| Patent application number | Description | Published |
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| 20080241485 | INK COMPOSITION AND IMAGE RECORDING METHOD AND IMAGE RECORDED MATTER USING SAME - An ink composition containing at least a polymerizable composition, a pigment, and a polymer represented by General Formula (1): | 10-02-2008 |
| 20090059138 | METHOD OF PRODUCING ORGANIC NANOPARTICLES, ORGANIC NANOPARTICLES THUS OBTAINED, INKJET INK FOR COLOR FILTER, COLORED PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE RESIN TRANSFER MATERIAL, CONTAINING THE SAME, AND COLOR FILTER, LIQUID CRYSTAL DISPLAY DEVICE AND CCD DEVICE, PREPARED USING THE SAME - A method of producing organic nanoparticles, comprising:
| 03-05-2009 |
| 20100076108 | METHOD OF PRODUCING PHTHALOCYANINE PIGMENT NANO-SIZED PARTICLE DISPERSION, AND METHOD OF PRODUCING AN INKJET INK FOR A COLOR FILTER CONTAINING THE DISPERSION; AND COLORED LIGHT-SENSITIVE RESIN COMPOSITION, LIGHT-SENSITIVE TRANSFER MATERIAL, AND COLOR FILTER, CONTAINING THE DISPERSION; AND COLORED LIGHT-SENSITIVE RESIN COMPOSITION, LIGHT-SENSITIVE TRANSFER MATERIAL, AND COLOR FILTER, CONTAINING THE DISPERSION, AND LIQUID CRYSTAL DISPLAY DEVICE AND CCD DEVICE USING THE SAME - A method of producing a phthalocyanine pigment nano-sized particle dispersion, containing: mixing a phthalocyanine compound solution of a phthalocyanine compound dissolved in an acid or a good solvent containing an acid, with an organic solvent that is a poor solvent with respect to the phthalocyanine compound, to prepare a mixed liquid in which a phthalocyanine compound crystal is formed, wherein a phthalocyanine compound crystal having one crystalline form selected from the group consisting of α, β, γ, ε, δ, π, ρ, A, B, X, Y, and R is added to the organic poor solvent or the mixed liquid, thereby producing the thus-formed phthalocyanine compound crystal having the same crystalline form as that of the added phthalocyanine compound crystal, and wherein an additive having a mass average molecular weight of 1,000 or more is incorporated therein. | 03-25-2010 |
| 20100248149 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM AND PATTERN FORMING METHOD USING THE COMPOSITION - Provided is an actinic ray-sensitive or radiation-sensitive resin composition including (P) a resin which contains (A) a repeating unit having an ionic structure moiety capable of producing an acid anion on the side chain upon irradiation with an actinic ray or radiation, wherein a cation moiety of the ionic structure moiety has an acid-decomposable group or an alkali-decomposable group. | 09-30-2010 |
| 20100261103 | ORGANIC PIGMENT FINE PARTICLES AND METHOD OF PRODUCING THE SAME, PIGMENT-DISPERSION COMPOSITION, PHOTOCURABLE COMPOSITION AND INK-JET INK CONTAINING THE SAME, AND COLOR FILTER USING THE SAME AND METHOD OF PRODUCING THE SAME - Organic pigment fine particles, having capability of self-dispersion, having an organic pigment and a polymer compound, the organic pigment fine particles of being nanometer-sized fine particles obtained by mixing an organic pigment solution and a second solvent, thereby to precipitate the fine particles in the mixed liquid, the organic pigment solution prepared by dissolving the organic pigment and the polymer compound in a first solvent, the second solvent of being served as a poor solvent for the organic pigment and being compatible with the first solvent, in which a compound insoluble in the second solvent is used as the polymer compound, and the organic pigment fine particles are provided with a capability of self-dispersing in a third solvent different from any of the first solvent and the second solvent. | 10-14-2010 |
| 20110159433 | PHOTOSENSITIVE COMPOSITION, PATTERN-FORMING METHOD USING THE COMPOSITION, AND RESIN USED IN THE COMPOSITION - Provided are a radiation-sensitive composition including a compound (P) having a partial structure (A) having an ionic structural site and capable of decomposing upon irradiation with an actinic ray or radiation to generate an acid and a partial structure (B) having at least one phenolic hydroxyl group, a part or all of hydrogen atoms of the hydroxyl group or groups each being protected by a group capable of leaving by the action of an acid, wherein the ionic structural site of the partial structure (A) contained in the compound (P) is a structure capable of generating an acid anion in the compound (P) upon irradiation with an actinic ray or radiation; a pattern-forming method using the same; and a resin which is used in the composition. | 06-30-2011 |
| 20110318693 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME - An embodiment of the composition contains a resin (P) containing a repeating unit (A) that is configured to decompose when exposed to actinic rays or radiation to thereby generate an acid. The repeating unit (A) contains a cation structure with a monocyclic or polycyclic heterocycle containing a nitrogen atom. | 12-29-2011 |
| 20120003590 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME - An actinic ray-sensitive or radiation-sensitive resin composition containing a resin having (A) a repeating unit represented by a specific formula (I) and (B) a repeating unit capable of generating an acid upon irradiation with an actinic ray or radiation. | 01-05-2012 |
| 20120006788 | CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME - A chemical amplification resist composition that is used for preparation of a mold, and a mold preparation method and a resist film each using the composition are provided. | 01-12-2012 |
| 20120034559 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM THEREFROM AND METHOD OF FORMING PATTERN THEREWITH - Provided is an actinic-ray- or radiation-sensitive resin composition, includes a resin (P) containing a repeating unit (A) that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid and a repeating unit (B) with a structure that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer, and a compound (U) structured so that when the composition is formed into a film, the compound is unevenly distributed in a surface of the film. | 02-09-2012 |
| Patent application number | Description | Published |
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| 20100183975 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD USING THE SAME, AND RESIN - Provided is a actinic ray-sensitive or radiation-sensitive resin composition including (P) a resin containing (A) a repeating unit having an ionic structure moiety that contains a cation represented by formula (Ia) and is capable of producing an acid anion on the side chain upon irradiation with an actinic ray or radiation: | 07-22-2010 |
| 20100248143 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, AND PATTERN-FORMING METHOD USING THE SAME - Provided is an actinic ray-sensitive or radiation-sensitive resin composition, a resist film formed with the composition, and a pattern-forming method using the same. The actinic ray-sensitive or radiation-sensitive resin composition includes (P) a resin that contains the following repeating units (A), (B) and (C); and a solvent having a boiling temperature of 150° C. or less,
| 09-30-2010 |
| 20110183258 | POSITIVE RESIST COMPOSITION, PATTERN FORMING METHOD USING THE COMPOSITION, AND COMPOUND FOR USE IN THE COMPOSITION - A positive resist composition comprising (A) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (B) a resin capable of increasing the solubility in an alkali developer by the action of an acid, and (C) a compound having a specific structure, which decomposes by the action of an acid to generate an acid, a pattern forming method using the positive resist composition, and a compound for use in the positive resist composition are provided as a positive resist composition exhibiting good performance in terms of pattern profile, line edge roughness, pattern collapse, sensitivity and resolution in normal exposure (dry exposure), immersion exposure and double exposure, a pattern forming method using the positive resist composition and a compound for use in the positive resist composition. | 07-28-2011 |
| 20110183263 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION - According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a resin (P) containing a repeating unit (A) that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid and at least two types of repeating units (B1), (B2) that when acted on by an acid, are decomposed to thereby generate an alkali-soluble group, wherein the alkali-soluble group generated by the repeating unit (B1) is different from the alkali-soluble group generated by the repeating unit (B2). | 07-28-2011 |
| 20120082939 | ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE RESIN COMPOSITION, AND ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME - An active light ray sensitive or radioactive ray sensitive resin composition which satisfies high sensitivity, high resolution, good pattern configuration, and good line edge roughness at the same time to a great extent, while having sufficiently good outgassing performance during exposure, and an active light ray sensitive or radioactive ray sensitive film formed by using the composition, and a pattern-forming method, are provided. | 04-05-2012 |
| Patent application number | Description | Published |
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| 20080238221 | SOUNDPROOF TYPE ENGINE GENERATOR - A soundproof type engine generator has a first external air inlet and a second external air inlet formed on a soundproof case K. A first cooling passage guides external air drawn in through the first external air inlet through a duct to a first fan, then from the first fan to a generator and discharges the air out of the soundproof case K. A second cooling passage guides external air drawn in through the second external air inlet to an engine using a second fan and then discharges the air out of the soundproof case The first fan is made up of a disk-like planar part, a plurality of first blades and a plurality of second blades, respectively provided radially on both head and tail sides of the planar part. External air drawn with the plurality of first blades through the first external air inlet is guided through the duct to the generator, and discharged out of the soundproof case. Air in the soundproof case is discharged with the plurality of second blades out of the soundproof case. The soundproof type engine generator effectively cools the interior of the soundproof case and simplifies the constitution of the air feed passage via the layout and configuration of the fan. | 10-02-2008 |
| 20090068575 | PROCESSED PIGMENT, PIGMENT-DISPERSED COMPOSITION, COLORED PHOTOSENSITIVE COMPOSITION, COLOR FILTER, LIQUID CRYSTAL DISPLAY ELEMENT, AND SOLID IMAGE PICKUP ELEMENT - Provided are a processed pigment excellent in dispersibility and dispersion stability, a pigment-dispersed composition excellent in dispersibility and dispersion stability of a pigment that uses the processed pigment, a colored photosensitive composition using the pigment-dispersed composition, and a color filter having improved color properties that uses the colored photosensitive composition, in which a pigment is covered with at least one of a specific polymer compound selected from the following (SP-1) to (SP-3);
| 03-12-2009 |
| 20120076997 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN - Provided is an actinic-ray- or radiation-sensitive resin composition, including a resin comprising a repeating unit (A), the a repeating unit (A) containing a structural moiety (S1) that when acted on by an acid, is decomposed to thereby generate an alkali-soluble group and a structural moiety (S2) that when acted on by an alkali developer, is decomposed to thereby increase its rate of dissolution in the alkali developer, and a repeating unit (B) that when exposed to actinic rays or radiation, generates an acid. | 03-29-2012 |
| 20120094235 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION - According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a resin (A) whose solubility in an alkali developer is increased by the action of an acid, the resin containing any of the units of general formula (AI) below and any of the units of general formula (AII) below, and a compound (B) that when exposed to actinic rays or radiation, generates an acid with any of the structures of general formula (BI) below. | 04-19-2012 |
