| Patent application number | Description | Published |
|---|
| 20080241485 | INK COMPOSITION AND IMAGE RECORDING METHOD AND IMAGE RECORDED MATTER USING SAME - An ink composition containing at least a polymerizable composition, a pigment, and a polymer represented by General Formula (1): | 10-02-2008 |
| 20090059138 | METHOD OF PRODUCING ORGANIC NANOPARTICLES, ORGANIC NANOPARTICLES THUS OBTAINED, INKJET INK FOR COLOR FILTER, COLORED PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE RESIN TRANSFER MATERIAL, CONTAINING THE SAME, AND COLOR FILTER, LIQUID CRYSTAL DISPLAY DEVICE AND CCD DEVICE, PREPARED USING THE SAME - A method of producing organic nanoparticles, comprising:
| 03-05-2009 |
| 20100076108 | METHOD OF PRODUCING PHTHALOCYANINE PIGMENT NANO-SIZED PARTICLE DISPERSION, AND METHOD OF PRODUCING AN INKJET INK FOR A COLOR FILTER CONTAINING THE DISPERSION; AND COLORED LIGHT-SENSITIVE RESIN COMPOSITION, LIGHT-SENSITIVE TRANSFER MATERIAL, AND COLOR FILTER, CONTAINING THE DISPERSION; AND COLORED LIGHT-SENSITIVE RESIN COMPOSITION, LIGHT-SENSITIVE TRANSFER MATERIAL, AND COLOR FILTER, CONTAINING THE DISPERSION, AND LIQUID CRYSTAL DISPLAY DEVICE AND CCD DEVICE USING THE SAME - A method of producing a phthalocyanine pigment nano-sized particle dispersion, containing: mixing a phthalocyanine compound solution of a phthalocyanine compound dissolved in an acid or a good solvent containing an acid, with an organic solvent that is a poor solvent with respect to the phthalocyanine compound, to prepare a mixed liquid in which a phthalocyanine compound crystal is formed, wherein a phthalocyanine compound crystal having one crystalline form selected from the group consisting of α, β, γ, ε, δ, π, ρ, A, B, X, Y, and R is added to the organic poor solvent or the mixed liquid, thereby producing the thus-formed phthalocyanine compound crystal having the same crystalline form as that of the added phthalocyanine compound crystal, and wherein an additive having a mass average molecular weight of 1,000 or more is incorporated therein. | 03-25-2010 |
| 20100248149 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM AND PATTERN FORMING METHOD USING THE COMPOSITION - Provided is an actinic ray-sensitive or radiation-sensitive resin composition including (P) a resin which contains (A) a repeating unit having an ionic structure moiety capable of producing an acid anion on the side chain upon irradiation with an actinic ray or radiation, wherein a cation moiety of the ionic structure moiety has an acid-decomposable group or an alkali-decomposable group. | 09-30-2010 |
| 20100261103 | ORGANIC PIGMENT FINE PARTICLES AND METHOD OF PRODUCING THE SAME, PIGMENT-DISPERSION COMPOSITION, PHOTOCURABLE COMPOSITION AND INK-JET INK CONTAINING THE SAME, AND COLOR FILTER USING THE SAME AND METHOD OF PRODUCING THE SAME - Organic pigment fine particles, having capability of self-dispersion, having an organic pigment and a polymer compound, the organic pigment fine particles of being nanometer-sized fine particles obtained by mixing an organic pigment solution and a second solvent, thereby to precipitate the fine particles in the mixed liquid, the organic pigment solution prepared by dissolving the organic pigment and the polymer compound in a first solvent, the second solvent of being served as a poor solvent for the organic pigment and being compatible with the first solvent, in which a compound insoluble in the second solvent is used as the polymer compound, and the organic pigment fine particles are provided with a capability of self-dispersing in a third solvent different from any of the first solvent and the second solvent. | 10-14-2010 |
| 20110159433 | PHOTOSENSITIVE COMPOSITION, PATTERN-FORMING METHOD USING THE COMPOSITION, AND RESIN USED IN THE COMPOSITION - Provided are a radiation-sensitive composition including a compound (P) having a partial structure (A) having an ionic structural site and capable of decomposing upon irradiation with an actinic ray or radiation to generate an acid and a partial structure (B) having at least one phenolic hydroxyl group, a part or all of hydrogen atoms of the hydroxyl group or groups each being protected by a group capable of leaving by the action of an acid, wherein the ionic structural site of the partial structure (A) contained in the compound (P) is a structure capable of generating an acid anion in the compound (P) upon irradiation with an actinic ray or radiation; a pattern-forming method using the same; and a resin which is used in the composition. | 06-30-2011 |
| 20110318693 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME - An embodiment of the composition contains a resin (P) containing a repeating unit (A) that is configured to decompose when exposed to actinic rays or radiation to thereby generate an acid. The repeating unit (A) contains a cation structure with a monocyclic or polycyclic heterocycle containing a nitrogen atom. | 12-29-2011 |
| 20120003590 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME - An actinic ray-sensitive or radiation-sensitive resin composition containing a resin having (A) a repeating unit represented by a specific formula (I) and (B) a repeating unit capable of generating an acid upon irradiation with an actinic ray or radiation. | 01-05-2012 |
