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| 20100119969 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND DPOLYHYDROXYAMIDE RESIN - There is provided a positive photosensitive resin composition that is excellent in electric insulating properties, heat resistance, mechanical strength and electrical characteristics, and capable of forming a high-resolution circuit pattern. The positive photosensitive resin composition comprises at least one type of a polyhydroxyamide resin containing a repeating unit represented by Formula (1) and having a weight average molecular weight of 3,000 to 100,000, and a compound generating an acid by light irradiation. | 05-13-2010 |
| 20100130755 | PROCESS FOR PRODUCTION OF COUMARIN DIMER COMPOUND - There is provided a one-step process for producing a dihydroxy-substituted coumarin dimer compound by a photodimerization reaction of a hydroxy-substituted coumarin compound. The process comprises subjecting a hydroxy-substituted coumarin compound to a photodimerization reaction in a solvent selected from aliphatic ketones having 3 to 10 carbon atoms, aliphatic carboxylic acid esters having 2 to 10 carbon atoms, aliphatic alcohols having 1 to 10 carbon atoms, aliphatic nitriles having 2 to 10 carbon atoms, ethers having 4 to 10 carbon atoms, amides having 3 to 10 carbon atoms, and a mixture thereof to obtain a dihydroxy-substituted coumarin dimer compound. | 05-27-2010 |
| 20100210765 | RESIST UNDERLAYER FILM-FORMING COMPOSITION, PRODUCTION METHOD OF SEMICONDUCTOR DEVICE USING THE SAME, AND ADDITIVE FOR RESIST UNDERLAYER FILM-FORMING COMPOSITION - There is provided a composition for forming a resist underlayer film that the adhesion with a resist applied on the resist underlayer film is enhanced and the collapse of a resist pattern is suppressed. A resist underlayer film-forming composition for lithography comprising: a polymer having silicon atoms in the backbone; a compound of a polycyclic structure; and an organic solvent, wherein the compound of a polycyclic structure has at least two carboxyl groups as substituents; the two carboxyl groups are individually bonded to two carbon atoms adjacent to each other forming the polycyclic structure; and the two carboxyl groups both have an endo configuration or an exo configuration, or have a cis configuration. | 08-19-2010 |
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| 20090012318 | Cage-shaped cyclobutanoic dianhydrides and process for production thereof - A process which comprises reacting a 1,2,3,4-cyclobutanetetracarboxylic-1,2:3,4-dianhydride [1] with an alcohol [2] in the presence of an acid catalyst to obtain a compound [3], isomerizing the compound [3] with a base catalyst into a compound [4], reacting the compound [4] with an organic acid to obtain a compound [5], and reacting the compound [5] with a dehydrating agent to obtain a 1,2,3,4-cyclobutanetetracarboxylic-1,3:2,4-dianhydride: wherein R | 01-08-2009 |
| 20090182115 | POLYAMIC ACID AND POLYIMIDE - Disclosed are a polyamic acid containing not less than 10 mol % of a repeating unit represented by the formula [1] below, and a polyimide represented by the formula [2] below which is obtained from such a polyamic acid. The polyamic acid and polyimide have high heat resistance as shown by a thermal decomposition temperature of not less than 300° C. In addition, the polyamic acid and polyimide have good workability because of their high solubility in solvents, while exhibiting good light transmission. (In the formulae, R | 07-16-2009 |
| 20090292103 | POLYAMIC ACID AND POLYIMIDE - A polyamic acid comprising at least 10 mol % repeating units represented by the formula [1] or [2]; and a polyimide represented by the formula [3] or [4] which is obtained from the polyamic acid. A polyimide film having high heat resistance and satisfactory in light-transmitting properties and tensile strength is obtained from the polyamic acid. | 11-26-2009 |
| 20100063243 | POLYAMIC ACIDS, POLYIMIDES, AND PROCESSES FOR THE PRODUCTION THEREOF - To provide polyamic acids and polyimides, which have high light transmittance and heat resistance such that their thermal decomposition temperatures are at least 300° C. and which are excellent in their solubility in solvents and have their processability improved. | 03-11-2010 |
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| 20100001515 | COUPLING MECHANISM - In a coupling mechanism, an inner peripheral wall of a coupling main body is inscribed with an outer side ring groove of containing an outer peripheral side edge portion of a stopper member, a stopper member introducing port formed by a width wider than a width dimension of a strip member of the stopper member is inscribed at a position of an outer wall portion of the coupling main body slightly shifted from a position of inscribing the outer side ring groove to a side of an inserting front end, the stopper member is applied with a spiral torsion such that both end portions opposed to each other of the strip member slightly carry out core deviation, an inner peripheral wall of the outer side ring groove is formed by a taper face in a state of being expanded from a rear end side to a front end side in an inserting direction, also an outer peripheral wall of the stopper member is formed by a taper face of a shape in correspondence with the taper face of the outer side ring groove, the inner peripheral wall of the stopper member is formed by a shape substantially in parallel with an outer peripheral wall of the connected pipe, and a face of the inner peripheral wall is formed by a rough face achieving a slip preventing effect. | 01-07-2010 |
| 20110237995 | Physical Fitness Garments - Physical fitness garments are disclosed. In an embodiment, a garment for being placed in contact with a wearer's limb includes a base layer having a base level resistance to stretching, and an activation element coupled to the base layer, the activation element comprising a lattice pattern and having a resistance to stretching greater than the base level resistance to stretching, wherein said activation element is configured to be placed in contact with the back of the wearer's thigh, not to extend above the upper most extent of the gluteus maximus, and not to extend below the knee, and wherein the garment is configured to be able to cause increased activity in a first muscle in the wearer's limb during a locomotion movement via an increase in the resistance to contraction of the first muscle provided by the garment during locomotion of the wearer. | 09-29-2011 |
