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Hiroki Fujii

Hiroki Fujii, Osaka JP

Patent application numberDescriptionPublished
20100233457FOAM DUSTPROOFING MATERIAL WITH A MICRO CELL STRUCTURE - To provide a dustproofing material having superior dustproofness and having such superior flexibility as to fit in a further minute clearance typically of 0.10 to 0.20 mm.09-16-2010
20100239836IMPACT-ABSORBING MATERIAL - The present invention relates to an impact-absorbing material including a foam having a thickness of from 0.1 to 1.0 mm, an average cell size of from 10 to 65 μm and a density of from 0.01 to 0.20 g/cm09-23-2010
20100300528Adhesive seal material for end portion of frameless solar cell module, frameless solar cell module, and sealed structure of end portion thereof - An adhesive seal material for an end portion of a frameless solar cell module is an adhesive sealing member for an end portion of a frameless solar cell module which is bonded to an end portion of a frameless solar cell module, and includes a base material and an adhesive layer formed on a surface of the base material. The base material includes a reinforcement layer having a top surface on which the adhesive layer is laminated, and a barrier layer formed on a back surface of the reinforcement layer.12-02-2010
20110088756Adhesive seal material for end portion of solar cell panel, sealed structure of end portion of solar cell panel, sealing method, solar cell module, and producing method thereof - An adhesive seal material for an end portion a solar cell panel is an adhesive seal material which is bonded to an end portion of a solar cell panel. The adhesive seal material includes a rubber-based adhesive layer, and a non-adhesive layer partially covering a surface of the rubber-based adhesive layer.04-21-2011

Hiroki Fujii, Aichi JP

Patent application numberDescriptionPublished
20090188457Lash Adjuster - A lash adjuster includes a cylindrical bottomed plunger mounted in a cylindrical bottomed body so as to be movable upward and downward and including a high-pressure chamber defined between an underside of the plunger and a bottom wall of the body to reserve an operating oil, a leak path defined by an inner circumference of the body and an outer circumference of the plunger so that the oil reserved in the high-pressure chamber leaks through the leak path with downward movement of the plunger, and a ring-shaped member located between the inner circumference of the body and the outer circumference of the plunger, normally projecting into the leak path and being elastically deformed radially inward or outward with increase in pressure of the oil at the high-pressure chamber side so as to be retreated from the leak path, thereby reducing flow resistance of the oil in the leak path.07-30-2009
20100065012Cam housing - A cam housing 03-18-2010
20110000452LASH ADJUSTER - A lash adjuster in which, when a plunger descends, a valve element moves to a valve-closed position without delay. A check valve (01-06-2011

Patent applications by Hiroki Fujii, Aichi JP

Hiroki Fujii, Ibaraki-Shi JP

Patent application numberDescriptionPublished
20100016458POLYOLEFIN RESIN FOAM AND PROCESS FOR PRODUCTION THEREOF - The present invention relates to a polyolefin resin foam which includes a polyolefin resin composition includes: (A) a rubber and/or a thermoplastic elastomer; (B) a polyolefin resin; and (C) at least one aliphatic compound selected from an aliphatic acid, an aliphatic acid amide and an aliphatic acid metallic soap, the compound having a polar functional group and having a melting point of 50 to 150° C., in which a content of the aliphatic compound is 1 to 5 parts by weight based on 100 parts by weight of the total amount of the rubber and/or thermoplastic elastomer and the polyolefin resin. The polyolefin resin foam of the invention is excellent in flexibility and cushioning properties, and has good processability, especially excellent cutting processability.01-21-2010
20100119812LIGHT-REFLECTING MEMBER CONTAINING POLYOLEFIN RESIN FOAM, AND METHOD FOR PRODUCING THE SAME - The present invention relates to a light-reflecting member including a polyolefin resin foam as a light-reflecting layer, the polyolefin resin foam being obtained by foam molding a resin composition containing a polyolefin resin. According to the light-reflecting member of the invention, since it has the above-mentioned constitution, the light-reflecting member is excellent in light reflection, impact-absorbing property, and lightness in weight. Moreover, the process for producing a light-reflecting member of the invention can provide a light-reflecting member excellent in light reflection, impact-absorbing property, and lightness in weight by using a polyolefin resin foam.05-13-2010

Hiroki Fujii, Kanagawa JP

Patent application numberDescriptionPublished
20080283914Semiconductor device and method for manufacturing the same - An impurity buried layer constructed by two buried regions formed by impurities of identical type exist, a buried region formed by an impurity having a slow diffusion speed is provided on the entire surface of a transistor formation region, and a buried region formed by an impurity having a fast diffusion speed is provided inwardly from beneath the inside end of an isolation insulating film serving as a region on which an electric field concentrates partially.11-20-2008
20080283967Semiconductor device - In a semiconductor device including a bipolar transistor, a base region has a two layer structure including a first base region, and a second base region which is provided around the first base region and has a lower impurity density than that of the first base region and has a shallower depth than that of the first base region.11-20-2008
20100078720Semiconductor device and method for manufacturing the same - There is provided a semiconductor device including a field effect transistor. The field effect transistor includes a p-type low concentration region formed over a surface of a substrate, an n-type drain-side diffusion region and an n-type source-side diffusion region formed over a surface of the p-type low concentration region, an element isolation insulating layer, and another element isolation insulating layer. A p-type high concentration region, which has an impurity concentration higher than the impurity concentration of the p-type low concentration region, is formed below the n-type source-side diffusion region in the p-type low concentration region over a range at least from one end, which is opposite to the other end facing to the channel region, of the source-side diffusion region to one end, which is facing to the channel region, of the second element isolation insulating layer, when seen in a plan view.04-01-2010
20100078721SEMICONDUCTOR DEVICE - A field-effect transistor (04-01-2010

Patent applications by Hiroki Fujii, Kanagawa JP

Hiroki Fujii, Ibaraki JP

Patent application numberDescriptionPublished
20090156410Fabrication Method of a MgB2 Superconducting Tape and Wire - In a fabrication method of a MgB06-18-2009

Hiroki Fujii, Aichi-Ken JP

Patent application numberDescriptionPublished
20090020088LASH ADJUSTER AND VALVE APPARATUS - A lash adjuster of the invention includes a body in a cylindrical shape and a plunger inserted to inside of the body. The plunger partitions a pressure chamber at inside of the body by being integrated to the body, and is moved in an axial direction at inside of the body by increasing or reducing a volume of inside of the pressure chamber by making a working fluid flow to inside of the pressure chamber or flow out from the pressure chamber. Further, between an inner peripheral face of the body and an outer peripheral face of the plunger, a spacer filling a gap between the two faces is interposed.01-22-2009

Hiroki Fujii, Chita-Gun JP

Patent application numberDescriptionPublished
20080216785Lash adjuster - A lash adjuster includes a plunger and a cylinder. The cylinder includes a high-pressure chamber defined therein. The plunger has a valve port provided through a bottom wall thereof. The valve port includes a seat. A spherical valve body is accommodated in the high-pressure chamber. The valve body is made of ceramic material containing silicon nitride. The valve body is arranged to have a surface roughness average (Ra) of equal to or less than 0.13 μm. The valve body is arranged to have a contact pressure of equal to or lower than 1386 Mpa with the seat in a state where the valve port is closed by the valve body.09-11-2008