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Hirofumi Fujii
Hirofumi Fujii, Osaka JP
| Patent application number | Description | Published |
|---|---|---|
| 20080241759 | METHOD OF MANUFACTURING WIRING CIRCUIT BOARD - A conductor circuit ( | 10-02-2008 |
| 20090101394 | PHOTOSENSITIVE RESIN COMPOSITION AND FLEXIBLE PRINTED WIRING CIRCUT BOARD HAVING INSULATIVE COVER LAYER FORMED OF PHOTOSENSITIVE RESIN COMPOSITION - A photosensitive resin composition which is excellent in flame resistance, resolution and flexibility, and substantially free from deposition of components thereof to prevent contamination of a product. The photosensitive resin composition comprises: | 04-23-2009 |
| 20100304298 | NEGATIVE PHOTOSENSITIVE MATERIAL, PHOTOSENSITIVE BOARD EMPLOYING THE NEGATIVE PHOTOSENSITIVE MATERIAL, AND NEGATIVE PATTERN FORMING METHOD - A negative photosensitive material is provided which has a lower linear expansion coefficient and a lower hygroscopic expansion coefficient and is excellent in gradational patternability and PI etchability in patterning. The negative photosensitive material comprises: | 12-02-2010 |
| 20110084787 | PHOTOSENSITIVE RESIN COMPOSITION, METAL-BASE-CONTAINING CIRCUIT BOARD PRODUCTION METHOD EMPLOYING THE PHOTOSENSITIVE RESIN COMPOSITION, AND METAL-BASE-CONTAINING CIRCUIT BOARD - A photosensitive resin composition which is capable of reducing stress occurring due to thermal history, such as a heat treatment, a metal-base-containing circuit board production method which suppresses the warpage of a circuit board by employing the photosensitive resin composition and a metal-base-containing circuit board. The photosensitive resin composition comprises a polyamide acid, a 1,4-dihydropyridine derivative and an amide compound. | 04-14-2011 |
Hirofumi Fujii, Takasago-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20110067631 | ARC ION PLATING APPARATUS - An arc ion plating apparatus comprises a vacuum chamber, a rotary table for moving a substrate within the vacuum chamber vertically relative to its height direction, an arc evaporation source for bombardment for cleaning the surface of the substrate with metal ions, and an arc evaporation source for deposition group for depositing metal ions on the surface of the substrate. The arc evaporation source for deposition group is composed of a plurality of evaporation sources arranged so as to be opposite to the substrate set on the rotary table, and the arc evaporation source for bombardment is arranged so as to be opposite to the substrate, and formed so that its length in the height direction of the vacuum chamber is equal to the length between the upper and lower ends of the arc evaporation source for deposition group. According to such a structure, over temperature rise or abnormal discharge is hardly caused in the substrate at the time of bombardment, and process controllability is consequently enhanced. | 03-24-2011 |
Hirofumi Fujii, Ibaraki-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20090130432 | HEAT-RESISTANT RESIN - The present invention provides a low-modulus low-stress resin which has such heat resistance that cohesive force and reliability can be retained even at high temperatures and which is applicable as various functional materials. | 05-21-2009 |
| 20090253891 | CLEANING SUBSTRATE OF SUBSTRATE PROCESSING EQUIPMENT AND HEAT RESISTANT RESIN PREFERABLE THEREOF - The present invention provides a cleaning substrate of a substrate processing equipment, which comprises a cleaning layer comprising a heat resistant resin with a storage modulus (1 Hz) at 20° C. up to 150° C. being 5×10 | 10-08-2009 |
| 20100319151 | CLEANING SHEET, CONVEYING MEMBER USING THE SAME, AND SUBSTRATE PROCESSING EQUIPMENT CLEANING METHOD USING THEM - A cleaning sheet for cleaning foreign matters away from the interior of the substrate processing equipment is provided. The cleaning sheet includes a cleaning layer having substantially no tackiness and having a tensile modulus of not lower than 0.98 N/mm | 12-23-2010 |
Hirofumi Fujii, Utsunomiya-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20090179066 | Container and Exposure Apparatus Having the Same - A method of forming a container having a lid and a container body which define an inside space, and a material containing an organic compound provided in the inside space. The method includes forming a groove and a communication member for communicating the groove with an outside space, in at least one of the lid and the container body, providing the material in the inside space, welding the lid and the container body to each other, and exhausting the organic compound vaporized by welding heat to the outside space through the groove and the communication member. | 07-16-2009 |
| 20100252941 | OPTICAL ELEMENT MANUFACTURING METHOD - A method of manufacturing an optical element used at a second air pressure different from a first air pressure comprises: a measuring step of measuring a surface shape of the optical member at the first air pressure; a calculating step of calculating a deformation amount of the optical member that occurs owing to an air pressure difference between the first air pressure and the second air pressure; and a processing step of processing the optical member at the first air pressure so as to make the surface shape of the optical member match a target shape at the second air pressure, based on the surface shape measured in the measuring step and the deformation amount calculated in the calculating step. | 10-07-2010 |
Hirofumi Fujii, Hyogo JP
| Patent application number | Description | Published |
|---|---|---|
| 20090065348 | METHOD OF ARC ION PLATING AND TARGET FOR USE THEREIN - It is an object of the present invention to provide an arc ion plating method and a target used therein, capable of obtaining a uniform film thickness distribution substantially throughout the overall length of a work and also capable of improving the yield of the target material and reducing the manufacturing cost of the target. Within a vacuum chamber | 03-12-2009 |