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Hichem

Hichem Bouguerra, Waterloo, IA US

Patent application number	Description	Published
20100120578	DRIVE AND STEERING CONTROL SYSTEM FOR AN ENDLESS TRACK VEHICLE - A drive and steering control system for an endless track vehicle such as a sugar cane harvester. A dual path hydrostatic drive has a pair of variable volume pumps connected for bidirectional flow to respective hydraulic motors driving a pair of endless tracks. A speed control lever and steering wheel mechanism each provide control inputs to a microprocessor which in turn controls the variable volume hydrostatic pumps to control vehicle velocity and turning in a way that matches control for wheeled vehicles. RPM sensors for the hydraulic motors provide a feedback signal that is used to compensate for equipment variation and to keep the vehicle on the course intended by the operator.	05-13-2010

Hichem Chouayekh, Stax TN

Patent application number	Description	Published
20100173366	Polypeptides Having L-Arabinose Isomerase Activity Exhibiting Minimum Dependence on Metal Ions for Its Activity and for Thermostability and Nucleic Acids Encoding the Same - The invention concerns identification of a gene encoding a novel L-arabinose isomerase of the	07-08-2010

Hichem M'Saad, Sunnyvale, CA US

Patent application number	Description	Published
20090278081	PAD PROPERTIES USING NANOPARTICLE ADDITIVES - A method for forming a polishing media and an article of manufacture is described. The article of manufacture may be formed into a polishing article. The polishing article includes a polymer base material and a plurality of nano-scale structures disposed in or on the polymer base material.	11-12-2009
20090314309	METHOD AND SYSTEM FOR SUPPLYING A CLEANING GAS INTO A PROCESS CHAMBER - A method and apparatus for cleaning a process chamber are provided. In one embodiment, a process chamber is provided that includes a remote plasma source and a process chamber having at least two processing regions. Each processing region includes a substrate support assembly disposed in the processing region, a gas distribution system configured to provide gas into the processing region above the substrate support assembly, and a gas passage configured to provide gas into the processing region below the substrate support assembly. A first gas conduit is configured to flow a cleaning agent from the remote plasma source through the gas distribution assembly in each processing region while a second gas conduit is configured to divert a portion of the cleaning agent from the first gas conduit to the gas passage of each processing region.	12-24-2009
20100012273	Method and System for Supplying a Cleaning Gas Into a Process Chamber - A method and apparatus for cleaning a process chamber are provided. In one embodiment, a process chamber is provided that includes a remote plasma source and a process chamber having at least two processing regions. Each processing region includes a substrate support assembly disposed in the processing region, a gas distribution system configured to provide gas into the processing region above the substrate support assembly, and a gas passage configured to provide gas into the processing region below the substrate support assembly. A first gas conduit is configured to flow a cleaning agent from the remote plasma source through the gas distribution assembly in each processing region while a second gas conduit is configured to divert a portion of the cleaning agent from the first gas conduit to the gas passage of each processing region.	01-21-2010