Patent application number | Description | Published |
20080211098 | SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME - A semiconductor device in which the resistance of a copper wiring to electromigration is increased. The copper wiring is formed so that copper grains will be comparatively large in a central portion of the copper wiring and so that copper grains will be comparatively small in an upper portion and a lower portion of the metal wiring. The copper wiring having this structure is formed by a damascene method. This structure can be formed by controlling electric current density at electroplating time. With the copper wiring having this structure, it is easier for an electric current to run through the central portion than to run through the upper portion. As a result, the diffusion of copper atoms in the upper portion is suppressed and therefore the diffusion of copper atoms from an interface between the copper wiring and a cap film is suppressed. | 09-04-2008 |
20080286960 | Method of manufacturing semiconductor device suitable for forming wiring using damascene method - (a1) A concave portion is formed in an interlayer insulating film formed on a semiconductor substrate. (a2) A first film of Mn is formed by CVD, the first film covering the inner surface of the concave portion and the upper surface of the insulating film. (a3) Conductive material essentially consisting of Cu is deposited on the first film to embed the conductive material in the concave portion. (a4) The semiconductor substrate is annealed. During the period until a barrier layer is formed having also a function of improving tight adhesion, it is possible to ensure sufficient tight adhesion of wiring members and prevent peel-off of the wiring members. | 11-20-2008 |
20100007023 | MANUFACTURE METHOD FOR SEMICONDUCTOR DEVICE HAVING IMPROVED COPPER DIFFUSION PREVENTIVE FUNCTION OF PLUGS AND WIRINGS MADE OF COPPER OR COPPER ALLOY - (a) A copper alloy film containing at least two types of metal elements in addition to copper is formed on the surface of an insulator containing oxygen and formed on a semiconductor substrate. (b) A metal film made of pure copper or copper alloy is formed on the copper alloy film. (c) After the step (a) or (b), heat treatment is performed under the condition that a metal oxide film is formed on a surface of the insulator through reaction between the oxygen in the insulator and the metal elements in the copper alloy film. | 01-14-2010 |
20100123480 | SEMICONDUCTOR DEVICE, METHOD OF MANUFACTURING SAME, AND APPARATUS FOR DESIGNING SAME - A semiconductor device that includes multiple logic circuit cells having respective logic circuits formed therein and multiple interconnects connected to the corresponding logic circuit cells. At least one of the interconnects has an opening formed therein so as to have an opening ratio different from one or more of the opening ratios of the remaining interconnects. | 05-20-2010 |
20100178762 | MANUFACTURE METHOD FOR SEMICONDUCTOR DEVICE SUITABLE FOR FORMING WIRINGS BY DAMASCENE METHOD AND SEMICONDUCTOR DEVICE - An interlayer insulating film having a concave portion is formed on a semiconductor substrate. A tight adhesion film is formed on the inner surface of the concave portion and the upper surface of the insulating film. The surface of the adhesion layer is covered with an auxiliary film made of Cu alloy containing a first metal element. A conductive member containing a second metal element other than the first metal element is embedded in the concave portion, and deposited on the auxiliary film. Heat treatment is performed to make atoms of the first metal element in the auxiliary film segregate on the inner surface of the concave portion. The adhesion layer contains an element for enhancing tight adhesion of the auxiliary film more than if the auxiliary film is deposited directly on a surface of the interlayer insulating film. During the period until the barrier layer having also the function of enhancing tight adhesion, it becomes possible to retain sufficient tight adhesion of a wiring member and prevent peel-off of the wiring member. | 07-15-2010 |
20100244201 | SEMICONDUCTOR DEVICE - A semiconductor device includes a first semiconductor substrate including a first integrated circuit, a second semiconductor substrate mounted over the first semiconductor substrate, the second semiconductor substrate including a second integrated circuit, a post made of an inorganic substance and formed over the first semiconductor substrate, an adhesive layer made of an organic substance arranged between the first and the second semiconductor substrates, and a substrate-through-via made of an electrical conductor extending through the second semiconductor substrate and the post, the substrate-through-via extending to the first semiconductor substrate. | 09-30-2010 |
20100323519 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE SUITABLE FOR FORMING WIRING USING DAMASCENE METHOD - (a1) A concave portion is formed in an interlayer insulating film formed on a semiconductor substrate. (a2) A first film of Mn is formed by CVD, the first film covering the inner surface of the concave portion and the upper surface of the insulating film. (a3) Conductive material essentially consisting of Cu is deposited on the first film to embed the conductive material in the concave portion. (a4) The semiconductor substrate is annealed. During the period until a barrier layer is formed having also a function of improving tight adhesion, it is possible to ensure sufficient tight adhesion of wiring members and prevent peel-off of the wiring members. | 12-23-2010 |
20110062589 | SEMICONDUCTOR DEVICE HAVING COPPER WIRING WITH INCREASED MIGRATION RESISTANCE - A semiconductor device has: a semiconductor substrate formed with a plurality of semiconductor elements, a plurality of interlevel insulating films laminated above the semiconductor substrate, including a first and a second interlevel insulating films adjacent to each other; a first wiring trench formed in the first interlevel insulating film; and a first damascene wiring including: a first barrier metal film having a diffusion preventive function, formed covering inner surface of the first wiring trench and defining a first main wiring trench; and a first main wiring layer filling the first main wiring trench, formed of first metal element, and added with second metal element having migration suppressing function, at spatially different concentration. | 03-17-2011 |
20110151662 | MANUFACTURE METHOD FOR SEMICONDUCTOR DEVICE HAVING IMPROVED COPPER DIFFUSION PREVENTIVE FUNCTION OF PLUGS AND WIRINGS MADE OF COPPER OR COPPER ALLOY AND SEMICONDUCTOR DEVICE OF THIS KIND - (a) A copper alloy film containing at least two types of metal elements in addition to copper is formed on the surface of an insulator containing oxygen and formed on a semiconductor substrate. (b) A metal film made of pure copper or copper alloy is formed on the copper alloy film. (c) After the step (a) or (b), heat treatment is performed under the condition that a metal oxide film is formed on a surface of the insulator through reaction between the oxygen in the insulator and the metal elements in the copper alloy film. | 06-23-2011 |