| Patent application number | Description | Published |
|---|
| 20080231824 | Liquid recovery member, exposure apparatus, exposing method, and device fabricating method - An exposure apparatus comprises a recovery member that recover a liquid. The recovery ability with which the recovery member recovers the liquid differs in accordance with the region of the recovery member. | 09-25-2008 |
| 20080233512 | Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method - A liquid recovery system is used by an immersion exposure apparatus. The liquid recovery system comprises: a plate that has a first surface and a second surface on the side opposite the first surface; and a liquid recovery part, at least part of which opposes the second surface with a first gap interposed therebetween. The liquid recovery system recovers the liquid on a movable object that opposes the first surface of the plate via the liquid recovery part. | 09-25-2008 |
| 20080239256 | Exposure apparatus, exposing method, and device fabricating method - An exposure apparatus performs a multiple exposure of a substrate and comprises: a first station that exposes the substrate; a second station that exposes the substrate that was exposed at the first station; movable members each of that holds the substrate and is capable of moving between the first station and the second station; and a first detection system that is disposed in the first station and acquires alignment information about the substrate. | 10-02-2008 |
| 20080246937 | Exposing Method, Exposure Apparatus, Device Fabricating Method, and Film Evaluating Method - An exposing method has: a process that forms an immersion region of a liquid on a substrate; a process that determines exposure conditions in accordance with an adhesive force that acts between a surface of the substrate and the liquid; and a process that, based on the exposure conditions, exposes the substrate through the liquid of the immersion region. | 10-09-2008 |
| 20080252865 | Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device - An exposure apparatus forms an immersion area of a liquid on the side of the image plane of a projection optical system and performs exposure of a substrate via the projection optical system and the liquid of the immersion region. The exposure apparatus has an optical cleaning unit which irradiates a predetermined irradiation light, having an optical cleaning effect, onto, for example, the upper surface of the substrate stage which makes contact with the liquid for forming the immersion area. Thus, it is possible to prevent deterioration of the exposure accuracy and measurement accuracy due to pollution of the member in contact with the liquid in the immersion region. | 10-16-2008 |
| 20080291408 | Projection optical system, exposing method, exposure apparatus, and device fabricating method - A projection optical system projects an image of a first surface to a second surface through a liquid. The projection optical system comprises an optical element, wherein the first surface side contacts a gas and the second surface side contacts the liquid. The optical element has an incident surface, which is convex toward the first surface, an emergent surface, an outer circumferential surface between an outer circumference of the incident surface and an outer circumference of the emergent surface, and holding parts, which are formed at a circumferential edge part of the outer circumferential surface so that they project toward the second surface. | 11-27-2008 |
| 20080297746 | Exposure method, exposure apparatus, and method for producing device - A liquid immersion exposure apparatus in which a substrate is exposed with an exposure beam, includes a projection optical system by which the substrate is exposed to the exposure beam, a first inlet disposed at a first position, which is capable of supplying a first liquid to a space adjacent to a bottom surface of the projection optical system, and a second inlet disposed at a second position which is different from the first position, the second inlet being capable of supplying a second liquid that is different from the first liquid to the space. | 12-04-2008 |
| 20080316453 | Exposure apparatus, exposure method, and method for producing device - An exposure apparatus includes an optical system irradiating a first exposure light from a first pattern and a second exposure light from a second pattern onto a first exposure area and second exposure area respectively to form an image of the first pattern and an image of the second pattern on the first and exposing areas respectively; a light receiving device receiving a detecting light via at least a part of the optical system; and a detection system obtaining, in parallel to at least a part of an operation of multiple-exposing a predetermined area on a substrate with the images of first and second patterns, informations about a positional relationship between the image of the first pattern and the substrate and a positional relationship between the image of the second pattern and the substrate via at least a part of the optical system. The substrate can be efficiently well multi-exposed. | 12-25-2008 |
| 20090002655 | Exposure apparatus, exposure method, and method for producing device - A liquid immersion exposure apparatus includes an optical member through which a substrate is exposed with an exposure beam, and a liquid supply system having a supply port from which a liquid is supplied. The liquid supply system supplies the liquid from the supply port to a space between the optical member and the substrate during the exposure. The optical member has a lyophobic surface which is lyophobic for the liquid. | 01-01-2009 |
| 20090009745 | Exposure method, exposure apparatus, and method for producing device - A method for forming a liquid immersion area with a liquid on an object, includes determining a condition for forming the liquid immersion area based on affinity between the liquid and a liquid contact surface of the object, and forming the liquid immersion area under the determined condition. | 01-08-2009 |
| 20090015808 | Exposure method, substrate stage, exposure apparatus, and device manufacturing method - An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate. | 01-15-2009 |
| 20090015816 | Exposure method, substrate stage, exposure apparatus, and device manufacturing method - An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate. | 01-15-2009 |
| 20090021709 | Exposure apparatus, exposure method, and method for producing device - An exposure apparatus fills an optical path space on a side of an image plane of a projection optical system with liquid and exposes a substrate via the projection optical system and the liquid. The exposure apparatus has a measurement unit which measures an optical property of the liquid. According to the measurement result, it is possible to adjust the optical characteristic of the liquid by a liquid mixing unit. Thus, it is possible to maintain the exposure accuracy at a desired state when performing immersion exposure. | 01-22-2009 |
| 20090079950 | Exposure apparatus, exposure method, and method for producing device - A liquid immersion exposure apparatus includes an optical member through which an exposure beam passes, a flow passage in which a liquid flows, the flow passage being in fluidic communication with a space between the optical member and an object opposite to the optical member, and an opening at which a plurality of slits are provided, and from which the liquid is supplied to the space through the flow passage. | 03-26-2009 |
| 20090115977 | Exposure Apparatus, Exposure Method, and Device Manufacturing Method - An exposure apparatus includes an immersion space forming member ( | 05-07-2009 |
| 20090153820 | Exposure apparatus and device manufacturing method - An exposure apparatus exposes a substrate by forming a liquid immersion region on the substrate, and projecting a pattern image onto the substrate via a projection optical system and a liquid that forms the liquid immersion region. The exposure apparatus includes a projection optical system having a plurality of optical elements, by which a pattern image is projected onto a substrate via a liquid to expose the substrate and a liquid recovery system that recovers the liquid along with a gas and has a separator that separates the recovered liquid and the recovered gas. | 06-18-2009 |
| 20090208883 | Stage device, exposure apparatus, exposure method and device manufacturing method - A stage apparatus | 08-20-2009 |
| 20090218653 | Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device - A lithography apparatus includes a part having a photocatalytic coating. The lithography apparatus can be an extreme ultraviolet lithography apparatus or an immersion lithography apparatus. | 09-03-2009 |
| 20090218743 | Substrate holding apparatus, exposure apparatus, exposing method, device fabricating method, plate member, and wall - A substrate holding apparatus holds a substrate that is exposed by exposure light that passes through a liquid. The substrate holding apparatus comprises: an opening; and a first holding part, which has a holding surface for holding the substrate inside the opening. At least part of an edge part that defines the opening has a first surface and a second surface, which is provided above and is nonparallel to the first surface. The second surface extends from a boundary part between the first surface and the second surface both upward and toward the outer side with respect to a center of the opening. The boundary part between the first surface and the second surface is substantially the same height as or higher than a front surface of the substrate, which is held by the first holding part. | 09-03-2009 |
| 20090251672 | Exposure apparatus, device production method, cleaning apparatus, cleaning method, and exposure method - An exposure apparatus exposes a substrate with an exposure light through an exposure liquid. The exposure apparatus includes an optical element from which the exposure light exits; a stage which is movable on the light-exit side of the optical element; a certain member which is provided on the stage; and a vibration generator which vibrates the certain member to apply vibration to the liquid in the liquid immersion space formed on the certain member. It is possible to suppress the deterioration of the performance which would be otherwise caused by any contamination. | 10-08-2009 |
| 20090253083 | Exposure Apparatus, Exposure Method, and Method for Producing Device - An exposure apparatus includes a liquid supply unit which supplies a liquid to fill an optical path space for an exposure light beam therewith, a first land surface which is opposed to a surface of a substrate arranged at an exposure position and which surrounds the optical path space for the exposure light beam, and second land surfaces which are arranged outside the first land surface. The first land surface is capable of retaining the liquid between the surface of the substrate and the first land surface. The second land surface is provided to make no contact with a film of the liquid existing between the second land surface and the surface of the substrate. Accordingly, the exposure apparatus is provided, in which the optical path space for the exposure light beam can be filled with the liquid in a desired state even when the exposure is performed while moving the substrate. | 10-08-2009 |
| 20090262316 | EXPOSURE APPARATUS AND METHOD FOR PRODUCING DEVICE - An exposure apparatus EX includes a recovery port which recovers a liquid, a blow port which is provided outside the recovery port with respect to an optical path space and which blows a gas therefrom, and a gas discharge port which is provided between the recovery port and blow port and which discharges at least a part of the gas blown from the blow port. An exposure apparatus which makes it possible to avoid the leakage of the liquid with which the optical path space of the exposure light between a projection optical system and a substrate is filled is provided. | 10-22-2009 |
| 20100134772 | Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device - An exposure apparatus forms an immersion area of a liquid on the side of the image plane of a projection optical system and performs exposure of a substrate via the projection optical system and the liquid of the immersion region. The exposure apparatus has an optical cleaning unit which irradiates a predetermined irradiation light, having an optical cleaning effect, onto, for example, the upper surface of the substrate stage which makes contact with the liquid for forming the immersion area. Thus, it is possible to prevent deterioration of the exposure accuracy and measurement accuracy due to pollution of the member in contact with the liquid in the immersion region. | 06-03-2010 |
| 20100157262 | Exposure apparatus and device manufacturing method - An exposure apparatus for emitting exposure light onto a substrate via a projection optical system and a liquid to expose the substrate includes a supply pipe which supplies the liquid; a recovery pipe which recovers the liquid; a connection pipe which connects the supply pipe and the recovery pipe; and a switching device which switches a flow path of the liquid so that when liquid supply is stopped, the liquid that has flowed into the supply pipe flows to the recovery pipe via the connection pipe. The apparatus may further include a temperature regulation apparatus connected to the supply pipe, which performs temperature regulation of the liquid supplied to the supply pipe, and has a rough temperature regulator which roughly regulates the temperature of the liquid, and a fine temperature regulator which is arranged between the rough temperature regulator and the supply pipe and performs fine regulation of this temperature. | 06-24-2010 |
| 20100195067 | Exposure apparatus, exposure method, and method for producing device - A lithographic apparatus is arranged to project a pattern from a patterning device onto a substrate through a liquid confined in a space adjacent the substrate. The apparatus includes a structure substantially parallel to a surface of a substrate table configured to hold the substrate, to divide the space into two parts. The structure has an aperture to allow transmission of the pattern and a recess at the bottom side of the structure to extract a fluid from the space. | 08-05-2010 |
| 20100196832 | EXPOSURE APPARATUS, EXPOSING METHOD, LIQUID IMMERSION MEMBER AND DEVICE FABRICATING METHOD - An exposure apparatus comprises: an optical system, which has an emergent surface wherefrom exposure light emerges; a first surface, which is disposed at least partly around an optical path of the exposure light from the emergent surface; and a second surface, which is disposed at least partly around the first surface; and a first supply port, which is disposed at least partly around the first surface such that it faces in an outward radial direction with respect to an optical axis of the projection optical system, that supplies a first liquid to the second surface; wherein, during at least part of an exposure of a substrate, a front surface of the substrate opposes the emergent surface, the first surface, and the second surface; and the substrate is exposed with the exposure light that emerges from the emergent surface and transits a second liquid between the emergent surface and the front surface of the substrate. | 08-05-2010 |
| 20100231879 | Exposure apparatus, exposure method, and device manufacturing method - An exposure apparatus includes: an optical system having an optical element on which a first exposure light and a second exposure light are incident, the first exposure light and the second exposure light from the optical element being irradiated onto a first exposure field and a second exposure field; and a detection device that detects at least one of the first exposure light and the second exposure light, which are from the optical element and are directed towards a different direction from directions towards the first and second exposure fields. | 09-16-2010 |
| 20100323303 | LIQUID IMMERSION MEMBER, EXPOSURE APPARATUS, EXPOSING METHOD, AND DEVICE FABRICATING METHOD - An exposure apparatus including: an optical system, which has an emergent surface; a first surface, which is disposed at least partly around an optical path of exposure light from the emergent surface; a second surface, which is disposed at least partly around the first surface; a third surface, which is disposed at least partly around the second surface; a first supply port, which is disposed at least partly around the first surface such that the first supply port is directed in an outward radial direction with respect to an optical axis of the optical system, that supplies a first liquid to the second surface; and a second supply port, which is disposed at least partly around the second surface such that the second supply port is directed in an outward radial direction with respect to the optical axis, that supplies a second liquid to the third surface. | 12-23-2010 |
| 20110032498 | Exposure apparatus, exposure method, and method for producing device - An exposure apparatus exposes a substrate by projecting an image of a predetermined pattern through a liquid onto the substrate. The exposure apparatus includes a projection optical system which performs the projection, and a liquid supply mechanism which supplies the liquid onto the substrate to form a liquid immersion area on a part of the substrate. The liquid supply mechanism supplies the liquid onto the substrate simultaneously from a plurality of positions which are apart, in a plurality of different directions, from the projection area. The exposure apparatus is capable of forming the liquid immersion area stably and recovering the liquid satisfactorily. It is possible to perform the exposure process accurately while avoiding, for example, the outflow of the liquid to the surroundings. | 02-10-2011 |
| 20110051112 | Exposure apparatus, exposure method, and method for producing device - An exposure apparatus fills an optical path space of an exposure light beam with a liquid, and exposes a substrate by irradiating the substrate with the exposure light beam via a projection optical system and the liquid. A first optical element of the projection optical system is provided with a removing device for removing foreign matters in a space inside of the concave surface portion. Immersion exposure is performed by permitting the exposure light beam to excellently reach an image plane via the projection optical system and the liquid. | 03-03-2011 |
| 20110063589 | Exposure apparatus and method for manufacturing device - An exposure apparatus which exposes a substrate by projecting an image of a pattern, via an projection optical system and a liquid of a liquid immersion area formed on the substrate, onto the substrate, includes a liquid supply mechanism having supply ports for supplying the liquid on both sides of a projection area respectively and capable of simultaneously supplying the liquid from the supply ports, the image of the pattern being projected onto the projection area. The liquid supply mechanism supplies the liquid from only one of the supply ports disposed on the both sides when the mechanism starts to supply the liquid. The liquid may be supplied while moving an object such as a substrate placed to face the projection optical system. Accordingly, an optical path space on the image side of the projection optical system can be filled with the liquid quickly while suppressing formation of air bubbles. | 03-17-2011 |
