| Patent application number | Description | Published |
|---|
| 20100097715 | NANOIMPRINTING RESIN COMPOSITION - Nanoimprinting resin compositions are cured quickly and uniformly, are patterned by transferring evenly without transfer failure, and are suited for UV nanoimprinting methods and thermal nanoimprinting methods. The invention also provides micropatterned films of the compositions and processes for producing such films, magnetic disk media obtained with the films and production processes therefor, and recording/reproducing apparatuses for recording information in the magnetic disk media or for reproducing information from the magnetic disk media. | 04-22-2010 |
| 20100258983 | EPOXY GROUP-CONTAINING ORGANOSILOXANE COMPOUND, CURABLE COMPOSITION FOR TRANSFER MATERIALS AND METHOD FOR FORMING MICROPATTERN USING THE COMPOSITION - The present invention has an object to provide a curable composition for transfer materials. The curable composition is applicable to a UV nanoimprint process capable of forming micropatterns with high throughput, is applicable to a thermal nanoimprint process in some cases, and is capable of forming a micropattern having high selectivity on etching rates regarding a fluorine-based gas and an oxygen gas. A curable composition for transfer materials of the present invention contains a curable silicon compound produced by subjecting a silicon compound (A) having a Si—H group and a compound (B) having a curable functional group and a carbon-carbon double bond other than the curable functional group to a hydrosilylation reaction. | 10-14-2010 |
| 20100316889 | CURABLE COMPOSITION FOR TRANSFER MATERIALS AND METHOD FOR FORMING MICROPATTERN USING THE CURABLE COMPOSITION - The present invention has an object to provide a curable composition for transfer materials. The curable composition is applicable to a UV nanoimprint process capable of forming micropatterns with high throughput, is applicable to a thermal nanoimprint process in some cases, and is capable of forming a micropattern having high selectivity on etching rates regarding a fluorine-based gas and an oxygen gas. The curable composition for transfer materials comprises a silsesquioxane skeleton-containing compound having, in its molecule, a specific silsesquioxane skeleton and a curable functional group. | 12-16-2010 |
| 20110003176 | PROCESS FOR FORMING CONCAVO-CONVEX PATTERNS, AND PROCESS FOR MANUFACTURING MAGNETIC RECORDING MEDIA USING THE SAME - An object of the present invention is to provide a process for forming concavo-convex patterns which uses a resist-forming material having excellent oxygen etching resistance and long working life and which enables to carry out the imprinting (mold pressing) with good rectangular shape properties at normal temperature. | 01-06-2011 |
| 20110009652 | PROCESS FOR PRODUCTION OF EPOXY COMPOUND - A novel process for producing a polyfunctional epoxy monomer is provided that facilitates separation of an aqueous layer catalyst from a reaction solution and has satisfactory hydrogen peroxide efficiency by reacting an aqueous hydrogen peroxide solution with a polyolefin without using an organic solvent and under mild conditions. The process in the present invention is a process for producing a corresponding epoxy compound by reacting an organic compound having a carbon-carbon double bond with hydrogen peroxide present in an aqueous hydrogen peroxide solution to epoxidate the double bond, wherein a tungsten compound and tertiary amine are used as reaction catalysts. | 01-13-2011 |
| 20110021788 | EPOXY COMPOUND AND PROCESS FOR PRODUCING THE EPOXY COMPOUND - An object of the present invention is to provide an epoxy compound which has a quick curing rate and is excellent in an etching durability and a selectivity and which is liquid at room temperature and a process for producing the above epoxy compound. The epoxy compound of the present application is represented by Formula (I): | 01-27-2011 |
| 20110144279 | EPOXY GROUP-CONTAINING COPOLYMER, EPOXY (METH)ACRYLATE COPOLYMER USING THE SAME AND THEIR PRODUCTION PROCESSES - According to the present invention, a novel epoxy group-containing copolymer, including a production process thereof, and an epoxy (meth)acrylate copolymer starting from the epoxy group-containing copolymer, including a production process thereof are provided. The epoxy group-containing copolymer of the present invention contains a specific epoxy group-containing repeating unit and an olefin-based repeating unit. A novel epoxy (meth)acrylate copolymer of the present invention is produced by reacting the epoxy group-containing copolymer with (meth)acrylic acid. | 06-16-2011 |
| 20110206834 | CURABLE COMPOSITION FOR TRANSFER MATERIALS, AND PATTERN FORMING PROCESS - An object of the invention is to provide curable compositions for transfer materials suited for nanoimprinting processes, which compositions have high dry etching resistance against argon gas and high selectivity of dry etching rate between by argon gas and by oxygen gas, and can be fabricated into fine patterns used as resists or the like. A curable composition for transfer materials includes a (meth)acrylate compound having a triazine skeleton which is obtainable by reacting an aminotriazine compound, a compound having a hydroxyl group and a (meth)acryloyl group in the molecule, and an aldehyde. | 08-25-2011 |
