments; and a maximum score position detection unit for detecting a position where the matching score becomes the maximum. | 04-19-2012 |
20130148876 | IMAGE PROCESSING DEVICE AND COMPUTER PROGRAM - The purpose of the present invention is to provide an image processing apparatus and a computer program such that correspondence points between design data and an edge line or between edge lines can be accurately identified for their matching. In an embodiment for achieving the purpose, when positioning between a first pattern formed by a first line segment and a second pattern formed by a second line segment is performed, a first correspondence point and a second correspondence point are set on the first line segment and the second line segment, respectively; a degree of alignment for performing the positioning of the first pattern and the second pattern is calculated on the basis of the distance between the first correspondence point and the second correspondence point; and the position of the first correspondence point and/or the second correspondence point is changed in accordance with a shape difference between the first line segment and the second line segment (see FIG. | 06-13-2013 |
20130223723 | PATTERN MEASURING APPARATUS, AND PATTERN MEASURING METHOD AND PROGRAM - The present invention provides a pattern measuring apparatus ( | 08-29-2013 |
Patent application number | Description | Published |
20090021828 | SCREEN - A screen includes plural three-dimensional portions having a concave shape arranged at a front surface side of a screen substrate, wherein the three-dimensional portions are disposed so that the number of the three-dimensional portions provided in a range of a given length along a first direction on the screen substrate which is determined corresponding to at least either one of a direction of a chief ray and a chief direction of outside light is larger than the number of three-dimensional portions provided in a range of the given length along a second direction crossing the first direction and in which the plural three-dimensional portions are arranged so that at least two three-dimensional portions of the three-dimensional portions provided in the range of the given length along the first direction contact each other. | 01-22-2009 |
20090302176 | SCREEN - A screen includes a screen main body, having flexibility, onto which an image light is projected; a first support and a second support which, extending one along each of a pair of opposed edges of the screen main body, each support one of the pair of edges; an auxiliary support which, being disposed between the first support and the second support, extends parallel to the first support and the second support, and supports a pair of intersecting edges intersecting with the pair of edges of the screen main body; and linkage mechanisms which, bridging adjacent supports, among the first support, second support, and auxiliary support, as well as regulating a movement of the adjacent supports in an out-of-plane direction of a projection surface of the screen main body, extend and contract in a direction in which the adjacent supports face each other, bringing the adjacent supports closer to and away from each other. | 12-10-2009 |
20130170028 | SCREEN AND PROJECTION SYSTEM - A screen in which observation distance may be adjusted while maintaining image brightness and a projection system using the screen. In a light control layer of a screen, a first angle region that determines a diffusion distribution of a reflected light is different according to the screen position in a control direction in which light diffusion control is performed. Accordingly, a diffusion distribution of image light emitted from a screen surface is adjusted to be tilted downward by an upper end and upward by a lower end according to the screen position. Thus, for example, a size of a diffused angle range is maintained to be 30°, and a direction in which the image light is diffusion-emitted corresponds to an assumed position of an observer. The projection image can be observed while maintaining brightness of an image and the observation distance can be adjusted to be short. | 07-04-2013 |