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| 20110014193 | HUMANIZED ANTI-HUMAN ALPHA 9-INTEGRIN ANTIBODY - The present invention provides a humanized anti-human α9 integrin antibody having improved activity and/or property as compared to donor mouse anti-human α9 integrin antibody, namely, a humanized anti-human α9 integrin antibody comprising a heavy-chain variable region consisting of the amino acid sequence shown by SEQ ID NO: 1 or the amino acid sequence shown by SEQ ID NO: 1 wherein one or several amino acids are substituted, deleted, inserted and/or added and a light-chain variable region consisting of the amino acid sequence shown by SEQ ID NO: 61 or the amino acid sequence shown by SEQ ID NO: 61 wherein one or several amino acids are substituted, deleted, inserted and/or added, as well as a means for preventing or treating various diseases involving human α9 integrin in their pathogenesis, which uses the antibody. | 01-20-2011 |
| 20110014213 | HUMAN ANTI-ALPHA 9 INTEGRIN ANTIBODY - The present invention provides a human anti-α9 integrin antibody or an antibody fragment which specifically recognize human α9 integrin and mouse α9 integrin, inhibit interaction with their ligands, particularly, the antibody or antibody fragment which recognize loop regions of human and mouse α9 integrins, a gene encoding the antibody or antibody fragment, a recombinant expression vector containing the gene, a transformant harboring the gene, production method of human anti-α9 integrin antibody or antibody fragment using the transformant, and an agent for the prophylaxis or treatment of rheumatoid arthritis which contains the antibody or antibody fragment. | 01-20-2011 |
| 20110059077 | HUMANIZED ANTI-HUMAN ALPHA 9-INTEGRIN ANTIBODY - The present invention provides a humanized anti-human α9 integrin antibody having improved activity and/or property as compared to a donor mouse anti-human α9 integrin antibody, namely, a humanized anti-human α9 integrin antibody containing a heavy-chain variable region consisting of the amino acid sequence shown by SEQ ID NO:11 and a light-chain variable region consisting of the amino acid sequence shown by SEQ ID NO:17, a humanized anti-human α9 integrin antibody containing a heavy-chain variable region consisting of the amino acid sequence shown by SEQ ID NO:13 and a light-chain variable region consisting of the amino acid sequence shown by SEQ ID NO:17, a humanized anti-human α9 integrin antibody containing a heavy-chain variable region consisting of the amino acid sequence shown by SEQ ID NO:15 and a light-chain variable region consisting of the amino acid sequence shown by SEQ ID NO:9, and a means for the prophylaxis or treatment of various diseases involving human α9 integrin in the pathogenesis, which uses the antibody. | 03-10-2011 |
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| 20080227232 | Method for manufacturing display device - An object is to provide a display device that can be manufactured by improvement of use efficiency of a material and simplification of a manufacturing process. A light absorbing layer is formed, an insulating layer is formed over the light absorbing layer, the light absorbing layer and the insulating layer are selectively irradiated with laser light, an irradiated region in the insulating layer is removed to form an opening in the insulating layer, and a conductive film is formed in the opening so as to be in contact with the light absorbing layer. The conductive film is formed in the opening so as to be in contact with the light absorbing layer, which is exposed, so that the light absorbing layer and the conductive layer can be electrically connected with the insulating layer interposed therebetween. | 09-18-2008 |
| 20080267245 | Beam homogenizer, laser irradiation apparatus, and method for manufacturing semiconductor device - The present invention is to provide a beam homogenizer, a laser irradiation apparatus, and a method for manufacturing a semiconductor device, which can suppress the loss of a laser beam and form a beam spot having homogeneous energy distribution constantly on an irradiation surface without being affected by beam parameters of a laser beam. A deflector is provided at an entrance of an optical waveguide or a light pipe used for homogenizing a laser beam emitted from a laser oscillator. A pair of reflection planes of the deflector is provided so as to have a tilt angle to an optical axis of the laser beam, whereby the entrance of the optical waveguide or the light pipe is expanded. Accordingly, the loss of the laser beam can be suppressed. Moreover, by providing an angle adjusting mechanism to the deflector, a beam spot having homogeneous energy distribution can be formed at an exit of the optical waveguide. | 10-30-2008 |
| 20090291569 | LASER IRRADIATION METHOD AND LASER IRRADIATION APPARATUS - The present invention is to provide a laser irradiation technique for irradiating the irradiation surface with the laser beam having homogeneous intensity distribution using a cylindrical lens array without being affected by the intensity distribution of the original beam. A laser beam emitted from a laser oscillator is divided by two kinds of cylindrical lens arrays into a plurality of beams, which are two kinds of linear laser beams with their energy intensity distribution inverted each other, and the two kinds of linear laser beams are superposed in a minor-axis direction. This can form the linear laser beam having homogeneous intensity distribution on the irradiation surface. | 11-26-2009 |
| 20100048036 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND LASER IRRADIATION APPARATUS - It is an object to achieve continuous crystal growth without optical interference using a compact laser irradiation apparatus. A megahertz laser beam is split and combined to crystallize a semiconductor film. At this point of time, an optical path difference is provided between the split beams to reduce optical interference. The optical path difference is set to have a length equivalent to the pulse width of the megahertz laser beam or more and less than a length equivalent to the pulse repetition interval; thus, optical interference can be suppressed with a very short optical path difference. Therefore, laser beams can be applied continuously and efficiently without energy deterioration. | 02-25-2010 |
| 20100301026 | Manufacturing Method of Semiconductor Device and Laser Processing Apparatus - In a manufacturing process of a semiconductor device, a manufacturing technique and a manufacturing apparatus of a semiconductor device which simplify a lithography step using a photoresist is provided, so that the manufacturing cost is reduced, and the throughput is improved. An irradiated object, in which a light absorbing layer and an insulating layer are stacked over a substrate, is irradiated with a multi-mode laser beam and a single-mode laser beam so that both the laser beams overlap with each other, and an opening is formed by ablation in part of the irradiated object the irradiation of which is performed so that both the laser beams overlap with each other. | 12-02-2010 |
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| 20090208238 | IMAGE FORMING DEVICE AND METHOD - An image forming device that uses only one temperature sensor to detect temperatures of the recording sheet and a rotation member for fixing, and can perform the temperature adjustment control carefully in detail during the image forming operation. The CPU 61 performs the temperature adjustment control 1 by executing the temperature adjustment program 64 | 08-20-2009 |
| 20100232826 | COOLING APPARATUS AND IMAGE FORMATION APPARATUS - In an image formation state, to cool a recording sheet on a route from a fixer to a paper ejection roller, a blast fan assumes a first position restrained by a first fixture. Also, in another state, to cool a recording sheet on the catch tray, the blast fan assumes a second position restrained by a second fixture. To transition from the image formation state to another state, the blast fan sends a strong blast in a reverse direction from the normal blast direction. A bias is generated on the blast fan due to the resulting reactive force, the blast fan becomes free from the restraint of the first fixture, and shifts from the first position to the second position. Conversely, to transition from another state to the image formation state, a strong blast is sent in the same direction as the normal blast direction, and the blast fan shifts from the second position to the first position. | 09-16-2010 |
| 20100290795 | TONER CONCENTRATION SENSOR AND TONER CONCENTRATION CONTROL METHOD - In this toner concentration sensor, as the magnetic permeability of a two-component developer | 11-18-2010 |
