| Patent application number | Description | Published |
|---|
| 20090033903 | ILLUMINATION SYSTEMS, EXPOSURE APPARATUS, AND MICRODEVICE-MANUFACTURING METHODS USING SAME - Illumination systems are disclosed that illuminate a surface M for irradiation with illumination light emitted from a light source | 02-05-2009 |
| 20090040493 | ILLUMINATION OPTICAL SYSTEM, ILLUMINATION OPTICAL APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD - An illumination optical apparatus includes a light source, which supplies illumination light including a wavelength of 5 nm to 50 nm, and an illumination optical system, which guides the illumination light to an illuminated surface. The illumination optical system includes an aperture angle restriction member and a condenser optical system, which is arranged in an optical path between the aperture restriction member and the illuminated surface to guide light beam from the aperture angle restriction member to the illuminated surface. A rotation axis of an arcuate-shape of an illumination region formed on the illuminated surface is located outside an opening of the aperture angle restriction member. The condenser optical system includes a plurality of reflection surfaces. Among the plurality of reflection surfaces, the reflection surface closest to the illuminated surface along the optical path includes a concave shape. When, for example, applied to an EUVL exposure apparatus, the illumination optical apparatus illuminates a reflective mask, serving as the illumination plane, without a plane mirror in the optical path between the illumination optical system and the mask. | 02-12-2009 |
| 20090135510 | REFLECTIVE PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD, PROJECTION METHOD, AND EXPOSURE METHOD - A reflective projection optical system comprises a first optical unit having at least one reflecting optical element, and a second optical unit having at least one reflecting optical element. A focal point on the second surface side of the first optical unit approximately agrees with a focal point on the first surface side of the second optical unit. An angle between a normal to the first surface and a principal ray of the illumination beam incident to the first surface is larger than a value of arcsine of a numerical aperture on the first surface side of the reflective projection optical system. All the optical elements in the projection optical system are located outside an extension surface of a ray group defining an outer edge of the illumination beam incident to the first surface. | 05-28-2009 |
| 20090239178 | OPTICAL ATTENUATOR PLATE, EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD - There is disclosed an optical attenuator plate and an optical attenuator plate to adjust a quantity of light from a light source, which has a plurality of high-transmittance regions with a relatively high transmittance, and in which shapes of the high-transmittance regions are so defined that an intensity distribution of diverging light or converging light having passed through the optical attenuator plate becomes uniform. | 09-24-2009 |
| 20090257042 | Exposure apparatus and electronic device manufacturing method - An exposure apparatus including a field stop is provided. The exposure apparatus includes an illumination optical system that guides light from a light source to a pattern forming section, a projection optical system that projects, onto an exposed surface, a pattern image formed by the pattern forming section with light from the illumination optical system, a driving section that moves, in a scanning direction, a substrate arranged on the exposed surface, and a block section that is disposed between the projection optical system and the exposed surface, where the block section has a scanning window that determines a width, in the scanning direction, of an exposure region exposed to light projected by the projection optical system. | 10-15-2009 |
| 20110109890 | LIGHT SOURCE APPARATUS, EXPOSURE APPARATUS, AND ELECTRONIC DEVICE MANUFACTURING METHOD - There is provided a light source apparatus for emitting light having a uniform intensity distribution. Such a light source apparatus for generating a light beam to be projected toward a fly-eye optical system included in an exposure apparatus includes a light source, and a mirror that reflects the light beam emitted from the light source toward the fly-eye optical system. Here, the mirror reflects the light beam from the light source such that the light beam projected toward the fly-eye optical system has a lower intensity in the edge portion than in the center portion. The mirror may reflect the light beam such that the intensity of the light beam projected toward the fly-eye optical system monotonically decreases in the edge portion. Furthermore, the mirror may reflect the light beam such that the intensity of the light beam projected toward the fly-eye optical system decreases down to zero in the edge portion. | 05-12-2011 |
