Inventors list |
Assignees list |
Classification tree browser |
Top 100 Inventors |
Top 100 Assignees |
Hiroshiro
Koukichi Hiroshiro, Koshi-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20090139656 | Substrate processing apparatus - The present invention provides a substrate processing apparatus for processing substrates by immersing the substrates in a processing liquid. This substrate processing apparatus includes a processing tank having a pair of side walls arranged to be opposed to each other; and a pair of processing-liquid supply mechanisms provided respectively corresponding to the pair of side walls. The pair of processing-liquid supply mechanisms are respectively configured for supplying the processing liquid toward a central portion of the processing tank in the width direction connecting the pair of side walls, thereby to create a rising flow of the processing liquid in a central area in the width direction of the processing tank. Each inner wall face of the pair of side walls includes a main body, a projecting portion located above the main body, and a discharge guide portion located uppermost and providing a discharge port configured for allowing the processing liquid to overflow. The discharge guide portion is inclined upward, opposite to the central portion in the width direction. The projecting portion includes an inner end portion located nearer to the central portion in the width direction, as compared with the main body and discharge guide portion. | 06-04-2009 |
| 20110099838 | FLUID HEATER, MANUFACTURING METHOD THEREOF, SUBSTRATE PROCESSING APPARATUS INCLUDING FLUID HEATER, AND SUBSTRATE PROCESSING METHOD - A fluid heater | 05-05-2011 |
Koukichi Hiroshiro, Saga-Ken JP
Koukichi Hiroshiro, Saga JP
| Patent application number | Description | Published |
|---|---|---|
| 20090101186 | Substrate Processing Apparatus and Substrate Processing Method - Disclosed is a substrate processing apparatus for cleaning and drying a substrate such as a semiconductor wafer. This substrate processing apparatus includes a liquid processing unit for processing a substrate by immersing the substrate in stored purified water, a drying unit arranged above the liquid processing unit and configured to dry the substrate, a substrate transfer apparatus for transferring the substrate between the liquid processing unit and drying unit, a fluid supply mechanism for supplying a fluid mixture containing vapor or mist of purified water and vapor or mist of a volatile organic solvent to the drying unit, and a controller for controlling the supply of the fluid mixture. | 04-23-2009 |
Koukichi Hiroshiro, Koshi City JP
| Patent application number | Description | Published |
|---|---|---|
| 20110117291 | TEMPLATE TREATMENT METHOD, PROGRAM, COMPUTER STORAGE MEDIUM, TEMPLATE TREATMENT APPARATUS AND IMPRINT SYSTEM - In a template treatment of forming a film of a release agent on a treatment surface of a template, the treatment surface of the template is first cleaned. Thereafter, in a coating unit, the release agent is applied to the treatment surface of the template. The release agent on the template is then dried. Then, alcohol is applied to the release agent on the template to make the release agent adhere to the treatment surface of the template and to remove an unreacted portion of the release agent. Thereafter, the alcohol on the template is dried and removed. In this manner, a film of the release agent is formed in a predetermined film thickness on the treatment surface of the template. | 05-19-2011 |
Koukichi Hiroshiro, Tosu-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20110290280 | SUBSTRATE PROCESSING METHOD AND NON-TRANSITORY STORAGE MEDIUM FOR CARRYING OUT SUCH METHOD - Disclosed is a substrate processing apparatus for cleaning and drying a substrate such as a semiconductor wafer. This substrate processing apparatus includes a liquid processing unit for processing a substrate by immersing the substrate in stored purified water, a drying unit arranged above the liquid processing unit and configured to dry the substrate, a substrate transfer apparatus for transferring the substrate between the liquid processing unit and drying unit, a fluid supply mechanism for supplying a fluid mixture containing vapor or mist of purified water and vapor or mist of a volatile organic solvent to the drying unit, and a controller for controlling the supply of the fluid mixture. | 12-01-2011 |