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Hiroki Murakami
Hiroki Murakami, Osaka JP
| Patent application number | Description | Published |
|---|---|---|
| 20090010439 | Terminal Apparatus, Server Apparatus, and Digital Content Distribution System - To reduce a frequency of recording communication management information for communication disconnection countermeasure. A digital content distribution system includes a license server ( | 01-08-2009 |
| 20090187762 | TERMINAL DEVICE, SERVER DEVICE, AND CONTENT DISTRIBUTION SYSTEM - To provide a content distribution system which can prevent use of content which has been temporarily stored after the valid period. | 07-23-2009 |
| 20100088750 | TERMINAL APPARATUS, SERVER AND SYSTEM THEREOF - A terminal apparatus is provided which can guarantee operation of a use condition bytecode while securing the degree of freedom for a service provider generating the use condition bytecode. A terminal apparatus ( | 04-08-2010 |
| 20110018722 | Photoelectric Sensor And Photoelectric Sensor System - There are provided a photoelectric sensor and a photoelectric sensor system in which received light quantities of a plurality of photoelectric sensors are displayed in an integrated manner, and slight variation in the received light quantity that has nothing to do with a detected condition of a workpiece is ignored and a photoelectric sensor with abnormity is easily found out. Upon acceptance of an instruction to execute scaled display by a control unit of a photoelectric sensor, a scaling adjustment ratio is calculated by assigning the received light quantity to a target value set to be greater than a display upper limit while executing the scaled display. A received light quantity that is subsequently obtained is scaled based on the calculated scaling adjustment ratio to obtain a received light quantity after the scaling. | 01-27-2011 |
Hiroki Murakami, Tokyo JP
| Patent application number | Description | Published |
|---|---|---|
| 20080236476 | Silicon single crystal wafer for particle monitor - A silicon single crystal wafer for a particle monitor is presented, which wafer has an extremely small amount in the surface density of light point defects and is capable of still maintaining a small surface density even after repeating the SC-1. The wafer is prepared by slicing a silicon single crystal ingot including an area in which crystal originated particles are generated, and the surface density of particles having a size of not less than 0.12 mum is not more than 15 counts/cm | 10-02-2008 |
| 20090301698 | HEAT EXCHANGER OF PLATE FIN AND TUBE TYPE - A heat exchanger including plate fins stacked at respective intervals relative to one another, and heat exchanger tubes penetrating the fins in. The heat exchanger exchanges heat between first and second fluids flowing, respectively, inside and outside the heat exchanger tubes. Each of the fins includes a substantially planar main body and cut-raised portions extending from the main body and disposed at an upstream side of flow of the second fluid. Each of the cut-raised portions corresponds to a respective heat exchanger tube and includes first and second opposed side ends connected to the main body of the fin. The first side end is nearer to the corresponding heat exchanger tube than is the second side end, the first side end is longer than the second side end, and the first side end is disposed at a downstream side of the flow of the second fluid, facing the corresponding heat exchanger tube. | 12-10-2009 |
| 20100172181 | PAGE BUFFER CIRCUIT FOR ELECTRICALLY REWRITABLE NON-VOLATILE SEMICONDUCTOR MEMORY DEVICE AND CONTROL METHOD - Within a page buffer | 07-08-2010 |
| 20100199716 | GAS-LIQUID SEPARATOR AND AIR CONDITIONER EQUIPPED WITH THE SAME - To improve the separation efficiency of a gas-liquid separator in the gas-liquid separator and an air conditioner, the gas-liquid separator having a vessel with an inlet pipe and an outlet pipe is arranged such that an exit end section of the inlet pipe is formed to be closed or to have a gap, an expanded end section having a width greater than the diameter of that portion of the inlet pipe which crosses a container of the gas-liquid separator is provided, and that a lateral hole is formed in a side face of the expanded end section. Refrigerant vapor and refrigerant liquid are efficiently separated from each other at the expanded end section, and this improves separation efficiency of the gas-liquid separator. | 08-12-2010 |
Hiroki Murakami, Nirasaki-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20100081094 | MASK PATTERN FORMING METHOD, FINE PATTERN FORMING METHOD, AND FILM DEPOSITION APPARATUS - In a mask pattern forming method, a resist film is formed over a thin film, the resist film is processed into resist patterns having a predetermined pitch by photolithography, slimming of the resist patterns is performed, and an oxide film is formed on the thin film and the resist patterns after an end of the slimming step in a film deposition apparatus by supplying a source gas and an oxygen radical or an oxygen-containing gas. In the mask pattern forming method, the slimming and the oxide film forming are continuously performed in the film deposition apparatus. | 04-01-2010 |
| 20100189927 | FILM FORMATION APPARATUS AND METHOD FOR USING SAME - A method for using a film formation apparatus includes performing a main cleaning process and a post cleaning process in this order inside a reaction chamber. The main cleaning process is arranged to supply a cleaning gas containing fluorine into the reaction chamber while exhausting gas from inside the reaction chamber, thereby etching a film formation by-product containing silicon. The post cleaning process is arranged to remove a silicon-containing fluoride generated by the main cleaning process and remaining inside the reaction chamber and to alternately repeat, a plurality of times, supplying an oxidizing gas into the reaction chamber to transform the silicon-containing fluoride into an intermediate product by oxidization, and supplying hydrogen fluoride gas into the reaction chamber while exhausting gas from inside the reaction chamber to remove the intermediate product by a reaction between the hydrogen fluoride gas and the intermediate product. | 07-29-2010 |
Hiroki Murakami, Yokohama-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20100076601 | FROG-LEG-ARM ROBOT AND CONTROL METHOD THEREOF - The frog-leg-arm robot is provided with a torque motor connected to a wrist rotation shaft to supply torque to a rotation shaft to which the torque motor itself is connected and a control unit in which, when each of arms constituting the frog-leg-arm robot is able to shift from the present posture to any plurality of postures including a targeted posture by a driving device, the torque motor is electrically controlled so that the torque is supplied to the wrist rotation shaft in a direction in which each of the arms is able to shift to the targeted posture. | 03-25-2010 |
Hiroki Murakami, Kanagawa JP
| Patent application number | Description | Published |
|---|---|---|
| 20090279358 | SEMICONDUCTOR DEVICE AND CONTROL METHOD OF THE SAME - A semiconductor device includes: a first sector ( | 11-12-2009 |
| 20090300275 | SEMICONDUCTOR DEVICE AND CONTROL METHOD OF THE SAME - A semiconductor device includes: a first sector ( | 12-03-2009 |
Hiroki Murakami, Kawasaki JP
| Patent application number | Description | Published |
|---|---|---|
| 20080276213 | Method of shield line placement for semiconductor integrated circuit, design apparatus for semiconductor integrated circuit, and design program for semiconductor integrated circuit - A semiconductor integrated circuit design apparatus includes: an association information creating unit which creates association information for associating wiring information of a signal line with wiring information of a shield line placed for the signal line; an association information storage unit which stores the thus created association information; and a shield wiring unit which, when the placement of the signal line is changed, changes in interlinking fashion with the changed placement the placement of the shield line that is associated with the signal line by the association information. | 11-06-2008 |
Hiroki Murakami, Ebina-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20080226334 | DISCHARGER, IMAGE CARRIER UNIT, AND IMAGE FORMING APPARATUS - A discharger includes: a discharge electrode member that is placed opposedly to a member to be charged; an opposed electrode member that is placed opposedly to the discharge electrode member; and a power source circuit that applies a discharge voltage for generating a discharge between the discharge electrode member and the opposed electrode member, and the electrode member having a surface that includes a covered layer covered by a covering material is formed on a surface opposed thereto, and the covering material containing a carbon atom, or a carbon atom and another atom or other plural atoms as a main component, and having an SP3 structure by a carbon atom. | 09-18-2008 |
Hiroki Murakami, Nirasaki City JP
| Patent application number | Description | Published |
|---|---|---|
| 20110263105 | AMORPHOUS SILICON FILM FORMATION METHOD AND AMORPHOUS SILICON FILM FORMATION APPARATUS - The amorphous silicon film formation method includes forming a seed layer on the surface of a base by heating the base and flowing aminosilane-based gas onto the heated base; and forming an amorphous silicon film on the seed layer by heating the base, supplying silane-based gas containing no amino group onto the seed layer on the surface of the heated base, and thermally decomposing the silane-based gas containing no amino group. | 10-27-2011 |