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Hiroshi Haji

Hiroshi Haji, Yamanashi JP

Patent application numberDescriptionPublished
20110014777METHOD FOR PROCESSING A SUBSTRATE, METHOD FOR MANUFACTURING A SEMICONDUCTOR CHIP, AND METHOD FOR MANUFACTURING A SEMICONDUCTOR CHIP HAVING A RESIN ADHESIVE LAYER - A mask used when a semiconductor wafer is diced into individual semiconductor chips by plasma etching is formed as follows. First, a pattern of a liquid-repellent film is formed by printing a liquid-repellent liquid on the area to be etched on the rear surface of the semiconductor wafer. Next, a resin film thicker than the liquid-repellent film is formed in the area not having the liquid-repellent film by supplying a liquid resin to the rear surface on which the liquid-repellent pattern has been formed. Then, the resin film is cured to form the mask covering the area other than the area to be removed by the etching. This method allows the formation of an etching mask without using a high-cost method such as photolithography.01-20-2011

Hiroshi Haji, Fukuoka JP

Patent application numberDescriptionPublished
20090000109Electronic Component Pickup Method, Electronic Component Mounting Method and Electronic Component Mounting Apparatus - To provide an electronic component pickup method, an electronic component mounting method and an electronic component mounting device capable of stably picking up, with high productivity, an electronic component adhered and held to a carrier.01-01-2009
20090004780Method for Fabricating Semiconductor Chip - After a film layer 01-01-2009
20090035892Component Bonding Method, Component Laminating Method And Bonded Component Structure - It is an object of the invention to provide a component bonding method and a component laminating method that can improve productivity in the heat pressing process.02-05-2009
20090197393Method for dividing semiconductor wafer and manufacturing method for semiconductor devices - In a semiconductor wafer including a plurality of imaginary-divided-regions which are partitioned by imaginary-dividing-lines that are respectively arranged in a grid-like arrangement on the semiconductor wafer and a circumferential line that is the outer periphery outline of the semiconductor wafer, a mask is placed so as to expose an entirety of surfaces of the wafer corresponding to respective removal-regions, the removal-regions being regions in approximately triangular form partitioned by the circumferential line of the wafer and the imaginary-dividing-lines and being some of the imaginary-divided-regions, and then plasma etching is performed on a mask placement-side surface, by which the semiconductor wafer is divided into the individual semiconductor devices along dividing lines while portions correspond to the removal-regions in the wafer are removed.08-06-2009
20090202333ELECTRONIC COMPONENT PICKUP METHOD, ELECTRONIC COMPONENT MOUNTING METHOD AND ELECTRONIC COMPONENT MOUNTING APPARATUS - This invention intends to provide an electronic component pick-up method, an electronic component loading method and an electronic component loading apparatus which are08-13-2009
20090279995CHIP PICKUP APPARATUS, CHIP PICKUP METHOD, CHIP RELEASING DEVICE AND CHIP RELEASING METHOD - An object of the invention is to provide a chip pickup apparatus, a chip pickup method, a chip releasing device and a chip releasing method in each of which chips can be picked up at a high speed without being damaged.11-12-2009
20100055875METHOD FOR MANUFACTURING SEMICONDUCTOR CHIP AND METHOD FOR PROCESSING SEMICONDUCTOR WAFER - In a laser processing step S03-04-2010

Patent applications by Hiroshi Haji, Fukuoka JP

Hiroshi Haji, Osaka JP

Patent application numberDescriptionPublished
20110273094PLASMA PROCESSING APPARATUS - A plasma processing apparatus includes a vacuum chamber, a plasma processing execution portion, a discharge state detecting unit, a window portion, a camera, a first storing portion, a second storing portion and an image data extracting unit. When an abnormal discharge is detected, the image data extracting unit extracts at least moving image data showing a generation state of the abnormal discharge from the first storing portion and stores the extracted moving image data in the second storing portion. When plasma processing is ended without the detection of the abnormal discharge, the image data extracting unit extracts, from the first storing portion, moving image data of a predetermined specific period or still image data of a specific period derived from the moving image data of the first storing portion and stores the extracted moving image data or the extracted still image data in the second storing portion.11-10-2011