| Patent application number | Description | Published |
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| 20090198070 | Condensation Reaction by Metal Catalyst - The invention relates to a method for producing an azoline compound represented by the general formula (3): | 08-06-2009 |
| 20100324338 | CATALYST FOR ASYMMETRIC HYDROGENATION - This invention aims at providing a catalyst for producing an optically active aldehyde or an optically active ketone, which is an optically active carbonyl compound, by carrying out selective asymmetric hydrogenation of an α,β-unsaturated carbonyl compound, particularly a catalyst which is insoluble in a reaction mixture for obtaining optically active citronellal which is useful as a flavor or fragrance, by carrying out selective asymmetric hydrogenation of citral, geranial or neral; and a method for producing a corresponding optically active carbonyl compound. The invention relates to a catalyst for asymmetric hydrogenation of an α,β-unsaturated carbonyl compound, which comprises a powder of at least one metal selected from metals belonging to Group 8 to Group 10 of the Periodic Table, or a metal-supported substance in which at least one metal selected from metals belonging to Group 8 to Group 10 of the Periodic Table is supported on a support, an optically active cyclic nitrogen-containing compound and an acid. | 12-23-2010 |
| 20110098479 | CONDENSATION REACTION BY METAL CATALYST - The invention relates to a method for producing an azoline compound represented by the general formula (3): | 04-28-2011 |
| Patent application number | Description | Published |
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| 20080239271 | ABERRATION MEASUREMENT METHOD, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD - A method for measuring a spherical aberration or a coma aberration of a projection optical system of an exposure apparatus configured to transfer an image of a pattern formed on an original plate onto a substrate through the projection optical system. The method for measuring the spherical aberration includes obtaining a focal position of the projection optical system under a first measurement condition, obtaining a focal position of the projection optical system under a second measurement condition different from the first measurement condition, and measuring the spherical aberration of the projection optical system based on a difference of the focal position obtained under the first and the second measurement conditions. | 10-02-2008 |
| 20090015813 | EXPOSURE APPARATUS AND DEVICE FABRICATION METHOD - The present invention provides an exposure apparatus comprising a projection optical system configured to project a pattern of a reticle onto a substrate, and a position detection apparatus configured to detect at least one of a position of the reticle and a position of the substrate. | 01-15-2009 |
| 20090015836 | ADJUSTMENT METHOD FOR POSITION DETECTION APPARATUS, EXPOSURE APPARATUS, AND DEVICE FABRICATION METHOD - The present invention provides an adjustment method for a position detection apparatus which comprises an optical system including first and second optical members whose positions can be changed, and detects a position of an object, comprising the steps of calculating a value representing an asymmetry of a detection signal of a light which enters a photoelectric conversion device via the optical system, for each of a plurality of positions of the first optical member in a direction perpendicular to an optical axis of the optical system, specifying a position of the object in the direction of the optical axis, at which the value is insensitive, for each of the plurality of positions, and adjusting a position of the second optical member in the direction perpendicular to the optical axis based on the value at the position of the object specified in the specifying step. | 01-15-2009 |
| 20090115985 | POSITION DETECTOR, POSITION DETECTION METHOD, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE - A position detector ( | 05-07-2009 |
| 20090231569 | EXPOSURE METHOD, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE - The first evaluation value is obtained by evaluating an electrical signal containing the position information of a mark in accordance with an evaluation criterion. The first overlay error generated by the exposure apparatus is estimated based on the first evaluation value, the second evaluation value obtained by evaluating an electrical signal in a position detector of the another exposure apparatus in accordance with the evaluation criterion, and the second overlay error generated by another exposure apparatus. The exposure apparatus exposes a substrate while positioning it so as to reduce an overlay error generated by the exposure apparatus to an error smaller than the first overlay error based on the basis of an output from the position detector of the exposure apparatus, which detects the position of the mark, and the estimated first overlay error. | 09-17-2009 |
| 20110198769 | IMPRINT APPARATUS AND ARTICLE MANUFACTURING METHOD - The imprint apparatus of the present invention molds an uncured resin on a substrate using a mold to form a resin pattern on the substrate. The apparatus includes a measuring device configured to project a light onto the mold, to receive a light scattered by the mold, and to measure the scattered light; and a controller. The controller is configured to store a reference signal, to cause the measuring device to measure the mold to obtain a measurement signal, and to obtain an index indicating a discrepancy between the measurement signal and the reference signal. | 08-18-2011 |
