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Hideo Hosono, Kanagawa JP

Hideo Hosono, Kanagawa JP

Patent application numberDescriptionPublished
20080299415Sputtering Target, Thin Film for Optical Information Recording Medium and Process for Producing the Same - A sputtering target is provided that has a relative density of 80% or more and contains a compound having as its principal component zinc oxide satisfying A12-04-2008
20090042058MAGNETIC SEMICONDUCTOR MATERIAL - A magnetic semiconductor material contains at least one type of transition metals (Mn02-12-2009
20090240085METHOD OF PRODUCING DIOL, POLYDIOL, SECONDARY ALCOHOL OR DIKETONE COMPOUND - The invention is a process of using, as a reducing agent, a 12CaO.7Al09-24-2009
20090278122AMORPHOUS OXIDE AND THIN FILM TRANSISTOR - The present invention relates to an amorphous oxide and a thin film transistor using the amorphous oxide. In particular, the present invention provides an amorphous oxide having an electron carrier concentration less than 1011-12-2009
20090280600AMORPHOUS OXIDE AND THIN FILM TRANSISTOR - The present invention relates to an amorphous oxide and a thin film transistor using the amorphous oxide. In particular, the present invention provides an amorphous oxide having an electron carrier concentration less than 1011-12-2009
20100167000Sputtering Target, Thin Film for Optical Information Recording Medium and Process for Producing the Same - A sputtering target is provided that has a relative density of 80% or more and contains a compound having as its principal component zinc oxide satisfying A07-01-2010
20100240521Sputtering Target, Thin Film for Optical Information Recording Medium and Process for Producing the Same - A sputtering target is provided that has a relative density of 80% or more and contains a compound having as its principal component zinc oxide satisfying A09-23-2010
20110002832SUPERCONDUCTING COMPOUND AND METHOD FOR PRODUCING THE SAME - Disclosed is a superconducting compound which has a structure obtained by partially substituting oxygen ions of a compound, which is represented by the following chemical formula; LnTMOPh [wherein Ln represents at least one element selected from Y and rare earth metal elements (La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb and Lu), TM represents at least one element selected from transition metal elements (Fe, Ru, Os, Ni, Pd and Pt), and Pn represents at least one element selected from pnictide elements (N, P, As and Sb)] and has a ZrCuSiAs-type crystal structure (space group P4/nmm), with at least one kind of monovalent anion (F01-06-2011
20110045985SUPERCONDUCTOR COMPRISING LAMELLAR COMPOUND AND PROCESS FOR PRODUCING THE SAME - A superconductor which comprises a new compound composition substituting for perovskite copper oxides. The superconductor is characterized by comprising a compound which is represented by the chemical formula A(TM)02-24-2011
20110101352AMORPHOUS OXIDE AND THIN FILM TRANSISTOR - The present invention relates to an amorphous oxide and a thin film transistor using the amorphous oxide. In particular, the present invention provides an amorphous oxide having an electron carrier concentration less than 1005-05-2011
20110111965LAYERED COMPOUND, SUPERCONDUCTOR AND METHOD FOR PRODUCING SAME - Provides a new non-oxide system compound material superconductor as an alternative of the perovskite type copper oxides superconductor.05-12-2011

Patent applications by Hideo Hosono, Kanagawa JP