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Hideo Nakamura

Hideo Nakamura, Ushiku JP

Patent application numberDescriptionPublished
20110104391INKJET COATING DEVICE AND INKJET COATING METHOD - When the coating object area is positioned on the suction table, the film is stopped and is mounted on the suction table, and is further provided with tension in the longitudinal direction to eliminate slacks or the like, but, curl is caused in the both side end regions in the coating object area. Therefore, the coating object area is mounted on the suction table, and at the same time, the curl correction bars disposed on the both sides of the suction table are moved to the curled portions of the coating object area, and then the curled portions are pressed against the suction surface of the suction table to thereby perform the curl correction.05-05-2011
20110181651INK-JET APPLICATION APPARATUS AND METHOD - A film paid out from a feed side film roll is conveyed so that an application target area of the film is located on a suction table in an application portion. Image-capturing cameras are disposed so as to be adjacent to ink-jet application heads so that one application head and one image-capturing camera are integrated with each other in terms of position of installation to form one application head unit portion. Each application head unit portion is moved above the suction table by a three-dimensionally movable XYZ-direction driving unit. A position where application will be performed next is image-captured by each of the image-capturing cameras in advance during the applying operation due to each of the application heads. A result of image capturing by each of the image-capturing cameras is processed by an image processing unit.07-28-2011

Hideo Nakamura, Hyogo-Ken JP

Patent application numberDescriptionPublished
20110024048PLASMA PROCESSING APPARATUS - In a plasma oxidation processing apparatus (02-03-2011

Hideo Nakamura, Amagasaki-City JP

Patent application numberDescriptionPublished
20110017586Method for forming silicon oxide film, storage medium, and plasma processing apparatus - In oxidation of a silicon having irregularities, a silicon oxide film having a thickness as small as possible is formed in the side wall as compared with the bottom. A plasma is generated, using a plasma processing apparatus (01-27-2011

Hideo Nakamura, Toyota-Shi JP

Patent application numberDescriptionPublished
20080302484METHOD AND APPARATUS FOR LASER WELDING THERMOPLASTIC RESIN MEMBERS - A method and apparatus for welding members formed of thermoplastic resin material, with high welding strength and small strength variations. A laser welding apparatus 12-11-2008
20100089607SEMICONDUCTOR POWER CONVERSION APPARATUS AND METHOD OF MANUFACTURING THE SAME - A bus bar has a lead portion and a bus bar portion which are integrally shaped. The lead portion is provided in such a shape that branches from the bus bar portion. A part of the lead portion forms a connection part directly electrically connected with a transistor electrode and a diode electrode by a connecting material such as solder. The thickness of the lead portion including the connection part is made smaller than the thickness of the bus bar portion. Accordingly, such an interconnection structure can be provided in which the electrode of the semiconductor device and the bus bar are electrically directly connected with each other and thermal stress at the connection part therebetween can be relieved.04-15-2010
20100170662CONDENSER FOR POWER MODULE AND POWER MODULE - A condenser for a power module combines a plurality of aluminum materials to form a casing equipped with a channel for coolant therein, thus making it possible to keep material costs low. Moreover, thanks to the excellent workability of the aluminum materials, it is possible to adopt a configuration with a complex concave-convex configuration for a superior heat radiation performance. A channel for coolant with high heat radiation performance can also be structured inside the casing. The relatively thick bottom plate secures the rigidity required by the casing, while the relatively thin top plate can have a rigidity intentionally structured lower. In this manner, stress generated on joining surfaces of the condenser and an insulative substrate can be mitigated due to active deformation of the top plate.07-08-2010
20100307676METHOD AND APPARATUS FOR LASER WELDING THERMOPLASTIC RESIN MEMBERS - A method and apparatus for laser welding two members made of thermoplastic resin material whereby high welding strength can be achieved and strength variations can be reduced. A first member 12-09-2010
20120107628Three-Metallic-Component Type Composite Nanometallic Paste, Method Of Bonding, And Electronic Component - Provided is a composite nanometal paste which, when a layer of the paste interposed between upper and lower bodies is sintered in an inert gas under no load until the layer turns to a metal layer, attains a shear bond strength between the upper and lower bodies of 10 MPa or higher.05-03-2012

Patent applications by Hideo Nakamura, Toyota-Shi JP

Hideo Nakamura, Shiojiri-Shi JP

Patent application numberDescriptionPublished
20100100606INFORMATION DISTRIBUTION SYSTEM, SERVICE-PROVIDING METHOD FOR AN INFORMATION DISTRIBUTION SYSTEM, AND A PROGRAM FOR THE SAME - The effort of changing an application in conjunction with a change in process content or change in the type or specifications of a receiver can be reduced, and a cooperative process involving a plurality of receivers without going through an application can be achieved. An integrated device control service 04-22-2010
20100100810DEVICE CONTROL SYSTEM, SERVICE-PROVIDING METHOD FOR A DEVICE CONTROL SYSTEM, AND A PROGRAM FOR THE SAME - A device control system does not require changing the application in conjunction with changes in process content or changes in the type or specifications of a device. A style sheet database 04-22-2010
20100107057Information distribution system, service-providing method for an information distribution system, and a program for the same - An information distribution system reduces the effort required to change an application in conjunction with changes in process content and changes in the receiver type or specifications while also accommodating broadcast processes. A style sheet database stores a plurality of output style sheets, which are information conversion rules including conditional expressions related to information distribution. An integrated device control service acquires output data and receiver information specifying the address of the receiver and the output style sheet corresponding to said receiver. When the output data satisfies the conditional expression contained in the output style sheet, the integrated device control service distributes converted output data, which is the output data converted based on the output style sheet, to the address of the receiver.04-29-2010

Hideo Nakamura, Hyogo JP

Patent application numberDescriptionPublished
20080229564Method of Regenerating Filter Fabric and Regenerated Filter Fabric - A method of regenerating a filter fabric, comprising at least fibrillating a spent filter fabric and converting the fibers resulting from the fibrillation operation into a nonwoven fabric. In this method, a dust removing operation of removing any dust adhering to the fibers resulting from the fibrillation operation may be performed prior to the above mentioned formation of the nonwoven fabric. Further, it is preferred from the viewpoint of efficient regeneration that the fibrillation operation be performed by passage through an auto fibrillation machine.09-25-2008
20090252943ADIABATIC SOUND ABSORBER WITH HIGH THERMOSTABILITY - Provided is a flexible adiabatic sound absorber with high thermal insulation performance and acoustic performance, particularly an adiabatic sound absorbing material that is suitable for a new severe requirement specification regarding aircrafts. The adiabatic sound absorber comprises mixing uniformly 20 to 80% of a high-thermostable inorganic fiber whose high-temperature strength is maintained at 1000° C. or more, 10 to 60% of a flame-retarded organic fiber whose thermal melting or decomposition temperature is 350° C. or more and 10 to 25% of an organic fiber having a low melting point and treating the obtained woolly felt with heating to transform the whole into the mat-form material of 8 to 50 mm in thickness.10-08-2009

Hideo Nakamura, Nagano-Ken JP

Patent application numberDescriptionPublished
20090254900NETWORK SYSTEM, COMPUTERS, AND METHOD AND PROGRAM FOR PROVIDING AND EXECUTING APPLICATIONS IN NETWORK SYSTEM - To provide a network system or the like that makes it possible for a client terminal to use an application without being influenced by the quality of circuits or the like and having a simple configuration, and that also makes it possible for a user to easily search a desired application. In a network system 10-08-2009

Patent applications by Hideo Nakamura, Nagano-Ken JP

Hideo Nakamura, Inuyama JP

Patent application numberDescriptionPublished
20090238504SLIDING BEARING - A cylindrical sliding bearing having a cylindrical steel back metal, and a bearing alloy layer, serving as a sliding surface, on the inside of the steel back metal is provided. The cylindrical sliding bearing further have a coat layer of Bi or a Bi-based alloy formed on the outer back surface of the steel back metal. Preferably, the coat layer is made from the Bi-based alloy of 1 to 30 mass % of one or more kinds of Sn, Pb, In, Ag and Cu; and the balance being Bi and inevitable impurities.09-24-2009
20090238507SLIDING BEARING - A halved sliding bearing is provided, two of which are paired into a cylindrical shape. The halved sliding bearing includes a steel back metal, and a bearing alloy layer, which serves as a sliding surface, on the inside of the steel back metal. A coat layer of Bi or a Bi-based alloy is formed on the outside back surface of the steel back metal. Preferably, the coat layer consists of 1 to 30 mass % of one or more of Sn, Pb, In, Ag and Cu and the balance being Bi and inevitable impurities.09-24-2009

Hideo Nakamura, Chiba JP

Patent application numberDescriptionPublished
20090127751Process for Producing Molded Product by Inflation Molding - A process for producing a molded product by inflation molding, which is improved in productivity in molding and can give a molded product not impaired in properties inherent in polyethylene, wherein a molded product is produced by inflation molding using a mixture comprising polyethylene having a density of 900 to 980 (kg/m05-21-2009
20090137729Process for Producing Oriented Film - [Object]Disclosed is to provide a process for producing a film by using a raw material comprising a polyethylene having a density of 900 to 980 kg/m05-28-2009
20090166911Process for Producing Molded Article by T-Die Molding - [Object] Disclosed is to provide a process for producing a molded article of polyethylene excellent in mechanical properties while the productivity at the time of T-die molding is improved, and a process for producing a secondary molded article by vacuum molding of the molded article with high formability. 07-02-2009

Hideo Nakamura, Sakado-Shi JP

Patent application numberDescriptionPublished
20090001131Method of manufacturing cylindrical body, friction stir welding method, and friction stir welding device - A friction stir welding apparatus (01-01-2009

Hideo Nakamura, Tokyo JP

Patent application numberDescriptionPublished
20080200433Molecular Chaperone Function Regulator - According to the present invention, a molecular chaperone function regulator containing a quinazoline derivative represented by the following formula (I)08-21-2008

Patent applications by Hideo Nakamura, Tokyo JP

Hideo Nakamura, Amagasaki-Shi JP

Patent application numberDescriptionPublished
20110171835METHOD AND APPARATUS FOR FORMING SILICON OXIDE FILM - A method of forming a silicon oxide film on silicon exposed on a surface of a workpiece includes mounting the workpiece on a mounting table in a processing chamber; generating plasma of a process gas containing oxygen by supplying the process gas into the processing chamber; applying a bias to the workpiece by supplying high-frequency power to the mounting table; and forming the silicon oxide film by applying the plasma to the biased workpiece and oxidizing the silicon. A ratio of oxygen in the process gas is set to be in the range of 0.1% to 10%. A pressure in the processing chamber is set to be in the range of 1.3 Pa to 266.6 Pa upon forming the silicon oxide film. An output of the high-frequency power is set to be in the range of 0.14 W/cm07-14-2011
20110174441PLASMA PROCESSING APPARATUS - Provided is a plasma processing apparatus wherein an electrode embedded in a mounting table is supplied with high frequency power for biasing. A surface, which is exposed to plasma and is of an aluminum cover functioning as an opposite electrode to the electrode of the mounting table, is coated with a protection film, preferably a Y07-21-2011

Hideo Nakamura, Kanagawa JP

Patent application numberDescriptionPublished
20120032637BATTERY CHARGING CONTROL DEVICE AND BATTERY CHARGING CONTROL METHOD FOR ELECTRIC VEHICLE - A battery charging control device for controlling a power generation device installed in an electric vehicle sets a battery energy management area using a current position of a host vehicle as a reference, detects at least one travelable route within the battery energy management area, calculates a battery energy management upper limit value and a battery energy management lower limit value on the basis of a maximum value and a minimum value of energy values required to travel to respective points on the travelable route from the current position, and calculates a battery energy management width by subtracting the management lower limit value from the management upper limit value. When the battery energy management width is not within a predetermined range, the battery energy management area is modified so as to enter the predetermined range. As a result, battery charging is controlled such that a magnitude relationship between the battery energy management upper limit value and the battery energy management lower limit value does not reverse.02-09-2012

Hideo Nakamura, Nirasaki City JP

Patent application numberDescriptionPublished
20120067845PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD - There is provided a plasma processing apparatus capable of stably generating plasma by suppressing oscillation of a plasma potential, and capable of preventing contamination caused by sputtering a facing electrode made of metal. A high frequency bias power is applied to an electrode within a mounting table for mounting a target object thereon. An extended protrusion 03-22-2012

Hideo Nakamura, Yamanashi JP

Patent application numberDescriptionPublished
20120094505METHOD FOR SELECTIVE OXIDATION, DEVICE FOR SELECTIVE OXIDATION, AND COMPUTER-READABLE MEMORY MEDIUM - A selective oxidation treatment method in which plasma of a hydrogen gas and an oxygen containing gas is allowed to act on an object to be treated, and in which silicon and a metallic material are exposed in the surface, within a treatment container of a plasma treatment apparatus comprises: after the supply of the hydrogen gas from a hydrogen gas supply source is initiated by using a first inert gas, which passes through a first supply path, as a carrier gas, initiating the supply of the oxygen containing gas from an oxygen containing gas supply source by using a second inert gas, which passes through a second supply path, as a carrier gas before the plasma is ignited; igniting the plasma of a treatment gas including the oxygen containing gas and the hydrogen gas within the treatment container; and selectively oxidizing the silicon by the plasma.04-19-2012

Hideo Nakamura, Aichi-Ken JP

Patent application numberDescriptionPublished
20120111550EBULLIENT COOLING DEVICE - An ebullient cooling device having a simple structure and capable of limiting the bubbles to an appropriate volume. The ebullient cooling device for cooling a heat generating element is provided with a plurality of vertically arranged cooling channels comprising a lower channel (05-10-2012