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Hinnen
Ben Hinnen, Arvada, CO US
| Patent application number | Description | Published |
|---|---|---|
| 20100310344 | DUAL TEMPERATURE AUTOMATED STORAGE AND RETRIEVAL SYSTEM - An automated storage and retrieval system is presented. The automated storage and retrieval system may have at least two zones that are thermally isolated. The automated storage and retrieval system is operative to store and retrieve items from a plurality of storage locations in the first and second zone. An access member may be provided to selectively maintain and interrupt thermal isolation of the zones. | 12-09-2010 |
Bennett C. Hinnen, Golden, CO US
| Patent application number | Description | Published |
|---|---|---|
| 20090191012 | Anti-Microbial Carrier Systems - An improved carrier system is provided that includes a plurality of carriers and/or a transport surface having anti-microbial characteristics. In a pneumatic tube carrier system application, the internal surfaces of one or a plurality of selectively openable/closeable carriers may comprise an anti-microbial material The anti-microbial material may be mixed with a base material to form each carrier. Alternatively, the anti-microbial material may be mixed in a coating applied to a base carrier structure. The carrier contact surfaces of the pneumatic tubes and other system componentry may also comprise an anti-microbial material. | 07-30-2009 |
Bennett Charles Hinnen, Arvada, CO US
| Patent application number | Description | Published |
|---|---|---|
| 20110186630 | SYSTEM AND METHOD FOR CARRIER IDENTIFICATION IN A PNEUMATIC TUBE SYSTEM - A system and method provides for the identification and monitoring of carriers within a pneumatic carrier system. Each carrier which is to be employed within the system includes an identification device such as a radio frequency identification (RFID) chip which has stored thereon identification information for the carrier. Positioned throughout the system are communications devices such as antennas and readers which are employed to read and/or write identification information on the chip. When a carrier is put in the system, a destination location can be associated with the particular carrier ID. This associated information is then employed to, among many things, monitor and confirm identity of the carrier as it moves to its destination. | 08-04-2011 |
Karel Johannes Gerhardus Hinnen, Eindhoven NL
| Patent application number | Description | Published |
|---|---|---|
| 20100027686 | IMAGE COMPRESSION AND DECOMPRESSION - Clusters of pixels are defined for use in image compression and decompression. The image information used to define the clusters may include pixel values at predetermined positions relative to a pixel or related motion vectors, gradients, texture etc. During compression of images the image information relative to pixels is examined to determine the cluster to which it belongs. Thus pixels can be classified according to the cluster for their image information. In an embodiment the definitions of the clusters are selected dynamically, dependent on image content. For each cluster a control parameter set is computed for a post-processing operation, such as filter coefficients for filtering or statistical data for locally generating texture. The control parameter set is selected dependent on the image content so that, when the post-processing operation is applied to the image after decompression it will improve image quality for the pixels that are classified as belonging to the cluster. The compressed image and the control parameter sets are transmitted to a decompression apparatus. Upon decompression, the image information that represents the decompressed image is examined to classify pixels according to the clusters and the different control parameter sets for the selected clusters are used to control post-processing at the locations of the pixels. | 02-04-2010 |
Paul Christiaan Hinnen, Veldhoven NL
| Patent application number | Description | Published |
|---|---|---|
| 20100227280 | Method of Measuring a Characteristic - During a multiple patterning process every n | 09-09-2010 |
| 20100233599 | Lithographic Apparatus and Device Manufacturing Method - A lithographic system includes a monitored lithographic projection apparatus arranged to project a patterned beam onto a substrate. A scatterometer measures a plurality of parameters of the pattern transferred to the substrate including at least one CD-profile parameter and at least one further parameter of the pattern transferred to the substrate which is indicative of a machine setting of the monitored lithographic projection apparatus. A matching system includes a database storing information representative of reference CD values and reference values for the further feature. A comparison arrangement compares the measured values with the corresponding stored values, a lithographic parameter calculation means calculating a corrected set of machine settings for the monitored lithographic apparatus dependent on the differences between the measured and reference values. | 09-16-2010 |
| 20100328636 | Producing a Marker Pattern and Measurement of an Exposure-Related Property of an Exposure Apparatus - In order to determine whether an exposure apparatus is projecting patterns correctly, a marker pattern is used on a mask for printing a specific marker structure onto a substrate. This marker is then measured by an inspection apparatus to determine whether there are errors in exposure-related properties such as focus and dose. The projection of the marker pattern is modified so as to accentuate the production of side lobe-induced features of the marker structure relative to the production of side lobe-inducted features of the product structure. The form of the marker structure is more responsive to exposure variation than the form of the product structure to exposure variation. The marker pattern includes both primary features and secondary features that augment the side lobe arising from the primary feature to print side lobe-induced features on either side of a primary marker structure. Alternatively, the marker pattern is modified by having a different attenuation factor with respect to the product pattern. Alternatively, the marker pattern is modified by providing a marker dose different from the product dose. | 12-30-2010 |
| 20110128520 | ALIGNMENT SYSTEMS AND METHODS FOR LITHOGRAPHIC SYSTEMS - An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively. | 06-02-2011 |