| Patent application number | Description | Published |
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| 20100126668 | PLASMA PROCESSING APPARATUS AND METHOD - An apparatus includes an upper electrode and a lower electrode for supporting a wafer disposed opposite each other within a process chamber. A first RF power supply configured to apply a first RF power having a relatively higher frequency is connected to the upper electrode. A second RF power supply configured to apply a second RF power having a relatively lower frequency is connected to the lower electrode. A variable DC power supply is connected to the upper electrode. A process gas is supplied into the process chamber while any one of application voltage, application current, and application power from the variable DC power supply to the upper electrode is controlled, to generate plasma of the process gas so as to perform plasma etching. | 05-27-2010 |
| 20110214815 | PLASMA PROCESSING APPARATUS AND METHOD - An apparatus includes an upper electrode and a lower electrode for supporting a wafer disposed opposite each other within a process chamber. A first RF power supply configured to apply a first RF power having a relatively higher frequency, and a second RF power supply configured to apply a second RF power having a relatively lower frequency is connected to the lower electrode. A variable DC power supply is connected to the upper electrode. A process gas is supplied into the process chamber to generate plasma of the process gas so as to perform plasma etching. | 09-08-2011 |
| 20110272097 | PLASMA PROCESSING APPARATUS AND METHOD - A plasma etching apparatus includes an upper electrode and a lower electrode, between which plasma of a process gas is generated to perform plasma etching on a wafer W. The apparatus further comprises a cooling ring disposed around the wafer, a correction ring disposed around the cooling ring, and a variable DC power supply directly connected to the correction ring, the DC voltage being preset to provide the correction ring with a negative bias, relative to ground potential, for attracting ions in the plasma and to increase temperature of the correction ring to compensate for a decrease in temperature of a space near the edge of the target substrate due to the cooling ring. | 11-10-2011 |
| Patent application number | Description | Published |
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| 20080246741 | INPUT DEVICE, AND ELECTRO-OPTICAL DEVICE - An input device includes an input panel, a cover member that is provided with a housing portion, in which the input panel is housed, and a film member that is disposed over a main surface of the input panel provided in the housing portion and a main surface of the cover member. | 10-09-2008 |
| 20090096754 | TOUCH PANEL, ELECTRO OPTICAL DEVICE, AND ELECTRONIC APPARATUS - There is provided a touch panel including a first substrate, a second substrate opposing the first substrate, a first electrode film formed on the first substrate, a second electrode film formed on the second substrate, the second electrode film opposing the first electrode film. An openings is formed in each of the first electrode film and the second electrode film, and the opening formed in the first electrode film and the opening formed in the second electrode film are overlapped in plan view and each of the openings has a different opening area. | 04-16-2009 |
| 20090096762 | INPUT DEVICE, DISPLAY DEVICE WITH INPUT FUNCTION, AND ELECTRONIC APPARATUS - An input device includes: a resistive film type input unit; and a non-contact type input unit that overlaps at least a portion of the resistive film type input unit. The resistive film type input unit includes: first and second substrates each having a first surface and a second surface; a first electrode that is formed on the first surface of the first substrate; and a second electrode that is formed on the first surface of the second substrate. The second substrate is provided on an input operation side of the first substrate, and the first electrode of the first substrate faces the second electrode of the second substrate. The resistive film type input unit is in a standby state that does not perform input detection until an input to the non-contact type input unit is detected. When the input to the non-contact type input unit is detected, the resistive film type input unit is turned on to perform input detection. | 04-16-2009 |
| 20090096763 | TOUCH PANEL, DISPLAY DEVICE WITH INPUT FUNCTION, AND ELECTRONIC APPARATUS - A touch panel includes: first and second substrates each having a first surface and a second surface, the second substrate being arranged on an input operation side of the first substrate; a first electrode that is formed on the first surface of the first substrate; a second electrode that is formed on the first surface of the second substrate; a resistive film type input area in which the first electrode of the first substrate and the second electrode of the second substrate face each other; and a capacitance type input area in which third electrodes are formed on at least one of the first substrate and the second substrate. The resistive film type input area and the capacitance type input area are separated from each other in plan view. | 04-16-2009 |
| 20100059293 | RESISTIVE FILM TYPE INPUT DEVICE, DISPLAY DEVICE WITH INPUT FUNCTION, AND ELECTRONIC APPARATUS - A resistive film type input device includes: a resistive film which is formed on a surface of the first insulating substrate opposed to the second insulating substrate; feeding electrodes which apply a voltage to the resistive film on the first insulating substrate; a detecting electrode films which are formed on a surface of the second insulating substrate are in an electrically floating state; and a potential detecting unit which detects a potential of a contact location of the resistive film through the detecting electrode film contacted to the resistive film among the detecting electrode films by pressing against. | 03-11-2010 |
