| Patent application number | Description | Published |
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| 20100165300 | ILLUMINATION APPARATUS AND PROJECTION DISPLAY APPARATUS USING THE SAME - An illumination apparatus includes a light source ( | 07-01-2010 |
| 20100315316 | IMAGE SYSTEM, DISPLAY DEVICE AND EYEGLASSES DEVICE USED IN THE SAME - An image system includes: a display device configured to display an image; and an eyeglasses device for viewing the image displayed by the display device, wherein the display device includes: a display portion configured to display in time series the image to be viewed through the eyeglasses device; a signal generation portion configured to generate a synchronization signal for synchronizing timing of switching of frames of the image; and a transmission portion configured to transmit the synchronization signal, the eyeglasses device includes: an optical filter portion configured to adjust an amount of light of the image; a reception portion configured to receive the synchronization signal transmitted from the transmission portion; and a control portion configured to control action of the optical filter portion corresponding to the switching of the frames of the image, based on the synchronization signal, the signal generation portion further generates a parameter signal including action information for defining an action of the optical filter portion, the transmission portion transmits the parameter signal to the reception portion, and the control portion controls the action of the optical filter portion according to the action information of the parameter signal for defining the action of the optical filter portion. | 12-16-2010 |
| 20100328439 | IMAGE SYSTEM, IMAGE DISPLAY DEVICE AND IMAGE VIEWING EYEGLASSES WITH THEM - An image system comprises an image display device which displays images, and image viewing eyeglasses used for viewing images displayed by the image display device. The image display device comprises an image display device configured to display image; and image viewing eyeglasses used for viewing the image displayed by the image display device, wherein the image display device includes: a display portion configured to display the image in time series to be viewed using the image viewing eyeglasses; a synchronization signal generator configured to generate a synchronization signal in synchronization with frame of the image, the synchronization signal including prescribed bit series to transmit bit data described by the presence or absence of a pulse; and a synchronization signal transmitter configured to transmit the synchronization signal, and the image viewing eyeglasses include: an optical filter portion configured to adjust an amount of light transmitted to a left eye and a right eye of a viewer; a synchronization signal receiver configured to receive the synchronization signal transmitted from the synchronization signal transmitter; a synchronization signal analyzer configured to detect the bit series, analyze a pattern of the bit series during a predetermined detection time when the synchronization signal analyzer detects the first pulse received by the synchronization signal receiver, and generate control data to control the optical filter portion; and an optical filter controller configured to control the optical filter portion with the control data. | 12-30-2010 |
| 20110012920 | COLOR CONVERSION DEVICE, COLOR CONVERSION TABLE AND COLOR CONVERSION METHOD - A color conversion device ( | 01-20-2011 |
| 20110134228 | IMAGE SIGNAL PROCESSING APPARATUS, IMAGE SIGNAL PROCESSING METHOD, RECORDING MEDIUM, AND INTEGRATED CIRCUIT - An image signal processing apparatus outputs, alternately on a-per frame basis, a first image to be displayed to one of left and right eyes of a viewer and a second image to be displayed to the other eye, and transmits, to a pair of image viewer glasses, a synchronizing signal for controlling timing of opening and closing of optical filters so as to allow the viewer to see the output frames through corresponding eyes. Specifically, the apparatus includes: a persistence amount detecting unit which detects a persistence amount indicating an effect of a first frame in the first image on a second frame in the second image and immediately following the first frame; and an optical-filter adaptive control unit which generates the synchronizing signal indicating timing of opening and closing of the optical filter corresponding to the second frame. The timing is changed based on the persistence amount detected. | 06-09-2011 |
| 20110134229 | IMAGE SIGNAL PROCESSING APPARATUS, IMAGE SIGNAL PROCESSING METHOD, RECORDING MEDIUM, AND INTEGRATED CIRCUIT - An image signal processing apparatus performs gradation control on respective pixels. Specifically, the image signal processing apparatus includes an image signal processing unit which controls light emission and non-light emission of respective subfields so as to provide a field having a level of brightness. Here, the field is a unit display period of the pixels and divided into the subfields which have different light emission periods and are arranged in a predetermined sequence. In the predetermined sequence, the subfields are arranged in a manner such that a subfield having the shortest light emission period among the subfields is in the first place, one of a subfield having the longest light emission period and a subfield having the second longest light emission period among the subfields is in the second place, and the other one is in the third place. | 06-09-2011 |
| Patent application number | Description | Published |
|---|
| 20090026369 | Electron Beam Inspection System and an Image Generation Method for an Electron Beam Inspection System - An object of the present invention is to provide an inspection system using a scanning electron microscope that detects a high-precision electron beam image and at the same time, removes restrictions for a low sampling rate, which presents a problem at this point, of an AD converter element and an inspection method. | 01-29-2009 |
| 20090045338 | Inspection method and apparatus using an electron beam - An inspection method and apparatus irradiates a sample on which a pattern is formed with an electron beam, so that an inspection image and a reference image can be generated on the basis of a secondary electron or a reflected electron emitted by the sample. An abnormal pattern is determined based on a difference in halftone values of each pixel between the inspection image and the reference image. A plurality of feature quantities of the abnormal pattern are obtained from an image of the abnormal pattern, and, based on the distribution of the plurality of feature quantities of the abnormal pattern, a range for classifying the type of the abnormal pattern is designated. Thus, a desired defect can be extracted from many defects extracted by inspection. | 02-19-2009 |
| 20090123059 | INSPECTION APPARATUS AND INSPECTION METHOD USING ELECTRON BEAM - A visual inspection apparatus and method using the scanning electron microscope are disclosed. An electron beam is scanned repeatedly on a sample, and an inspection and a reference image are generated by the secondary electrons generated from the sample or reflected electrons. From the differential image between the inspection image and the reference image, a defect is determined. The number of pixels in the generated image along the direction of repetitive scanning by the electron beam can be changed. | 05-14-2009 |
| 20090208092 | APPERANCE INSPECTION APPARATUS WITH SCANNING ELECTRON MICROSCOPE AND IMAGE DATA PROCESSING METHOD USING SCANNING ELECTRON MICROSCOPE - The present invention provides an appearance inspection apparatus that allows a user to give precedence to either defect detection performance or throughput. The appearance inspection apparatus allows a user to select the frequency of a digital image signal or the ratio of the frequency of the digital image signal to a sampling rate. Further, a user is allowed to select either throughput improvement or S/N improvement to prioritize. | 08-20-2009 |
| 20100008564 | INSPECTION APPARATUS FOR INSPECTING PATTERNS OF A SUBSTRATE - A pattern inspection apparatus has a setting unit of a plurality of cell areas A and B of different cell comparison pitches and inspects the plurality of cell areas of the different cell comparison pitches in accordance with settings of the setting unit. As information to read out image data for an inspection image and a reference image from an image memory, in addition to position information of a defective image, identification information showing either a cell comparison or a die comparison and relative position information of the reference image can be set. The apparatus also has a unit for setting a plurality of inspection threshold values every inspection area and inspects a plurality of inspection areas by the plurality of inspection threshold values. | 01-14-2010 |
| 20100246933 | Pattern Inspection Method And Apparatus - An apparatus for processing a defect candidate image, including: a scanning electron microscope for taking an enlarged image of a specimen by irradiating and scanning a converged electron beam onto the specimen and detecting charged particles emanated from the specimen by the irradiation; an image processor for processing the image taken by the scanning electron microscope to detect defect candidates on the specimen and classify the detected defect candidates into one of plural classes; a memory for storing output from the image processor including images of the detected defect candidates; and a display unit which displays information stored in the memory and an indicator, wherein the display unit displays a distribution of the detected and classified defect candidates in a map format by distinguishing by the classified class, and the display unit also displays an image of a defect candidate stored in the memory together with the map which is indicated on the map by the indicator. | 09-30-2010 |
| 20110163230 | CHARGED PARTICLE BEAM DEVICE - There is provided a substrate inspection device which uses a charged particle beam and is capable of more quickly extracting a defect candidate than ever before. The configuration of the substrate inspection device is such that a substrate having a circuit pattern is irradiated with a primary charged particle beam, the substrate is moved at a constant speed or at an increasing or a decreasing speed, a position resulting from the movement is monitored, the position of irradiation with the primary charged particle beam is controlled according to the coordinates of the substrate, an image in a partial region on the substrate is captured at a speed lower than the velocity of the movement, a defect candidate is detected based on the captured image, and the detected defect candidate is displayed in a map format. | 07-07-2011 |
