Patent application number | Description | Published |
20100316952 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME - A salt represented by the formula (a1): | 12-16-2010 |
20110014568 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME - A salt having a divalent group represented by the formula (aa): | 01-20-2011 |
20110065041 | PHOTORESIST COMPOSITION - The present invention provides a photoresist composition comprising an acid generator and a resin comprising a structural unit derived from a monomer represented by the formula (I): | 03-17-2011 |
20110200936 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME - A salt represented by the formula (I): | 08-18-2011 |
20110318688 | SALT, ACID GENERATOR AND RESIST COMPOSITION - The present invention is a salt represented by the formula (I) | 12-29-2011 |
20120219905 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN - A resist composition contains (A1) a resin having a structural unit represented by the formula (I), (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator, and (D) at least one compound selected from the group consisting of a compound represented by the formula (II1) and a compound represented by the formula (II2), | 08-30-2012 |
20120251945 | PHOTORESIST COMPOSITION - The present invention provides a photoresist composition containing: a resin which contains a structural unit derived from a compound having an acid-labile group and which is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid; an acid generator and a compound represented by the formula (I): | 10-04-2012 |
20120264055 | PHOTORESIST COMPOSITION - The present invention provides a photoresist composition comprising a salt represented by the formula (I): | 10-18-2012 |
20130022925 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN - A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator, | 01-24-2013 |