| Patent application number | Description | Published |
|---|
| 20090165872 | Gas Supply Unit and Gas Supply System - A gas supply unit and a gas supply system that are small-sized and inexpensive. The gas supply unit is installed on operation gas conveyance pipeline and has fluid control devices communicated via flow path blocks and controlling operation gas. The gas supply unit has the first flow path block, to one side of which an inlet open/close valve included in the fluid control devices is attached, and also has the second flow path block, to one side of which a purge valve included in the fluid control devices is attached. The first flow path block and the second flow path block are layered in the direction perpendicular to the conveyance direction of the operation gas. The inlet open/close valve and the purge valve are arranged between a mass flow controller installed on the operation gas conveyance pipeline and an installation surface where the unit is installed. | 07-02-2009 |
| 20100213275 | TARGET SUPPLY APPARATUS, CONTROL SYSTEM, CONTROL APPARATUS AND CONTROL CIRCUIT THEREOF - A target supply apparatus includes a tank for storing a liquid target material, a nozzle for outputting the liquid target material in the tank, and a gas supply source for supplying gas into the tank, and controls a gas pressure inside the tank with a pressure of the gas supplied from the gas supply source which is provided with a pressure regulator. The target supply apparatus also includes a pressure-decrease gas passage of which one end is connected to the tank and the other end forms an exhaust port, a pressure-decrease valve provided on the pressure-decrease gas passage, and a controller for controlling open/close of the pressure-decrease valve. The controller, when the target material is caused not to output from the nozzle, opens the pressure-decrease valve and decreases the pressure inside the tank. | 08-26-2010 |
| Patent application number | Description | Published |
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| 20080314564 | TEMPERATURE CONTROL DEVICE - A temperature control device controls the temperature of a controlled object by circulating a fluid in a temperature adjustment unit arranged near the controlled object. The temperature control device comprises a heating pathway that heats and circulates the fluid in the temperature adjustment unit, a cooling pathway that cools and circulates the fluid in the temperature adjustment unit, a bypass pathway that does not pass the fluid through the heating pathway and cooling pathway, but circulates the fluid in the temperature adjustment unit, and adjustment means that adjust a flow ratio of the fluid that is supplied from the heating pathway, cooling pathway, and bypass pathway to the temperature adjustment unit via a confluence unit that combines these flows. The adjustment means are provided on a downstream side of each of the heating pathway, the cooling pathway, and the bypass pathway and on the upstream side of the confluence unit. | 12-25-2008 |
| 20100123092 | FLUID CONTROL VALVE - A fluid control valve comprises a ferromagnetic material portion that is formed on the spool so as to extend in the axial direction of the spool, permanent magnets that are arranged opposite each other having the middle portion therebetween in a direction orthogonal to the axial direction of the spool, form between themselves oppositely oriented magnetic fields aligned in the axial direction, and which are formed to be longer than the middle portion in the axial direction of the spool, and a coil that is arranged in a direction orthogonal to the axial direction of the spool with respect to the permanent magnets and generates a magnetic field that penetrates the opposing permanent magnets due to the conduction of electricity. | 05-20-2010 |
| 20110174380 | VACUUM CONTROL SYSTEM AND VACUUM CONTROL METHOD - This invention provides a vacuum control system using a vacuum pump to control a vacuum pressure and a flow of a processing gas in a vacuum chamber. The vacuum control system includes: a plurality of vacuum control valves, each of the valves being connected between each of a plurality of gas discharge ports and the vacuum pump; a pressure measurement unit configured to measure the vacuum pressure of the processing gas supplied to the object; and a controller configured to manipulate respective openings of the valves in accordance with the measured vacuum pressure. | 07-21-2011 |
| 20110219890 | SAMPLE INJECTOR - This invention provides a sample injector for injecting a fixed amount of a sample into a mobile phase medium and discharging the mobile phase medium with the sample. The sample injector includes a first member having a medium passage for supplying the mobile phase medium and a sample passage for supplying the sample and a second member having a discharge passage for discharging the mobile phase medium with the sample to an outside of the injector. The second member is provided in contact with the first member. The first member and the second member are configured to move to a sample charging position and a sample injection position. The sample charging position is for the sample chamber to connect with the sample passage. The sample injection position is for the sample chamber to connect with the medium passage and the discharge passage. | 09-15-2011 |
| 20110233923 | CONNECTED STRUCTURE OF VACUUM DOUBLE PIPE, VACUUM DOUBLE PIPE, AND JOINT OF VACUUM DOUBLE PIPE - This invention provides a connected structure of vacuum double pipes. The connected structure comprises a plurality of vacuum double pipes and a joint configured to connect the plurality of vacuum double pipes. The vacuum passage is open at both end in an extension direction of the inner pipe and sealed between the both ends. The joint includes an inner pipe joint unit having inner pipe connectors and an outer pipe joint unit having outer pipe connectors. The evacuation passage is sealed between the outer pipe connectors that connect the vacuum passages of the outer pipes. | 09-29-2011 |
| 20110285125 | COUPLING APPARATUS FOR CHEMICAL FLUID FLOW CHANNEL - This invention provides a chemical fluid flow channel coupling apparatus that couples and decouples chemical fluid flow channels. The coupling apparatus includes a first coupling unit; and a second coupling unit. The first coupling unit includes a first chemical fluid valve member chamber and a first valve member configured to open and close a first chemical fluid opening communicated with the first chemical fluid flow channel; and a purging fluid supply control valve configured to open and close the purging fluid supply flow channel. The second coupling unit includes a second chemical fluid valve member chamber, and a second valve member configured to open and close a second chemical fluid opening connected to the second chemical fluid flow channel; and a purging fluid discharge control valve. | 11-24-2011 |
