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Hirokazu Kato
Hirokazu Kato, Mito JP
| Patent application number | Description | Published |
|---|---|---|
| 20090168061 | FLUORESCENCE DETECTION APPARATUS - A fluorescent detection apparatus relates to an analysis technique for qualitatively detecting or quantifying biomolecules by producing an evanescent field on a surface of a substrate, exciting fluorescently labelled biomolecules on the substrate surface in the evanescent field, and detecting the resultant fluorescent light emitted from the biomolecules. The fluorescent detection apparatus has a configuration in which a well is provided in a surface opposing to a sample substrate of a prism, the well is filled with a matching liquid, and the matching liquid is filled between the sample substrate and the prism, thereby improving operability and providing a stable evanescent field. | 07-02-2009 |
| 20110105358 | SINGLE MOLECULE REAL TIME SEQUENCER, NUCLEIC ACID ANALYZER AND SINGLE MOLECULE REAL TIME SEQUENCING METHOD - An object of the present invention relates to selectively control an extension reaction within a desired area in a substrate. In the present invention, an oligo probe arranged with a caged compound at the terminal thereof is immobilized to a reaction field area in the substrate. After pouring a reaction solution into a flow cell including the reaction field area, the reaction field area alone is irradiated with light to associate the photodegradation-active protecting group at the terminal of the oligo probe that has been immobilized in the reaction field area and thus to selectively control initiation of a polymerase extension reaction. In the flow cell, a plural number of the reaction field areas are arranged at constant interval on the substrate. The flow cell immobilized to a moving stage is moved by a distance equal to the interval between the adjacent reaction field areas and then light irradiation is carried out to measure the extension reaction continuously. By repeating these operations, the base extension reaction is stably measured in the flow cell without using complicated channels or without replacing the reaction solution. | 05-05-2011 |
| 20110121204 | TOTAL REFLECTION FLUORESCENCE OBSERVATION DEVICE - A technique and device for fluorescence observation with good operability, high sensitivity, acid high reliability. The device is used for fluorescence observation using evanescent light. The angle of incidence of the excitation light is adjusted so that the excitation light is always totally reflected from the surface of a substrate irrespective of the angle of the surface of the substrate. The method includes a step of shining the excitation light on the observation substrate while continuously varying the angle of the excitation light with respect to the observation substrate, a step of sensing the shone excitation light by means of optical sensors, and a step of setting the angle of total reflection according to the result of the sensing by the optical sensors. The direction in which the shone excitation light travels varies with the angle of incidence. That is, the excitation light travels as the transmitted light, the reflected light, or the surface propagating light. These lights are sensed by the corresponding optical sensors, and how the angle of incidence of the excitation light is with respect to the critical angle is determined. The angle of incidence of the excitation light is varied depending on the result of the determination, thereby realizing an optimum total reflection angle. | 05-26-2011 |
| 20110284768 | FLUORESCENCE ANALYZING DEVICE AND FLUORESCENCE ANALYZING METHOD - The present invention has an object to provide a method for efficiently detecting an image with a smaller number of pixels. | 11-24-2011 |
Hirokazu Kato, Yokohama-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20110070680 | Pattern forming method and manufacturing method of semiconductor device - A pattern forming method includes forming a spin on dielectric film on a substrate, washing the spin on dielectric film by using a washing liquid, drying a surface of the spin on dielectric film after the washing, forming a photosensitive film on the dried coating type insulation film, emitting energy rays to a predetermined position of the photosensitive film in order to form a latent image on the photosensitive film, developing the photosensitive film in order to form a photosensitive film pattern which corresponds to the latent image, and processing the spin on dielectric film with the photosensitive film pattern serving as a mask. | 03-24-2011 |
Hirokazu Kato, Susono-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20100168953 | BRAKE/DRIVE FORCE CONTROLLING APPARATUS FOR VEHICLE - A brake/drive force controlling apparatus for a vehicle includes an engine for applying drive forces to driving wheels of the vehicles, a control diff for distributing the drive forces to the left and right driving wheels independently, and an electronic control system brake device for applying brake forces to the left and right driving wheels independently. An ECU is configured so as to be able to control the engine, the control diff, and the electronic control system brake device according to an operating state of the vehicle. When the electronic control system brake device is operated, this ECU stops the operation of the control diff, thereby avoiding a sudden input of load on the drive force distribution mechanism, regardless of the running state of the vehicle. This makes the apparatus simpler and more lightweight. | 07-01-2010 |
| 20110307145 | POWER GENERATION CONTROL APPARATUS AND POWER GENERATION CONTROL SYSTEM - A power generation control apparatus can switch, by controlling a power generation apparatus capable of generating power by power of a power source which makes a vehicle travel, between a first power generation control of mainly performing power generation at the time of deceleration of the vehicle while suppressing power generation at the time of acceleration of the vehicle in the case where normal travel of acceleration/deceleration travel is performed in a state where the power source operates and a second power generation control of mainly performing power generation at the time of acceleration of the vehicle while suppressing power generation at the time of deceleration of the vehicle in the case where acceleration/deceleration travel including coasting in which the vehicle travels in a state where the operation of the power source stops is performed. Consequently, power generation can be performed properly. | 12-15-2011 |
Hirokazu Kato, Fishkill, NY US
| Patent application number | Description | Published |
|---|---|---|
| 20100143849 | SEMICONDUCTOR DEVICE MANUFACTURING METHOD - A semiconductor device manufacturing method includes: forming a foundation film on a semiconductor wafer; after forming the foundation film, forming a reaction layer of the semiconductor wafer and the foundation film therebetween; removing the foundation film and leaving the reaction layer on the semiconductor wafer; forming a resist film on the reaction layer; patterning the resist film; and using the patterned resist film as a mask to perform processing on the semiconductor wafer. | 06-10-2010 |
Hirokazu Kato, Wappingers Falls, NY US
| Patent application number | Description | Published |
|---|---|---|
| 20100120255 | SEMICONDUCTOR DEVICE MANUFACTURING METHOD - A semiconductor device manufacturing method includes: forming a core pattern on a foundation film, the core pattern containing a material generating acid by light exposure; selectively exposing part of the core pattern except an longitudinal end portion; supplying a mask material onto the foundation film so as to cover the core pattern, the mask material being crosslinkable upon supply acid from the core pattern; etching back the mask material to expose an upper surface of the core pattern and remove a portion of the mask material formed on the end portion of the core pattern, thereby leaving a mask material side wall portion formed on a side wall of the core pattern; and removing the core pattern and processing the foundation film by using the mask material sidewall portion left on the foundation film as a mask. | 05-13-2010 |
Hirokazu Kato, Sodegaura-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20080268152 | Composite sol, process for producing the same, and ink-jet recording medium - A composite sol containing colloidal composite particles having a particle diameter measured by dynamic light scattering method of 20 to 500 nm, composed of colloidal silica particles having a specific surface area diameter of 3 to 100 nm and aluminum phosphate bonding the colloidal silica particles or coating and bonding the colloidal silica particles; a process for producing the composite sol; a coating composition for ink receiving layer containing the composite sol; and an ink jet recording medium having an ink receiving layer containing the composite sol. | 10-30-2008 |
| 20080293831 | Method for producing zirconia sol - A production method of a zirconia sol includes; (A) mixing a dicarboxylic acid compound with a zirconium compound in an aqueous medium, in which a molar ratio of the dicarboxylic acid compound is more than 1 and less than or equal to 10 per mol of zirconium atom in the zirconium compound, and (B) adding 0.7-2.5 mol of a water-soluble organic base per mol of the dicarboxylic acid compound contained in a mixture obtained by the process (A) to the mixture and then treating hydrothermally the resultant mixture. | 11-27-2008 |
| 20090032994 | Method for Manufacturing Slurry and Mold for Precision Casting - A manufacturing method for a slurry for the production of a precision casting mold that includes a zirconia sol and a refractory powder, and a manufacturing method for a precision casting mold that uses the slurry is provided. The present invention relates to a manufacturing method for a slurry for the production of a precision casting mold for a metal that includes a step in which an alkaline zirconia sol (A1) and a refractory powder (D) are mixed, the alkaline zirconia sol (A1) being obtained by a manufacturing method that includes a step (i), in which a zirconium salt (B1) is heated at 60 to 110° C. in an aqueous medium that includes a carbonate of quaternary ammonium, and a step (ii), in which a hydrothermal treatment is carried out at 100 to 250° C. In addition, the present invention relates to a manufacturing method for a slurry for the production of a precision casting mold for a metal that includes a step in which an acidic zirconia sol (C3) and a refractory powder (D) are mixed, the acidic zirconia sol (C3) being obtained by a manufacturing method that includes a step (I), in which an alkaline zirconia sol (A3) and a zirconium salt (B3) are mixed, and a step II, in which the obtained liquid mixture is caused to react at 80 to 250° C. | 02-05-2009 |
| 20090036556 | Acidic Zirconia Sol and Production Method of the Same - There is provided an acidic zirconia sol having compatibility of particle properties and binding properties, and a production method of the same. | 02-05-2009 |
| 20090088313 | Production Method of Alkaline Zirconia Sol - [Problems to be Solved] To provide a production method of an alkaline zirconia having compatibility of particle properties and binding properties. | 04-02-2009 |
| 20090148380 | Method for Producing Metal Oxide Particle - There is provided a method for stably producing metal oxide solid solution particle at low temperature, wherein an alkaline zirconia sol is used as a raw material which is mixed with a metal compound, and then dried and fired. Specifically, there is disclosed a method for producing metal oxide particle (A3) such as zirconia particle in which metal oxides are solid-solubilized, comprising: a step (I) for obtaining metal oxide (A2) sol such as zirconia sol containing a precursor of a metal oxide by mixing an alkaline zirconia (A1) sol which is obtained by a method including a step (i) for heating a zirconium salt (B2) at 60-110° C. in an aqueous medium containing a carbonate of quaternary ammonium and a step (ii) for performing a hydrothermal treatment at 110-250° C., with a compound (B1) containing an element selected from a group consisting of the group II and group III elements of the periodic table; and a step (II) for drying the thus-obtained sol and then firing a resultant substance at a temperature of 500-1200° C. | 06-11-2009 |
| 20100120925 | ACIDIC ZIRCONIA SOL AND PRODUCTION METHOD OF THE SAME - There is provided an acidic zirconia sol having compatibility of particle properties and binding properties, and a production method of the same. The acidic zirconia sol includes zirconia particles (a) having a particle diameter ranging from 20 to 300 nm in a content of 90 to 50% by mass, based on the mass of all zirconia particles, and zirconia particles (b) having a particle diameter of less than 20 nm in a content of 10 to 50% by mass, based on the mass of all zirconia particles. | 05-13-2010 |
| 20110274767 | PRODUCTION METHOD OF TITANIUM OXIDE SOL - There is provided a method for efficiently producing an anatase-type titanium oxide sol in an extremely advantageous dispersion state. The method comprises mixing a titanium alkoxide, an organic acid, and a quaternary ammonium hydroxide with water in a molar ratio of the organic acid of 0.4 to 4.0 relative to 1 mol of a titanium atom of the titanium alkoxide and in a molar ratio of the quaternary ammonium hydroxide of 0.8 to 1.9 relative to 1 mol of the organic acid to prepare an aqueous mixed solution having a concentration in terms of TiO | 11-10-2011 |
Hirokazu Kato, Kariya-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20100078860 | IMPRINT METHOD - An imprint method includes applying a light curable resin on a substrate to be processed, the substrate including first and second regions on which the light curable resin is applied, contacting an imprint mold with the light curable resin, curing the light curable resin by irradiating the light curable resin with light passing through the imprint mold, generating gas by performing a predetermined process to the light curable resin applied on a region of the substrate, the region including at least the first region, wherein an amount of gas generated from the light curable resin applied on the first region is larger than an amount of gas generated from the light curable resin of the second region, and forming a pattern by separating the imprint mold from the light curable resin after the gas being generated. | 04-01-2010 |
Hirokazu Kato, Okayama-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20090237080 | MAGNETIC FIELD GENERATOR AND NUCLEAR MAGNETIC RESONANCE DEVICE PROVIDED WITH THE MAGNETIC FIELD GENERATOR - A magnetic field generator includes a magnetic circuit of an open magnetic path in which a uniform magnetic field can be generated with a simpler structure. A nuclear magnetic resonance device equipped with this magnetic filed generator is also provided. The magnetic field generator of an open magnetic path type includes: a first permanent magnet and a second permanent magnet which are arranged sequentially in a reference direction with a predetermined distance therebetween while directing the direction of magnetization in the reference direction, and a third permanent magnet and a fourth permanent magnet which are arranged sequentially between the first permanent magnet and the second permanent magnet along the reference direction while being in contact with each other or being spaced apart from each other with a predetermined distance therebetween. The direction of magnetization of the third permanent magnet has a first component parallel to the reference direction and a second component intersecting a first direction orthogonally and directed toward the region side. The direction of magnetization of the fourth permanent magnet has a first component and an inverted second component opposite to the direction of the second component and having a magnitude equal to a magnitude of the second component. | 09-24-2009 |
Hirokazu Kato, Zushi-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20090201472 | LIQUID IMMERSION EXPOSURE APPARATUS AND METHOD OF LIQUID IMMERSION EXPOSURE - A liquid immersion exposure apparatus has a stage on which a substrate to be processed is disposed and that moves based on a position control signal, a projection unit that projects a beam onto the substrate to be processed, a liquid supply unit that supplies liquid between the substrate to be processed and the projection unit, a liquid discharge unit that discharges the liquid held between the substrate to be processed and the projection unit, a gas ejection unit includes a first ejection unit and a second ejection unit disposed so as to surround at least a part of the projection unit and each ejecting gas onto the substrate to be processed, and a control unit that controls an amount of gas flow at the first ejection unit and an amount of the gas flow at the second ejection unit based on a moving speed of the stage while the stage is being moved. | 08-13-2009 |
| 20090239373 | CHEMICAL MECHANICAL POLISHING METHOD AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE - A chemical mechanical polishing method comprises polishing an organic film using a slurry including polymer particles having a surface functional group and a water-soluble polymer. | 09-24-2009 |
Hirokazu Kato, Osaka JP
| Patent application number | Description | Published |
|---|---|---|
| 20080232645 | TRACKING A SURFACE IN A 3-DIMENSIONAL SCENE USING NATURAL VISUAL FEATURES OF THE SURFACE - A facility for determining the 3-dimensional location and orientation of a subject surface in a distinguished perspective image of the subject surface is described. The subject surface has innate visual features, a subset of which are selected. The facility uses the location of the selected visual features in a perspective image of the subject surface that precedes the distinguished perspective image in time to identify search zones in the distinguished perspective image. The facility searches the identified search zones for the selected visual features to determine the 2-dimensional locations at which the selected visual features occur. Based on the determined 2-dimensional locations, the facility determines the 3-dimensional location and orientation of the subject surface in the distinguished perspective image. | 09-25-2008 |
Hirokazu Kato, Kanagawa JP
| Patent application number | Description | Published |
|---|---|---|
| 20120021657 | Surface Mount Contact And Connector Using Same - A connector includes a surface mount contact and housing. The surface mount contact has a cylindrical portion, a lance, and a pair of surface mount soldering portions. The cylindrical portion has a cylindrical shape into which a wire core of an electrical wire is inserted. The lance is positioned in an intermediate portion of the cylindrical portion along an axial direction thereof and secures the wire core when the electrical wire is inserted. The pair of surface mount soldering portions project from the cylindrical portion. Each of the pair of surface mount soldering portions extend from an end of the cylindrical portion in a direction orthogonal to the axial direction. | 01-26-2012 |