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Hiroyuki Matsuura

Hiroyuki Matsuura, Tokyo-To JP

Patent application numberDescriptionPublished
20100209624FILM-FORMING APPARATUS AND FILM-FORMING METHOD - The present invention is a film-forming apparatus including: a longitudinal tubular processing container in which a vacuum can be created; an object-to-be-processed holding unit that holds a plurality of objects to be processed in a tier-like manner and that can be inserted into and taken out from the processing container; a heating unit provided around the processing container; a silane-based-gas supplying unit that supplies a silane-based gas into the processing container, the silane-based gas including no halogen element; a nitriding-gas supplying unit that supplies a nitriding gas into the processing container; an activating unit that activates the nitriding gas by means of plasma; and a controlling unit that controls the silane-based-gas supplying unit, the nitriding-gas supplying unit and the activating unit, in such a manner that the silane-based gas and the nitriding gas are supplied into the processing container at the same time while the nitriding gas is activated, in order to form a predetermined thin film on each of the plurality of objects to be processed.08-19-2010

Patent applications by Hiroyuki Matsuura, Tokyo-To JP

Hiroyuki Matsuura, Oshu-Shi JP

Patent application numberDescriptionPublished
20090056877Plasma processing apparatus - A vertical plasma processing apparatus for performing a plasma process on a plurality of target objects together at a time includes an activation mechanism configured to turn a process gas into plasma. The activation mechanism includes a vertically elongated plasma generation box attached to a process container at a position corresponding to a process field to form a plasma generation area airtightly communicating with the process field, an ICP electrode provided to the plasma generation box, and an RF power supply connected to the electrode.03-05-2009
20090078201VERTICAL PLASMA PROCESSING APPARATUS FOR SEMICONDUCTOR PROCESS - A vertical plasma processing apparatus for a semiconductor process includes an airtight auxiliary chamber defined by a casing having an insulative inner surface and integrated with a process container. The auxiliary chamber includes a plasma generation area extending over a length corresponding to a plurality of target substrates in a vertical direction. A partition plate having an insulative surface is located between a process field and the plasma generation. The partition plate includes a gas passage disposed over a length corresponding to the plurality of target substrates in a vertical direction. A process gas is exited while passing through the plasma generation area, and is then supplied through the gas passage to the process field.03-26-2009
20090145890Treatment apparatus, treatment method, and storage medium - A treatment apparatus uses an inductive heating method to allow an object to be heated while preventing a treatment chamber from being heated. The treatment apparatus for performing a heat treatment on the object has a treatment chamber and an induction heating coil section. The treatment chamber is capable of accommodating a plurality of objects. The induction heating coil section is wound around an outer circumference of the treatment chamber. The treatment apparatus also has a high frequency power supply and a gas supply unit. The high frequency power supply applies high frequency power to the induction heating coil section. The gas supply unit introduces a necessary gas to the treatment chamber. A holding unit is inserted in and removed from the treatment chamber under the condition that the holding unit holds the object and an induction heating generator adapted to be inductively heated by means of a high frequency wave emitted by the induction heating coil section.06-11-2009
20090184109Processing apparatus and process method - A processing apparatus subjects an object to be processed W to a heat process. The processing apparatus comprises: a processing vessel 07-23-2009
20100186898PLASMA PROCESSING APPARATUS - A vertical plasma processing apparatus for performing a plasma process on a plurality of target objects together at a time includes an activation mechanism configured to turn a process gas into plasma. The activation mechanism includes a vertically elongated plasma generation box attached to a process container at a position corresponding to a process field and confining a plasma generation area airtightly communicating with the process field, an ICP electrode disposed outside the plasma generation box and extending in a longitudinal direction of the plasma generation box, and an RF power supply connected to the ICP electrode. The ICP electrode includes a separated portion separated from a wall surface of the plasma generation box by a predetermined distance.07-29-2010

Patent applications by Hiroyuki Matsuura, Oshu-Shi JP

Hiroyuki Matsuura, Osaka JP

Patent application numberDescriptionPublished
20090007579Load Driving Device, Outdoor Unit of Air Conditioner, and Driving Method of Load - After the power source to the control substrate is turned on, power is supplied to the compressor driver and the fan driver. Then, when it is determined that an indoor unit is in operation, the compressor driver and the fan driver are operated. Meanwhile, when it is determined that the indoor unit is not in operation, after the lapse of ten minutes or twenty minutes under a predetermined setting, the power to the compressor driver and the fan driver is cut. When the operation of the indoor unit is started again, power is supplied to the compressor driver and the fan driver.01-08-2009
20090038325Outdoor Unit of Air Conditioner and Its Control Method - An outdoor unit includes an outdoor unit control circuit, an inverter substrate and a compressor. Periodic communication showing the operating condition of the inverter substrate is set from the inverter substrate to the outdoor unit control circuit. Thus, when the communication is performed-normally, the drive of the compressor is changed to a power saving process according to the necessity of the power consumption and the operating condition of the inverter substrate. When the communication is defective, the power-on reset is done to the inverter substrate.02-12-2009
20090145145AIR CONDITIONER - An air conditioner preferably includes a selection component (switch) and an air conditioning data acquisition/processing component (printed wiring board). Preferably, a storage component (EEPROM) records at least two sets of data of whether or not an option function is being executed and a drive condition of a compressor relating to air conditioning that the printed wiring board acquires. The switch receives display setting data indicating either one of the two sets of data. The printed wiring board includes an output port that alternatively outputs one of the data of whether or not the option function is being executed and the data of the drive condition of the compressor, and the printed wiring board performs data output processing from the output port in accordance with the display setting data that the switch has received.06-11-2009
20090281666CONTROL DEVICE - A control device is configured to control an air conditioner that includes an air conditioner outdoor unit and an air conditioner indoor unit. The control device includes a microcomputer and a storage element. The microcomputer causes a signal to be transmitted and received between an outdoor communication unit of the air conditioner outdoor unit and an indoor communication unit of the air conditioner indoor unit. The storage element stores specific information in response to command from the microcomputer. The microcomputer causes the storage element to store operation information including a state of transmission and reception of the signal of the air conditioner at a constant time interval.11-12-2009
20090320507AIR CONDITIONER CONTROL DEVICE - A control device includes a microcomputer and a storage element. The microcomputer is configured to execute an inspection operation mode in which an air conditioner is operated in inspection process in a manufacturing site, and a normal operation mode in which the air conditioner is operated at an installation site. When the operation state of the air conditioner fails to satisfy predetermined conditions, the microcomputer is configured to confirm that there is an error, and abnormally stop the air conditioner. When the air conditioner is abnormally stopped, the microcomputer is configured to cause the storage element to store predetermined operation information obtained during a period until abnormal stoppage of the air conditioner and to store the operation mode being executed at the time of occurrence of the error in the air conditioner.12-31-2009

Hiroyuki Matsuura, Iwate-Ken JP

Patent application numberDescriptionPublished
20090305512Substrate Processing Apparatus and Substrate Processing Method - The present invention is a substrate processing apparatus including: a holder that holds substrates in a tier-like manner; a processing container that contains the holder and that conducts a predetermined thermal process to the substrates in a process-gas atmosphere under a predetermined temperature and pressure; a gas-introducing part that introduces a process gas into the processing container; a gas-discharging part that discharges a gas from the processing container to create a predetermined vacuum pressure therein; and a heating part that heats the processing container; wherein the holder is provided with baffle plates each of which forms a processing space for each substrate when the holder is contained in the processing container; the gas-introducing part is provided with gas introduction holes disposed at one lateral side of the respective processing spaces; and the gas-discharging part is provided with gas discharge holes disposed at the other lateral side of the respective processing spaces, oppositely to the gas introduction holes.12-10-2009

Hiroyuki Matsuura, Kobe-Shi JP

Patent application numberDescriptionPublished
20090221090SAMPLE ANALYSIS APPARATUS, SAMPLE ANALYSIS METHOD, AND COMPUTER PROGRAM PRODUCT - A sample analysis apparatus for analyzing a measurement sample prepared by mixing a sample and a reagent includes a condition memory for storing information regarding a plurality of read conditions; an ID acquirer for reading out identification information at a predetermined position in accordance with a predetermined read condition, the identification information being assigned for identification of at least one of a sample container, a reagent container, and a holding section for holding the sample container or the reagent container; an ID acquisition checker for determining whether or not the ID acquirer has successfully read out the identification information; and a read condition changer for changing the predetermined read condition to a different read condition different from the predetermined read condition stored in the condition memory when the ID acquisition checker has determined that the readout operation was not successful.09-03-2009

Hiroyuki Matsuura, Tokyo JP

Patent application numberDescriptionPublished
20080213478VERTICAL CVD APPARATUS AND CVD METHOD USING THE SAME - A vertical CVD apparatus includes a supply system configured to supply process gases into a process chamber, and a control section configured to control an operation of the apparatus. The supply system includes a plurality of first delivery holes connected to a first reactive gas line to supply a first reactive gas, and a plurality of second delivery holes connected to a second reactive gas line to supply a second reactive gas. Each set of the first delivery holes and the second delivery holes are arrayed in a vertical direction at a position adjacent to edges of target substrates, so as to be distributed entirely over the vertical length of the target substrates stacked at intervals. The control section controls the supply system to alternately supply first and second reactive gases, thereby forming a thin film derived from the first and second reactive gases on the target substrates.09-04-2008

Patent applications by Hiroyuki Matsuura, Tokyo JP