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Hirofumi Yamaguchi
Hirofumi Yamaguchi, Hyogo JP
| Patent application number | Description | Published |
|---|---|---|
| 20100233621 | PHOTOACID GENERATOR AND PHOTOREACTIVE COMPOSITION - An object of the present invention is to provide photoacid generator, which shows very high sensitivity in the near ultraviolet range of about 300 to 400 nm, and also can remarkably increase a reaction rate of a photoreactive composition using the same, and to provide a photoreactive composition which can initiate the reaction even by irradiation with near ultraviolet light within a short time and also can obtain a desired reaction product. More particularly, the present invention provides a dithienyl sulfide disulfonium salt represented by the formula (A1): | 09-16-2010 |
Hirofumi Yamaguchi, Nirasaki JP
| Patent application number | Description | Published |
|---|---|---|
| 20100226737 | SUBSTRATE TRANSFER APPARATUS AND SUBSTRATE TRANSFER METHOD - A substrate transfer apparatus that transfers a substrate with respect to a processing apparatus includes a substrate accommodation unit for accommodating a plurality of substrates to be loaded into the processing apparatus in a vertical direction in a multi-stage; a substrate accommodation unit for accommodating a plurality of substrates unloaded from the processing apparatus in a vertical direction in a multi-stage; a substrate holder for transferring the substrates from the substrate accommodation unit to the processing apparatus; a substrate holder for transferring the substrates from the processing apparatus to the substrate accommodation unit. The substrate accommodation unit has an elevating mechanism for moving at least one of the substrate and the substrate holder in a vertical direction relative to each other and the substrate accommodation unit has an elevating mechanism for moving at least one of the substrate and the substrate holder in a vertical direction relative to each other. | 09-09-2010 |
Hirofumi Yamaguchi, Komaki-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20100123370 | PIEZOELECTRIC/ELECTROSTRICTIVE CERAMICS COMPOSITION, PIEZOELECTRIC/ELECTROSTRICTIVE CERAMICS SINTERED BODY, PIEZOELECTRIC/ELECTROSTRICTIVE ELEMENT, MANUFACTURING METHOD OF PIEZOELECTRIC/ELECTROSTRICTIVE CERAMICS COMPOSITION, AND MANUFACTURING METHOD OF PIEZOELECTRIC/ELECTROSTRICTIVE ELEMENT - [Object] To provide piezoelectric/electrostrictive ceramics and a piezoelectric/electrostrictive element with a large electric field-induced strain without performing an aging treatment. | 05-20-2010 |
Hirofumi Yamaguchi, Nirasaki-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20100022093 | VACUUM PROCESSING APPARATUS, METHOD OF OPERATING SAME AND STORAGE MEDIUM - In a vacuum processing apparatus including a processing chamber having a transfer port, and a transfer chamber connected via a gate chamber to the transfer port, diffusion of a gas remaining in the processing chamber into the transfer chamber is suppressed. In order to suppress diffusion of gas from the processing chamber into the transfer chamber, the gate chamber is provided with a non-reactive gas supply unit and an exhaust port adapted to produce a stream of a non-reactive gas at a region facing the transfer port. This suppresses diffusion of gas from the processing chamber into the transfer chamber through the transfer port. | 01-28-2010 |
| 20100080444 | PROCESSING APPARATUS, PROCESSING METHOD, METHOD OF RECOGNIZING TARGET OBJECT AND STORAGE MEDIUM - A CCD detector | 04-01-2010 |
Hirofumi Yamaguchi, Numazu-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20100026246 | BATTERY CHARGING APPARATUS - A battery charging apparatus includes a controlled rectifier circuit for rectifying an output of a magneto AC generator and supplying a rectified output to a battery. The controlled rectifier circuit includes thyristors as rectifying elements, and components of the controlled rectifier circuit are mounted on a circuit board. The charging apparatus includes a protection circuit which has a sensor detecting a temperature of the circuit board and inhibits a trigger signal from being supplied to thyristors of said rectifier circuit when a temperature detected by said sensor is equal to or higher than a predetermined value. | 02-04-2010 |
Hirofumi Yamaguchi, Komaki-City JP
| Patent application number | Description | Published |
|---|---|---|
| 20090121589 | (Li, Na, K)(Nb, Ta)O3 BASED PIEZOELECTRIC MATERIAL AND MANUFACTURING METHOD THEREOF - Manufacturing sintered bodies having microstructures including microscopic grains having a grain diameter of less than 5 μm, intermediate grains having a grain diameter of 5 μm or more and less than 15 μm, and coarse grains having a grain diameter of 15 μm or more and 100 μm or less enables to obtain high electric characteristics. Chemical compounds including metal elements are mixed so that the ratio of the elements is a composition expressed by (Li, Na, K)(Nb, Ta)O | 05-14-2009 |
| 20090212254 | (Li, Na, K)(Nb, Ta, Sb)O3 BASED PIEZOELECTRIC MATERIAL AND MANUFACTURING METHOD THEREOF - The present inventive (Li, Na, K) (Nb, Ta, Sb) O | 08-27-2009 |
| 20090236556 | PIEZOELECTRIC/ELECTROSTRICTIVE CERAMIC COMPOSITION MANUFACTURING METHOD - A (Li, Na, K)(Nb, Ta)O | 09-24-2009 |
| 20100019187 | PIEZOELECTRIC/ELECTROSTRICTIVE CERAMICS SINTERED BODY AND PIEZOELECTRIC/ELECTROSTRICTIVE DEVICE USING THE SAME - There is disclosed a piezoelectric/electrostrictive ceramics which is a sintered body having a structure where a matrix and a filler are brought into a composite, the matrix is made of an alkali niobate-based piezoelectric/electrostrictive material, which includes a large number of grains combined with one another, including a perovskite type oxide, which includes at least one element selected from the group consisting of Li, Na and K as an A site constituent element and Nb as a B site constituent element, as a main crystal phase, the filler is made of a material (with the proviso that an alkali niobate-based material is excluded) having a thermal expansion coefficient smaller than that of the alkali niobate-based piezoelectric/electrostrictive material, and the volume fraction of the filler with respect to the total volume of the matrix and the filler is 0.5 vol % or more and below 10 vol %. | 01-28-2010 |
| 20100021728 | (Li, Na, K, Bi)(Nb, Ta)O3 BASED PIEZOELECTRIC MATERIAL AND MANUFACTURING METHOD OF THE SAME - Disclosed are piezoelectric materials in which electrical properties are improved, and manufacturing methods of the same. In (Li, Na, K, Bi)(Nb, Ta)O | 01-28-2010 |
Hirofumi Yamaguchi, Komaki JP
| Patent application number | Description | Published |
|---|---|---|
| 20090102325 | PIEZOELECTRIC/ELECTROSTRICTIVE CERAMIC COMPOSITION AND PIEZOELECTRIC/ELECTROSTRICTIVE DEVICE - The invention provides a (Li, Na, K)(Nb, Ta)O | 04-23-2009 |
| 20100019624 | PIEZOELECTRIC/ELECTROSTRICTIVE CERAMICS SINTERED BODY AND METHOD OF CALCULATING DIFFUSE SCATTERING INTENSITY RATIO - An alkali niobate-based piezoelectric/electrostrictive ceramics sintered body including, as a main crystal phase, a perovskite type oxide containing at least one type of element selected from the group consisting of Li, Na and K as A site constituent elements and at least one type of element selected from the group consisting of Nb and Ta as B site constituent elements. The number of lattice-strained layers of the piezoelectric/electrostrictive ceramics sintered body is preferably small. A diffuse scattering intensity ratio, which is a ratio of an intensity of diffuse scattering by a lattice-strained layer present near a domain wall to a sum of an X-ray diffraction intensity of a first lattice plane and that of a second lattice plane different in interplanar spacing from the first lattice plane due to crystallographic symmetry reduction is preferably 0.5 or lower. | 01-28-2010 |
| 20100022381 | METHOD OF MANUFACTURING PIEZOELECTRIC/ELECTROSTRICTIVE CERAMIC COMPOSITION - A (Li, Na, K)(Nb, Ta)O | 01-28-2010 |
Hirofumi Yamaguchi, Yamanashi-Ken JP
Hirofumi Yamaguchi, Nagoya-City JP
| Patent application number | Description | Published |
|---|---|---|
| 20080302996 | PIEZOELECTRIC/ELECTROSTRICTIVE PORCELAIN COMPOSITION AND PIEZOELECTRIC/ELECTROSTRICTIVE ELEMENT - A (Li, Na, K)(Nb, Ta)O | 12-11-2008 |
| 20090091214 | PIEZOELECTRIC/ELECTROSTRICTIVE CERAMIC COMPOSITION AND PIEZOELECTRIC/ELECTROSTRICTIVE DEVICE - The invention provides a (Li, Na, K)(Nb, Ta, Sb)O | 04-09-2009 |
| 20090121588 | PIEZOELECTRIC/ELECTROSTRICTIVE BODY, AND PIEZOELECTRIC/ELECTROSTRICTIVE ELEMENT - The piezoelectric/electrostrictive body is represented by a composition formula ABO | 05-14-2009 |
Hirofumi Yamaguchi, Shizuoka-Ken JP
| Patent application number | Description | Published |
|---|---|---|
| 20080290477 | Semiconductor Device - A semiconductor device having a plurality of semiconductor chips mounted on a lead frame ( | 11-27-2008 |
Hirofumi Yamaguchi, Yamanashi JP
| Patent application number | Description | Published |
|---|---|---|
| 20090087542 | FILM POSITION ADJUSTING METHOD, MEMORY MEDIUM AND SUBSTRATE PROCESSING SYSTEM - A substrate processing system includes a processing chamber | 04-02-2009 |
Hirofumi Yamaguchi, Nirasaki City JP
| Patent application number | Description | Published |
|---|---|---|
| 20110158774 | SUBSTRATE PROCESSING APPARATUS AND METHOD - A substrate processing apparatus includes mounting units for mounting transfer containers, a substrate transfer unit for unloading substrates from a transfer container, processing unit for processing the substrates from the transfer container, an image pickup unit for capturing at one time an image of the entire substrate accommodating region of the transfer container before the substrate transfer unit unloads the substrates from the transfer container and a moving unit for moving the image pickup unit horizontally along one direction. The apparatus further includes an information acquiring unit for acquiring information on vertical positions of the substrates based on the image obtained by the image pickup unit and a control unit for controlling the substrate transfer unit to unload the substrates accommodated in the transfer container based on the information on the vertical positions of the substrates. The image pickup unit is provided in common for at least two of the transfer containers. | 06-30-2011 |