| Patent application number | Description | Published |
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| 20080204737 | MASK PATTERN INSPECTION APPARATUS WITH KOEHLER ILLUMINATION SYSTEM USING LIGHT SOURCE OF HIGH SPATIAL COHERENCY - A semiconductor device fabrication-use mask pattern inspection apparatus having an optical configuration adaptable for achievement of a Koehler illumination system using a light source high in spatial coherency is disclosed. This apparatus includes a laser light source, a beam expander which is disposed between the laser source and a mask for expanding laser light to form an optical path of collimated light rays, and a beam splitter placed in the collimated light ray optical path for splitting the optical path into two optical paths. In one of these paths, a transmissive illumination optics is placed which irradiates transmission light onto the mask; in the other path, a reflective illumination optics is placed for irradiation of reflected light onto the mask. A pattern image of this mask is detected by a photosensitive device to generate a detected pattern image, which is sent to a comparator for comparison with a fiducial image thereof. | 08-28-2008 |
| 20080237489 | LIGHTING OPTICAL APPARATUS AND SAMPLE INSPECTION APPARATUS - A lighting optical apparatus using a deep ultraviolet light source that are easy to adjust due to a configuration with fewer components, has high illuminant and illuminant uniformity on an irradiated surface are provided. The apparatus has a deep ultraviolet light source from which deep ultraviolet rays are emitted, a first double-sided cylindrical lens which has a cylindrical lens array on both sides with a configuration of cylinder axes intersecting at right angles, a second double-sided cylindrical lens which has a cylindrical lens array on both sides with a configuration of cylinder axes intersecting at right angles, and a condenser lens. | 10-02-2008 |
| 20090075184 | MASK BLANK FOR EUV EXPOSURE AND MASK FOR EUV EXPOSURE - Provided are a mask for EUV exposure and a mask blank for EUV exposure for manufacturing the same, so as to improve the contrast of ultraviolet inspection light and improve the inspection performance for the mask. This mask blank for EUV exposure includes a substrate, a reflecting layer which is provided on the substrate and reflects EUV light, and an absorbent layer which is provided on the reflecting layer and absorbs EUV light. Reflectance of light at a wavelength between 150 nm and 300 nm is greater at the absorbent layer than that of the reflecting layer. The mask for EUV exposure can be manufactured by processing this mask blank for EUV exposure. | 03-19-2009 |
| 20100074512 | PHOTOMASK INSPECTION METHOD - A photomask inspection method that identifies a foreign particle such as dirt on a photomask with high sensitivity by suppressing erroneous identification due to an influence of noise is provided. The photomask inspection method includes acquiring image data of a photomask having regions with different layer structures on a surface thereof, creating inverted image data by subtracting the image data from pixel value data of the regions, creating offset inverted image data by raising pixel values of the inverted image data by a fixed amount, creating normalized correlation image data by computing a normalized correlation of the offset inverted image data and an offset Gaussian distribution-type kernel, and identifying foreign particles by comparing the normalized correlation image data and a predetermined threshold. | 03-25-2010 |
| 20100247085 | AUTOMATIC FOCUS ADJUSTING MECHANISM AND OPTICAL IMAGE ACQUISITION APPARATUS - In an automatic focus adjusting mechanism, a test sample having a patterned surface is mounted on a mount table, and an light beam passing through a slit formed in a field stop is applied to the patterned surface of the test sample. The light beam reflected from the test sample is split into two segment light beams. Focus adjusting aperture stops having respective apertures formed rhomboid are provided across the optical paths of the segment light beams. The amounts of the segment light beams passing through the rhomboid apertures are detected by light receiving units. Based on the difference between the detected light amounts, the position of the mount table is controlled by the focus adjusting unit. | 09-30-2010 |
| 20120081538 | PATTERN INSPECTION APPARATUS - This pattern inspection apparatus includes an inspection region information storage unit that stores an inspection region specified in a pattern region, a pattern surface height detection unit that detects a pattern surface height signal corresponding to a pattern surface height measurement position on the inspection sample, an autofocus mechanism that focuses on the inspection sample using the pattern surface height signal detected by the pattern surface height detection unit, a determination unit, and an autofocus mechanism control unit. When the determination unit determines that the pattern surface height measurement position is located within the inspection region, the autofocus mechanism control unit drives the autofocus mechanism, and the determination unit determines that the pattern surface height measurement position is not located within the inspection region, the autofocus mechanism control unit stops the autofocus mechanism. | 04-05-2012 |
| Patent application number | Description | Published |
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| 20080212237 | Disk drive device and manufacturing method thereof - In a disk drive device having a double cover structure with low-density gas enclosed therein, embodiments of the present invention allow a more reliable leak inspection to be performed on the second cover and to prevent defects caused by joining the secondary cover. An HDD according to an embodiment of the present invention comprises a ventilation path from a ventilation hole on an inner cover to a space between the inner cover and an outer cover. An outer peripheral end of an adhesive layer is apart from a joining section, which is exposed in the space. Helium gas flowing out of the ventilation hole flows to the space via the ventilation path and remains within the space. This enables detection of leakage of the helium gas from the joining section to be performed more easily. | 09-04-2008 |
| 20080310048 | Disk drive device and fabricating method thereof - In a disk drive device having a double cover structure with low-density gas enclosed therein, embodiments of the present invention help to securely perform leak inspection on an outer cover and to prevent defects caused in joining the outer cover. According to one embodiment, a hard disk drive (HDD) comprises a flow amount adjuster on a base-facing side of its inner cover. Helium gas in an enclosure goes out through a ventilation hole via diffusion channel of a flow amount adjuster. The emitted helium gas remains in the space between the inner cover and an outer cover. This achieves easier detection of the leakage of helium gas from the joining section of the outer cover and prevention of emission of too much helium gas from the enclosure. | 12-18-2008 |
| 20090241322 | Manufacturing method of base and Manufacturing method of disk drive device - Embodiments of the present invention help to effectively suppress vibration of the disk in a Hard Disk Drive (HDD) with low density gas sealed therein, and securely prevent leakage of the low density gas from the base. In an embodiment, helium gas is sealed in a hermetically sealed enclosure of an HDD, and a shroud is formed integrally with a base. In manufacturing the base, a magnetic disk facing surface of the shroud is shaped by cutting after die-casting. This accomplishes a small and precise size of the gap between the magnetic disk facing surface and the circumferential edge of the disk. Cutting the shroud formed independently from the exterior walls, which ensure the hermeticity with the shroud, suppresses the vibration of the magnetic disk and eliminates the necessity of cutting of the inner surfaces of the exterior walls for the purpose of suppression of the vibration to reduce the risk of helium leakage. | 10-01-2009 |
| 20110038076 | DISK DRIVE AND METHOD OF RE-INJECTING LOW DENSITY GAS IN A HERMETICALLY SEALED DISK ENCLOSURE OF A DISK DRIVE - A method for re-injecting low density gas into a disk drive including a hermetically sealed disk enclosure. The method includes providing a disk drive including a hermetically sealed disk enclosure. In addition, the method includes re-injecting low density gas from a hole penetrating the hermetically sealed disk enclosure from an exterior of the disk drive to an interior of the disk drive. Moreover, the method includes covering the hole with a sealing label including a metal layer and an adhesive layer. | 02-17-2011 |
| 20120008235 | REDUCE LEAKAGE OF LOW-DENSITY GAS DURING LOW-DENSITY GAS INJECTION INTO A DISK DRIVE - Embodiments of the present invention help to prevent leakage of low-density gas during low-density gas injection into a disk drive device and to perform low-density gas injection efficiently. In a hard disk drive (HDD) according to one embodiment of the present invention, an injection hole filter with a valve function is attached to a helium injection hole in order to inject helium gas in an enclosure. The injection hole filter has a valve member configured to operate in an open state or closed state. The open state is a state while the helium gas is being injected and the closed state is a state after the helium gas has been finished to be injected. The valve member is in the open state if the outside pressure is higher than the inside pressure and is in the closed state if the inside pressure is higher than the outside pressure. | 01-12-2012 |
| 20120162824 | RETAINING A SPOILER IN A HARD DISK DRIVE - A hard disk drive comprising, a base plate comprising a pin, a top cover, a plurality of magnetic disks, and a spoiler. The spoiler includes a first spring fastener for temporary spring fastening the spoiler on the base plate, and a second spring fastener for resiliently fastening the spoiler when the top cover is attached to the base plate. | 06-28-2012 |
