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Hiroshi Tsuchiya
Hiroshi Tsuchiya, Shinjuku-Ku JP
| Patent application number | Description | Published |
|---|---|---|
| 20110102945 | MAGNETIC DISK SUBSTRATE, METHOD FOR MANUFACTURING THE SAME, AND MAGNETIC DISK - Provided are a magnetic disk substrate that can be adapted to a reduction in flying height of a head in an HDD and to an increase in rotational speed therein, and a method of manufacturing such a substrate. | 05-05-2011 |
Hiroshi Tsuchiya, Tokyo JP
| Patent application number | Description | Published |
|---|---|---|
| 20100247976 | GLASS SUBSTRATE FOR A MAGNETIC DISK AND METHOD OF MANUFACTURING THE SAME - A glass substrate is for use in a magnetic disk. The glass substrate is formed by using a plate-like glass produced by a float method and having a pair of main surfaces. One surface of the main surfaces, which is formed with a tin layer when producing the plate-like glass by the float method, is caused to serve as a surface not for use in magnetic recording and the other surface formed with no tin layer is caused to serve as a surface for use in magnetic recording. | 09-30-2010 |
| 20100247977 | SUBASTRATE FOR A MAGNETIC DISK AND METHOD OF MANUFACTURING THE SAME - In a magnetic disk substrate having first and second chamfered faces respectively connecting between first and second main surfaces opposite to each other and an edge face located between the first and second main surfaces, the ranges of the first and second chamfered faces are specified. Specifically, the distance a from a first boundary portion being a boundary between the first main surface and the first chamfered face to a point of intersection between the first main surface and an extended line of the edge face and the distance b from a second boundary portion being a boundary between the second main surface and the second chamfered face to a point of intersection between the second main surface and an extended line of the edge face are set to satisfy a/b≧1.6. | 09-30-2010 |
| 20100247978 | METHOD OF MANUFACTURING A SUBSTRATE FOR A MAGNETIC DISK - A magnetic disk substrate manufacturing method of this invention includes a main surface polishing process that polishes disk-shaped glass substrates by the use of a polishing machine having a carrier pressed between a pair of polishing surface plates and adapted to make an orbital motion while rotating on its axis in a state of holding the disk-shaped glass substrates. In the polishing machine, the carrier is placed in a state where a plate-like member is disposed on one side of main surfaces of the disk-shaped glass substrate, so that only the other side of the main surfaces of the disk-shaped glass substrate is polished while allowing the one side of the main surfaces of the disk-shaped glass substrates to be a non-polishing main surface. | 09-30-2010 |
| 20110067494 | REFERENCE VIBRATOR - A reference vibrator | 03-24-2011 |
Hiroshi Tsuchiya, Hamamatsu-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20110065165 | METHOD FOR CULTURING PLANKTONIC MICROALGAE - The present invention relates to a method for culturing planktonic microalgae, comprising: culturing planktonic microalgae with a culture substrate containing a visible light transmissive fiber with a hydrophilic surface, where a space diameter between the fibers is from 10 μm to 500 μm. | 03-17-2011 |
Hiroshi Tsuchiya, Yamaguchi JP
| Patent application number | Description | Published |
|---|---|---|
| 20100109809 | THIN FILM PIEZOELECTRIC RESONATOR AND THIN FILM PIEZOELECTRIC FILTER - Provided is a thin film piezoelectric resonator which includes a piezoelectric resonator stack ( | 05-06-2010 |
Hiroshi Tsuchiya, Hwaseong-Si JP
| Patent application number | Description | Published |
|---|---|---|
| 20090242128 | PLASMA PROCESSING APPARATUS AND METHOD - A plasma processing apparatus includes an radio frequency (RF) power supply for applying an RF power for generating a plasma to at least one of an upper and a lower electrode which are disposed to face each other in a processing chamber, a high voltage power supply for applying a high voltage to the lower electrode to electrostatically adsorb the substrate to be held thereon and a control unit for controlling the RF power supply and the high voltage power supply. The control unit controls the high voltage power supply so as to apply a high voltage equal to or less than −1500 V to the lower electrode. | 10-01-2009 |
Hiroshi Tsuchiya, Hwaseong-Si KR
| Patent application number | Description | Published |
|---|---|---|
| 20090229759 | ANNULAR ASSEMBLY FOR PLASMA PROCESSING, PLASMA PROCESSING APPARATUS, AND OUTER ANNULAR MEMBER - An annular assembly for plasma processing which can prevent poor attraction of a substrate. The annular assembly is comprised of a focus ring that is mounted on a mounting stage and disposed such as to surround an outer periphery of a substrate subjected to the plasma processing, and an outer annular member that is disposed such as to surround an outer periphery of the focus ring. The outer annular member has an exposed surface that is exposed into a processing space in which plasma is produced, and the exposed surface is covered with yttria. | 09-17-2009 |
Hiroshi Tsuchiya, Kobe-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20080254492 | IMMUNOASSAY METHOD, REAGENT KIT FOR DETECTING ALKALINE PHOSPHATASE, AND REAGENT KIT FOR IMMUNOASSAY - An immunoassay method comprising: | 10-16-2008 |