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Hendel, CA
Ariel Hendel, Cupertino, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20100097934 | NETWORK SWITCH FABRIC DISPERSION - Methods and apparatus for communicating data traffic using switch fabric dispersion are disclosed. An example apparatus includes a first tier of switch elements; and a second tier of switch elements operationally coupled with the first tier of switch elements. In the example apparatus, the first tier of switch elements is configured to receive a data packet from a source. The first tier of switch elements is also configured to route the data packet to the second tier of switch elements in accordance with a dispersion function, where the dispersion function is based on a dispersion tag associated with the data packet. The first tier of switch elements is still further configured to transmit the data packet to a destination for the data packet after receiving it from the second tier of switch elements. In the example apparatus the second tier of switch elements is configured to receive the data packet from the first tier of switch elements and route the data packet, based on a destination address of the data packet, back to the first tier of switch elements for transmission to the destination. | 04-22-2010 |
| 20100118884 | Method for Resolving Mutex Contention in a Network System - A method of resolving mutex contention within a network interface unit which includes providing a plurality of memory access channels, and moving a thread via at least one of the plurality of memory access channels, the plurality of memory access channels allowing moving of the thread while avoiding mutex contention when moving the thread via the at least one of the plurality of memory access channels is disclosed. | 05-13-2010 |
Guy Hendel, Santa Monica, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20100141021 | Composite wheel with 3-dimensional core - A composite wheel formed in a single piece with a three-dimensional honeycomb core and which may also include a bead seat to assist in keeping a tire in place. The device may be formed by employing a modified resin infusion process or modified resin transfer process. | 06-10-2010 |
| 20100141022 | Composite Wheel with Reinforced Core - A design and method for making a one-piece composite wheel with a reinforced core is disclosed. The composite wheel incorporates a disc core embedded in the disc region and an optional rim core embedded in the rim region. The material for the core pieces may be a honeycomb structure that is reinforced in three dimensions. The disc and rim of the composite wheel are formed integrally as one piece, such as by resin infusion molding. | 06-10-2010 |
Rudolf Hendel, Los Gatos, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20090046263 | USING PHASE DIFFERENCE OF INTERFERENCE LITHOGRAPHY FOR RESOLUTION ENHANCEMENT - Interference lithography (IL) system and methods are disclosed according to embodiments of the invention. Two beams of coherent light with a first phase difference expose a first interference pattern on a nonlinear photoresist. A second interference pattern may be exposed on the nonlinear photoresist using the same coherent light beams with a second phase difference. The difference between the first and second phase differences is between 70° and 270°. The ensuing pattern is a composite of the first and second interference patterns. The IL may employ a third and fourth light beam. | 02-19-2009 |
| 20090111056 | RESOLUTION ENHANCEMENT TECHNIQUES COMBINING FOUR BEAM INTERFERENCE-ASSISTED LITHOGRAPHY WITH OTHER PHOTOLITHOGRAPHY TECHNIQUES - Methods and systems are disclosed that provide multiple lithography exposures on a wafer, for example, using interference lithography and optical photolithography. Various embodiments may balance the dosage and exposure rates between the multiple lithography exposures to provide the needed exposure on the wafer. Other embodiments provide for assist features and/or may apply resolution enhancement to various exposures. In a specific embodiment, a wafer is first exposed using optical photolithography and then exposed using interference lithography. | 04-30-2009 |
| 20090117491 | RESOLUTION ENHANCEMENT TECHNIQUES COMBINING INTERFERENCE-ASSISTED LITHOGRAPHY WITH OTHER PHOTOLITHOGRAPHY TECHNIQUES - Methods and systems are disclosed that provide multiple lithography exposures on a wafer, for example, using interference lithography and optical photolithography. Various embodiments may balance the dosage and exposure rates between the multiple lithography exposures to provide the needed exposure on the wafer. Other embodiments provide for assist features and/or may apply resolution enhancement to various exposures. In a specific embodiment, a wafer is first exposed using optical photolithography and then exposed using interference lithography. | 05-07-2009 |
| 20090246706 | PATTERNING RESOLUTION ENHANCEMENT COMBINING INTERFERENCE LITHOGRAPHY AND SELF-ALIGNED DOUBLE PATTERNING TECHNIQUES - A method for providing regular line patterns using interference lithography and sidewall patterning techniques is provided according to one embodiment. The method comprising may include producing regularly spaced parallel lines on a template using interference lithography techniques and then depositing sidewalls on the longitudinal sides of the regularly spaced parallel lines using sidewall patterning techniques. Various deposition and etching steps may also be included. The embodiments of the invention may provide regular line patterns with a line density half the interference lithography line density. Various lithography techniques may also be used to crop rounded connecting resulting from the sidewall patterning and/or to alter portions of the line pattern. | 10-01-2009 |
| 20100002210 | INTEGRATED INTERFERENCE-ASSISTED LITHOGRAPHY - A lithography scanner and track system is provided that includes an interference lithography system according to one embodiment. The scanner provides a first optical exposure of a wafer. The track system provides pre and post-processing functions on a wafer. The interference lithography system may be included within the scanner and may expose a wafer either before or after the first optical exposure. The interference lithography system may also be included within the track system as part of the pre or post processing. The first optical exposure may include optical photolithography. | 01-07-2010 |
Rudolf H. Hendel, Los Gatos, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20110297396 | ENHANCED HYDROCARBON WELL BLOWOUT PROTECTION - Protection at a hydrocarbon well is enhanced by placing a blowout preventer over a well head. An adapter is connected to the blowout preventer. The adapter includes a valve that when turned off prevents non-production flow from the blowout preventer to a riser pipe. | 12-08-2011 |
Tomer Hendel, Santa Monica, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20100141021 | Composite wheel with 3-dimensional core - A composite wheel formed in a single piece with a three-dimensional honeycomb core and which may also include a bead seat to assist in keeping a tire in place. The device may be formed by employing a modified resin infusion process or modified resin transfer process. | 06-10-2010 |
| 20100141022 | Composite Wheel with Reinforced Core - A design and method for making a one-piece composite wheel with a reinforced core is disclosed. The composite wheel incorporates a disc core embedded in the disc region and an optional rim core embedded in the rim region. The material for the core pieces may be a honeycomb structure that is reinforced in three dimensions. The disc and rim of the composite wheel are formed integrally as one piece, such as by resin infusion molding. | 06-10-2010 |