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Hiroo Kawasaki

Hiroo Kawasaki, Yamanashi JP

Patent application numberDescriptionPublished
20110005686LOADING TABLE STRUCTURE AND PROCESSING DEVICE - A loading table structure which is adapted, in order to prevent damage to the loading table, so that large thermal stress does not occur in the loading table and so that the amount of supply of a purge gas for corrosion prevention to the loading table is minimized. The loading table structure is formed in a processing container capable of discharging gas contained therein and is used to load thereon an object to be processed. The loading table structure is provided with a loading table on which the object to be processed is loaded and which consists of a dielectric, a heating means which is provided to the loading table and which heats the object to be processed loaded on the loading table, and protective strut tubes which are mounted so as to vertically rise from the bottom section of the processing container, which have upper ends joined to the lower surface of the loading table to support the loading table, and which consist of a dielectric. A functional bar extending up to the loading table is inserted into each protective strut tube.01-13-2011

Hiroo Kawasaki, Nirasaki-Shi JP

Patent application numberDescriptionPublished
20090095731MOUNTING TABLE STRUCTURE AND HEAT TREATMENT APPARATUS - A mounting table structure arranged in a processing chamber is provided for mounting a target object to be processed on the upper surface. The mounting table structure is characterized in having a mounting table wherein a heating unit are embedded to heat the target object to perform a specified heat treatment to the target object, and a supporting column which stands on the bottom portion of the processing chamber and supports the mounting table. The mounting table structure is also characterized in that a heat-equalizing member spread in a planar direction is embedded above the heating unit in the mounting table.04-16-2009
20090266808PLANAR HEATER AND SEMICONDUCTOR HEAT TREATMENT APPARATUS PROVIDED WITH THE HEATER - A plane heater and a semiconductor heat treatment apparatus having the heater which suppress high frequency induction heating by having an earth electrode therein for suppressing high frequency induction and do not corrode with an excited reaction gas is provided. A plane heater 10-29-2009
20100051613MOUNTING TABLE STRUCTURE AND PROCESSING APPARATUS USING THE SAME - A mounting table structure for use in a processing chamber for performing a heat treatment by using a microwave, includes a mounting table for mounting thereon a target object, the mounting table including therein a heating unit having a heating element made of a non-metal material and a supporting column standing up on a bottom portion of the processing chamber to support the mounting table. A shield member for blocking the microwave is provided on a top surface of the mounting table.03-04-2010
20100163183MOUNTING TABLE STRUCTURE AND HEAT TREATMENT APPARATUS - A mounting table structure includes a mounting table provided with a heating unit having heaters respectively arranged in concentrically divided heating zones and on which an object to be heat-treated is placed, a temperature measurement units respectively arranged in the heating zones, and a hollow column for supporting the mounting table in an upstanding state. The diameter of the column is gradually expanded from its bottom to its top, and the upper end of the column is bonded to the bottom surface of the mounting table. A measurement unit main body of each temperature measurement unit is inserted into the hollow column and an insertion passageway provided at a sidewall of the column.07-01-2010
20100224620PLANE HEATER - [Problem to be Solved] To provide a plane heater including a carbon wire heating element which has an arrangement pattern allowing a heating surface to be a substantially uniform heating temperature plane.09-09-2010

Hiroo Kawasaki, Nirasaki JP

Patent application numberDescriptionPublished
20100163188MOUNTING TABLE STRUCTURE AND PROCESSING APPARATUS - A mounting table structure 07-01-2010

Hiroo Kawasaki, Ayabe-Shi JP

Patent application numberDescriptionPublished
20080255898RISK MONITORING APPARATUS, RISK MONITORING SYSTEM, AND RISK MONITORING METHOD - A risk monitoring system is formed of a client terminal, a risk management apparatus, and a security device. A risk calculation portion in the risk management apparatus calculates the vulnerability of each room inside the workplace quantitatively in terms of three viewpoints: individuals, assets, and space, and calculates a risk value of an internal crime in each room in real time by multiplying the vulnerability by the internal crime probability and the asset value. A risk analysis portion analyzes a risk state on the basis of the risk value thus calculated and the analysis result is displayed on a display portion of the client terminal. It is thus possible to understand a risk situation of an internal crime against assets to protect in real time for enabling an action to be taken appropriately according to the situation.10-16-2008