Inventors list |
Assignees list |
Classification tree browser |
Top 100 Inventors |
Top 100 Assignees |
Hiroshi Uehara
Hiroshi Uehara, Osaka JP
| Patent application number | Description | Published |
|---|---|---|
| 20100075763 | DAMPER MECHANISM - A damper mechanism | 03-25-2010 |
| 20100130289 | DAMPER MECHANISM - A damper mechanism | 05-27-2010 |
| 20100178991 | DAMPER MECHANISM - A damper mechanism | 07-15-2010 |
| 20100206681 | CLUTCH COVER ASSEMBLY - A clutch cover assembly ( | 08-19-2010 |
Hiroshi Uehara, Chiba-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20100130662 | CROSSLINKED MATERIAL OF PROPYLENE RESIN COMPOSITION, A PROCESS FOR PRODUCING THE CROSSLINKED MATERIAL AND CROSSLINKED MOLDED ARTICLE FORMED FROM THE CROSSLINKED MATERIAL - The crosslinked material of the present invention is obtainable by crosslinking a propylene resin composition through irradiation with an ionizing radiation wherein the propylene resin composition comprises 100 parts by mass of a propylene resin comprising 15 to 99% by mass of a propylene polymer (A) having a melting point, as measured by a differential scanning calorimeter (DSC), of 120 to 170° C., and 1 to 85% by mass of propylene polymer (B) having a melting point, as measured by a differential scanning calorimeter (DSC), of below 120° C. or not observed (provided that the total of the components (A) and (B) is 100% by mass), and 0.1 to 5 parts by mass of a crosslinking assistant (C). The production process of the crosslinked material of the present invention comprises a step of molding the propylene resin composition into a molded form, and a step of crosslinking the molded form through irradiation with an ionizing radiation. The crosslinked molded article of the present invention is formed from the crosslinked material. | 05-27-2010 |
Hiroshi Uehara, Chiba JP
| Patent application number | Description | Published |
|---|---|---|
| 20080249219 | Resin Composition And Molded Body Made From Same - [Problem] A resin composition having excellent moldability and a sufficiently high surface hardness, which is excellent in preventing oil bleed-out problems, is provided. | 10-09-2008 |
| 20090249645 | Ethylenic copolymer, compostion containing the copolymer and use thereof - An object of the present invention is to provide a novel ethylene-α-olefin copolymer excellent in crosslinking properties; a foamed molded article having a low specific gravity and a low compression set (CS) and a composition capable of producing the foamed molded article, footwear parts composed of a foamed molded article; an ethylenic copolymer composition excellent in balance between weather resistance and mechanical strength, and an electric wire coating material and an electric wire sheath using the ethylenic copolymer composition; and a thermoplastic elastomer capable of producing a molded article excellent in balance between mechanical strength and toughness. The ethylenic copolymer (A) of the present invention is a copolymer composed of only ethylene and an α-olefin having 3 to 20 carbon atoms, and is characterized in that vinyl-group content (a) per 1000 carbon atoms as measured by infrared absorption spectroscopy, MFR | 10-08-2009 |
| 20100130716 | CROSSLINKED MATERIAL OF PROPYLENE POLYMER - The present invention provides a crosslinked material of a propylene polymer (A) obtainable by crosslinking the propylene polymer (A) comprising a constitutional unit derived from propylene in an amount of not less than 50 mol %, and having a Shore D hardness of not more than 57 as measured in accordance with ASTM D 2240, and a thermal deformation of not more than 10% as measured at 180° C. under a load of 1.1 Kg in accordance with JIS C3005. The crosslinked material of the propylene polymer (A) having the above composition and physical properties has high flexibility, and excellent heat resistance and excellent scratch resistance. | 05-27-2010 |
Hiroshi Uehara, Saitama JP
| Patent application number | Description | Published |
|---|---|---|
| 20090174286 | METHODS FOR ADJUSTING FREQUENCY OF PIEZOELECTRIC VIBRATING PIECES, PIEZOELECTRIC DEVICES, AND TUNING-FORK TYPE PIEZOELECTRIC OSCILLATORS - A piezoelectric frame includes a tuning-fork type piezoelectric vibrating piece having excitation electrodes on each of at least two vibrating arms extending in a first direction from one end of a base portion thereof. Respective supporting arms extend in a first direction from respective external edges of the vibrating arms. An outer frame portion surrounds the tuning-fork type piezoelectric vibrating piece. The connecting portions have designated widths and connect the respective supporting arms to the outer frame portion. During manufacture, the designated widths are trimmed (e.g., by a pulsed laser) until the desired vibration frequency is obtained. | 07-09-2009 |
| 20100079040 | PIEZOELECTRIC DEVICES HAVING IMPROVED IMPACT RESISTANCE - An exemplary piezoelectric vibrating device has a lid plate, a chip plate including a tuning-fork type vibrating piece surrounded by an outer frame, and a package base arranged where the chip plate is sandwiched between the lid plate and package base, and the three layers are bonded together. The tuning-fork type piezoelectric vibrating piece is connected to the outer frame by supporting arms. A base-movement buffer having a predetermined height in the X-direction extends from the inner edge surface of the outer frame toward a side edge of the base. The base-movement buffer has a height in the X-direction that is proportional to the length from the base-movement buffer to a point at which the tuning-fork type piezoelectric vibrating piece is coupled to the outer frame. | 04-01-2010 |
Hiroshi Uehara, Hirakatashi Osaka JP
Hiroshi Uehara, Kanagawa JP
| Patent application number | Description | Published |
|---|---|---|
| 20090197012 | PLASMA CVD APPARATUS - In a plasma CVD apparatus, unnecessary discharge such as arc discharge is prevented, the amount of particles due to peeling of films attached to a reaction chamber is reduced, and the percentage of a time contributing to production in hours of operation of the apparatus is increased while enlargement of the apparatus and easy workability are maintained. The plasma CVD apparatus is configured such that in a conductive reaction chamber | 08-06-2009 |
Hiroshi Uehara, Hitakata-Shi Osaka JP
| Patent application number | Description | Published |
|---|---|---|
| 20090069098 | DAMPER MECHANISM - A damper mechanism ( | 03-12-2009 |