Patent application number | Description | Published |
20100075313 | DEVICE FOR THE LYSIS OF MICROORGANISMS PRESENT IN AN ENVIRONMENTAL OR CLINICAL SAMPLE AND THE EXTRACTION OF NUCLEIC ACIDS FROM SAID MICROORGANISMS FOR ANALYSIS - The present invention relates to a cartridge which can be positioned inside an air collection means and receive a means for recovering nucleic acids, said cartridge being substantially cylindrical and comprising a microorganism retaining zone, said retaining zone comprising microorganism lysis means. The invention also relates to a device for collecting microorganisms contained in the air and a device for microorganism lysis. | 03-25-2010 |
20110250680 | AUTOMATED SYSTEM FOR THE LYSIS OF MICROORGANISMS PRESENT IN A SAMPLE, FOR EXTRACTION AND FOR PURIFICATION OF THE NUCLEIC ACIDS OF SAID MICROORGANISMS FOR PURPOSES OF ANALYSIS - The present invention relates to, among other things, a device for collecting airborne microorganisms, said device having:
| 10-13-2011 |
20110273691 | RADIATION SOURCE, METHOD OF CONTROLLING A RADIATION SOURCE, LITHOGRAPHIC APPARATUS, AND METHOD FOR MANUFACTURING A DEVICE - An EUV radiation source in the form of a plasma is focused at a virtual source point so as to pass through an exit aperture of a source collector module in an EUV lithographic apparatus. Plasma position is controlled in three directions, X, Y and Z using monitoring signals. By exploiting the photoacoustic effect, the monitoring is accomplished in a non-intrusive manner using acoustic sensors coupled to material of a cone which surrounds the exit aperture. Different angular positions of the radiation beam can be deduced by discriminating signals from the different sensors on the basis of relative arrival time or phase, and/or by comparing the amplitude/intensity of the signals. A sequencer function can be used to introduce a sequence of deliberate offsets in the beam position. This allows acoustic signals to be generated and detected for measurement purposes, when the beam would otherwise not impinge on the material. | 11-10-2011 |
20120038898 | Lithographic Apparatus and Alignment Method - A lithographic apparatus comprising a source collector module including a collector, configured to collect radiation from a radiation source; an illuminator configured to condition the radiation collected by the collector and to provide a radiation beam; and a detector arrangement comprising a reflector arrangement disposed in a fixed positional relationship with respect to the illuminator, the reflector arrangement being arranged to reflect radiation from the source collector module; and a sensor arrangement disposed in a fixed positional relationship with respect to the reflector arrangement, the sensor arrangement being configured to measure at least one property of radiation reflected by the reflector, the detector arrangement being configured to determine the location of a far field position of the radiation as a function of at least one property of the radiation reflected by the reflector and measured by the sensor arrangement. | 02-16-2012 |
20120154777 | ILLUMINATION SYSTEM, LITHOGRAPHIC APPARATUS AND METHOD OF ADJUSTING AN ILLUMINATION MODE - An illumination system is disclosed that had a plurality of moveable reflective elements and associated actuators which may be configured to form an illumination mode. One or more of the actuators is arranged to move between first, second and third positions, and so move an associated moveable reflective element between first, second and third orientations, the first and second orientations being such that radiation reflected from the moveable reflective element forms part of the illumination mode, and the third orientation being such that radiation reflected from the moveable reflective element does not form part of the illumination mode. | 06-21-2012 |
20130001442 | RADIATION SOURCE AND LITHOGRAPHIC APPARATUS - A radiation source includes a fuel supply configured to deliver fuel to a plasma emission location for vaporization by a laser beam to form a plasma, and a collector configured to collect EUV radiation emitted by the plasma and direct the EUV radiation towards an intermediate focus. The collector includes a diffraction grating configured to diffract infrared radiation emitted by the plasma. The radiation source includes a radiation conduit located in between the collector and the intermediate focus. The radiation conduit includes an entrance aperture connected by an inwardly tapering body to an exit aperture. The radiation conduit includes an inner portion and an outer portion, the inner portion being closer to the intermediate focus than the outer portion. The inner portion is configured to reflect incident diffracted infrared radiation towards the outer portion. | 01-03-2013 |
20130077073 | METHODS TO CONTROL EUV EXPOSURE DOSE AND EUV LITHOGRAPHIC METHODS AND APPARATUS USING SUCH METHODS - EUV exposure dose in a lithographic apparatus is controlled pulse to pulse by varying a conversion efficiency with which a pulse of EUV radiation is generated from an excitation of a fuel material by a corresponding pulse of excitation laser radiation. Conversion efficiency can be varied in several different ways, by varying the proportion of a fuel material that intersects a laser beam, and/or by varying a quality of the interaction. Mechanisms to vary the conversion efficiency can be based on variation of a laser pulse timing, variation of pre-pulse energy, and/or variable displacement of a main laser beam in one or more directions. Steps to maintain symmetry of the generated EUV radiation can be included. | 03-28-2013 |
20140253894 | Radiation Source - A radiation source having a fuel stream generator ( | 09-11-2014 |