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Hiroshi Kojima, Tokyo JP

Hiroshi Kojima, Tokyo JP

Patent application numberDescriptionPublished
20090017257PROCESSING METHOD OF GLASS SUBSTRATE, AND HIGHLY FLAT AND HIGHLY SMOOTH GLASS SUBSTRATE - The present invention is to provide a processing method for manufacturing a highly flat and highly smooth glass substrate with good productivity. A highly flat and highly smooth glass substrate is obtained with good productivity by processing of a glass substrate, which comprises a step of measuring the surface shape of the glass substrate prior to processing, a step of processing the surface of the substrate by changing a processing condition for each site (first processing step), and a step of finish-polishing the surface of the glass substrate that has been subjected to the first processing step (second processing step). At that time, the processing condition for each site within the surface of the substrate in the first processing step is determined from a processing amount that is determined from the concave-convex shape of the surface of the glass substrate prior to processing and the in-plane distribution of a processing amount by the second processing step separately measured by using a similar substrate.01-15-2009
20090164288Scheduling Apparatus, Scheduling Method and Recording Medium - Has a resource/period management part (06-25-2009
20090297807PLASTIC LENS, MANUFACTURING METHOD THEREOF, AND MANUFACTURING METHOD OF HARD COAT LIQUID - A manufacturing method of plastic lens includes the steps of: preparing a first liquid containing at least one metal oxide and a second liquid containing at least one organosilicon compound; manufacturing a hard coat liquid by mixing the first liquid and the second liquid so that the mass ratio of the solid content of the first liquid to the solid content of second liquid falls within a range of 45/55 to 65/35; and coating the hard coat liquid on a plastic lens substrate to form a hard coat film and then curing the hard coat film.12-03-2009
20090311536Plastic Lens - A plastic lens is provided which is excellent in abrasion resistance, transparency and appearance, and the plastic lens contains, as a substrate, a lens containing a resin having an NHCO structure and a resin containing a specific monomer, and a cured film having an NHCO structure formed by reacting a coating composition directly on the substrate, the coating composition containing a component (i) that is at least one selected from a specific organosilicon compound and a hydrolysate thereof, a component (ii) that is at least one selected from an amino group-containing organic compound, a hydroxyl group-containing organic compound, a mercapto group-containing organic compound, an amino group-containing organosilicon compound, a hydroxyl group-containing organosilicon compound and a mercapto group-containing organosilicon compound, and a component (iii) that is at least one selected from an isocyanate group-containing organic compound and an isocyanate group-containing organosilicon compound.12-17-2009
20090317541FUNCTIONAL SILANE COMPOUND, COATING SOLUTION, AND METHOD FOR MANUFACTURING PLASTIC LENS - A functional silane compound is provided. The functional silane compound realizes a coat film having both adhesiveness and abrasion resistance and allowing a reaction thereof to be easily controlled. The functional silane compound includes silicon with a hydrolyzable functional group formed at the end of a chain molecule and one or more urea bonds in the middle of the chain molecule.12-24-2009
20100075577METHOD OF POLISHING GLASS SUBSTRATE - An object of the present invention is to provide a polishing method for diminishing concave defects of a glass substrate used in a reflective mask for EUVL and the like. The invention relates to a method of polishing a glass substrate which comprises polishing a major surface of the glass substrate while feeding a polishing slurry between the glass substrate and a pad surface of a polishing pad, wherein the polishing load of the polishing pad is from 1 to 60 g/cm03-25-2010
20100086864METHOD OF POLISHING GLASS SUBSTRATE - The present invention is to provide a method of polishing a glass substrate required to have extremely high surface smoothness and surface accuracy like glass substrates for mask blanks. The invention relates to a method of polishing a glass substrate which comprises polishing the glass substrate with a polishing pad while supplying a polishing slurry comprising an abrasive material and water to the polishing pad, wherein the polishing slurry contains at least one member selected from the group consisting of pullulan and water-soluble alcohols which are polyvalent organic compounds having two or more OH groups. The slurry preferably has a pH adjusted to 0.5-4.04-08-2010
20100101940METHOD FOR REMOVING FOREIGN MATTER FROM GLASS SUBSTRATE SURFACE AND METHOD FOR PROCESSING GLASS SUBSTRATE SURFACE - An object of the invention is to provide a method for removing foreign matter from a glass substrate surface to be finish-processed by a method accompanied with beam irradiation or laser light irradiation on the glass substrate surface. The present invention relates to a method for removing foreign matter from a glass substrate surface, which includes subjecting the glass substrate surface to gas cluster ion beam etching at an accelerating voltage of from 5 to 15 keV.04-29-2010

Patent applications by Hiroshi Kojima, Tokyo JP