| Patent application number | Description | Published |
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| 20080217291 | SUBSTRATE MOUNTING STAGE AND SURFACE TREATMENT METHOD THEREFOR - A substrate mounting stage that prevents poor attraction of substrates so as to improve the operating rate of a substrate processing apparatus. The substrate mounting stage is disposed in the substrate processing apparatus and has a substrate mounting surface on which a substrate is mounted. The arithmetic average roughness (Ra) of the substrate mounting surface is not less than a first predetermined value, and the initial wear height (Rpk) of the substrate mounting surface is not more than a second predetermined value. | 09-11-2008 |
| 20080230181 | PLASMA PROCESSING APPARATUS AND STRUCTURE THEREIN - A structure, for use in a processing chamber of a plasma processing apparatus in which a plasma process is performed on a target substrate, includes a base member at least having a first surface and a second surface; and a thermally sprayed insulating film covering the first surface. Further, the structure includes an insulating protection member covering the second surface and made of a material having a linear expansion coefficient different from that of the base member; and a buffing surface covered with an insulating layer interposed between the thermally sprayed insulating film and the insulating protection member to prevent a contact therebetween. The thermally sprayed insulating film, the insulating protection member and the insulating layer constitute an insulating surface covering the first surface and the second surface. | 09-25-2008 |
| 20080237030 | SURFACE PROCESSING METHOD FOR MOUNTING STAGE - A surface processing method for a mounting stage, which enables a mounting surface conforming to a substrate to be formed while saving time and effort. The substrate is mounted on a mounting surface of the mounting stage disposed in a housing chamber of a substrate processing apparatus that carries out plasma processing on the substrate. The mounted substrate is thermally expanded. | 10-02-2008 |
| 20080280536 | SURFACE TREATMENT METHOD - A surface treatment method that enables a surface of an electrostatic chuck to be smoothed, so as to improve the efficiency of heat transfer between the surface of the electrostatic chuck and a substrate. The electrostatic chuck is provided in an upper portion of a susceptor provided in a chamber of a substrate processing apparatus. In the surface treatment of the electrostatic chuck, a sprayed coating film is formed on the surface of the electrostatic chuck, next the surface of the electrostatic chuck is ground by bringing into contact therewith a grindstone, then the surface of the electrostatic chuck is ground flat by bringing into contact therewith a lapping plate onto a surface of which is sprayed a suspension, and then the surface of the electrostatic chuck is ground smooth by bringing into contact therewith a tape of a tape lapping apparatus. | 11-13-2008 |
| 20090101284 | Table for plasma processing apparatus and plasma processing apparatus - An object of the present invention is to suppress damage of an electrostatic chuck, by controlling stress exerted on each part of a table, which includes an electrically conductive material, i.e., an electrode for generating plasma, a dielectric layer for enhancing the in-plane uniformity of a plasma process, and an electrostatic chuck. The table for a plasma processing apparatus includes an electrically conductive member connected with a high frequency power source and adapted for plasma generation, for drawing ions present in the plasma, or for both thereof; a dielectric layer provided on a top face of the electrically conductive member, having a central portion and a peripheral portion that are different in thickness relative to each other, and adapted for providing uniformity of high frequency electric field intensity in a plane over the substrate to be processed; and an electrode film for an electrostatic chuck, provided in the dielectric layer and adapted for electrostatically chucking the substrate onto a top face of the dielectric layer. With such configuration, the stress exerted on the electrostatic chuck due to temperature change can be controlled. | 04-23-2009 |
| 20090199967 | MOUNTING STAGE AND PLASMA PROCESSING APPARATUS - A mounting stage for a plasma processing apparatus that can prevent degradation of an insulating film in a semiconductor device on a substrate. A conductor member is connected to a radio-frequency power source for producing plasma. A dielectric layer is buried in a central portion of an upper surface of the conductor member. An electrostatic chuck is mounted on the dielectric layer. The electrostatic chuck has an electrode film that satisfies the following condition: | 08-13-2009 |
| 20110192540 | TABLE FOR PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING APPARATUS - An object of the present invention is to suppress damage of an electrostatic chuck, by controlling stress exerted on each part of a table, which includes an electrically conductive material, i.e., an electrode for generating plasma, a dielectric layer for enhancing the in-plane uniformity of a plasma process, and an electrostatic chuck. The table for a plasma processing apparatus includes an electrically conductive member connected with a high frequency power source and adapted for plasma generation, for drawing ions present in the plasma, or for both thereof; a dielectric layer provided on a top face of the electrically conductive member, having a central portion and a peripheral portion that are different in thickness relative to each other, and adapted for providing uniformity of high frequency electric field intensity in a plane over the substrate to be processed; and an electrode film for an electrostatic chuck, provided in the dielectric layer and adapted for electrostatically chucking the substrate onto a top face of the dielectric layer. With such configuration, the stress exerted on the electrostatic chuck due to temperature change can be controlled. | 08-11-2011 |
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| 20090242668 | Fuel Injection Valve and Method for Forming Orifice Thereof - A fuel injection valve comprises a convex portion prominently formed on an outer end surface of a nozzle body, stepped recesses each of which has plural steps formed by press forming on the convex portion, and multi orifices as fuel nozzle holes formed by press forming so that an outlet of each of the orifices is located at a bottom face of each of the stepped recesses. Furthermore, the fuel injection valve has plural sets each of which comprises one of the stepped recesses and the relevant orifice, the orifices incline to each other, and a step on a downstream side in each of the stepped recesses has a larger diameter than a step on an upstream side thereof. | 10-01-2009 |
| 20100229385 | Method of Processing Orifice - Disclosed herein is a method for processing an orifice capable of processing recessed portions and orifices, each having a unique hole diameter different from each other, to high positioning accuracy and in a short time. | 09-16-2010 |
| 20110005077 | Method of Machining Orifice and Press-Working Method - It is an object of the present invention to enhance the orifice design freedom and easy machin ability in a fuel injection valve in which orifices are formed by press-working. | 01-13-2011 |
| 20110011954 | Fuel Injection Valve and Machining Method for Nozzle - A fuel injection valve with reduced adhesion of deposits to a fuel injecting portion and superior in durability is provided. Also provided is a method for machining multi-orifice type fuel injecting portions easily, less expensively, in good surface roughness, in high productivity, and with few variations in shape, accuracy and surface roughness, using inexpensive equipment. The surface roughness of fuel injecting portions comprising orifices and apertures is made Rz 2 μm or less. Apertures are formed by press working so as to each have a plastic-worked surface of Rz 0.2 μm or less in surface roughness and then orifices are formed in the bottoms of the apertures so as to have a plastic-worked surface of Rz 0.2 μm or less in surface roughness. Further, when abrasion resistance of the nozzle is required, the fuel injecting portions are finished to a surface roughness of Rz 2 μm by quenching. | 01-20-2011 |
| 20110042490 | Fuel Injection Valve and Method for Coupling Two Components Together - There is provided a coupling process whereby two components can be coupled together at high positional precision regardless of precision of a single component. A softer component | 02-24-2011 |
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| 20080295506 | VEHICLE BEHAVIOR CONTROL APPARATUS - A hydraulic circuit includes a first pressurizing section for pressurizing a wheel cylinder by operating a master cylinder, and a second pressurizing section for pressurizing the wheel cylinder independently of operation of the master cylinder. A control unit determines whether a first operation request according to a physical relationship between a vehicle and an environment surrounding the vehicle is present; determines whether a second operation request according to a physical behavior of the vehicle is present; activates the first pressurizing section when the first operation request is present and the second operation request is absent; activates the second pressurizing section when the first operation request is absent and the second operation request is present; and keeps the first pressurizing section activated and activates the second pressurizing section, when the second operation request turns present under condition that the first pressurizing section is activated in response to the first operation request. | 12-04-2008 |
| 20090230761 | Brake system for engine-operated vehicle and controlling method thereof - A brake system provided with a brake booster using intake negative pressure of an engine for boosting a brake operating force for a vehicle. A requested braking force is detected base on an operating amount of a brake pedal, and when the requested braking force is less than a threshold value, a master cylinder pressure prevailing in the master cylinder using an operating force boosted by the brake booster is supplied to the wheel cylinder. On the other hand, when the requested braking force is greater than or equal to the threshold value, brake fluid pressure having been boosted by a pump is supplied to the wheel cylinder. The threshold value is set to a value that becomes greater the larger the negative pressure inside the brake booster. | 09-17-2009 |
| 20090261649 | Brake Booster - The present invention provides a brake booster in which an excellent pedal feeling can be provided even though a brake fluid pressure control unit is disposed between the brake booster and a wheel cylinder. The brake booster according to the present invention performs different methods for controlling a booster based on whether the fluid pressure control unit is in operation, and controls a displacement amount of an assist member so that a change in a master cylinder pressure is within a predetermined range even when the fluid pressure control unit is in operation. | 10-22-2009 |
| 20100070151 | Vehicle Speed Control Device and Method for Controlling Vehicle Speed - An accelerator pedal operation condition detecting section detects an operation condition of the accelerator pedal, a brake pedal operation condition detecting section detects an operation condition of the brake pedal; an inter-vehicular distance detecting section detects a distance between an own-vehicle and a forward-vehicle and a speed control section controls a speed of the own-vehicle. A control unit is configured to keep a relative positional relation between the own-vehicle and the forward-vehicle when the detected inter-vehicular distance is smaller than a predetermined reference inter-vehicular distance and the operation condition detected by the accelerator pedal operation condition detecting section and the brake pedal operation condition detecting section indicates a predetermined operation condition. | 03-18-2010 |
| 20100187901 | BRAKE CONTROL APPARATUS AND METHOD FOR CONTROLLING THE BRAKE - To provide a brake control apparatus and method for controlling the brake which is capable of preventing a fluctuation of a brake pedal stroke amount when switching a regenerative braking force to a hydraulic braking force. | 07-29-2010 |
| 20100191423 | VEHICLE ROLLOVER PREVENTION CONTROL APPARATUS AND VEHICLE ROLLOVER PREVENTION CONTROL METHOD - In a vehicle rollover prevention control apparatus employing a brake system serving as an actuator configured to control a dynamic behavior of a vehicle, a steering-input decision section is provided to make a rollover prediction, based on a driver-applied steering input, whether a predetermined level of roll motion for the vehicle occurs, and also to detect a driver-applied steering-back action. Also provided is an active rollover prevention control intervention decision section configured to make a rollover decision about rollover of the vehicle when the driver-applied steering-back action has been detected. An active rollover prevention control section is configured to execute rollover prevention control by controlling the actuator, when it is predicted for the predetermined level of roll motion to occur by the steering-input decision section and the rollover decision that rollover will occur has been made by the active rollover prevention control section. | 07-29-2010 |
