| Patent application number | Description | Published |
|---|
| 20090014285 | TRANSPORT DEVICE WITH A MONITORING APPLIANCE AND SUBSTRATE TREATMENT APPARATUS - In a transport device, which comprises at least one endless conveyor guided around at least two guide rollers, a monitoring appliance for monitoring motion of a guide roller is positioned on at least one of the guide rollers. The monitoring appliance comprises a first contact element disposed on and electrically connected with the guide roller, and a second contact element disposed near the guide roller. The first and second contact elements are arranged relative to one another in such a way that an electrical contact between them occurs with every revolution of the guide roller, such that the electric potential of the guide roller is transmitted to the second contact element. Additionally, a substrate treatment apparatus comprising such transport device is disclosed. | 01-15-2009 |
| 20090095215 | TRANSPORT APPARATUS FOR ELONGATE SUBSTRATES - In a transport device for elongated substrates, especially in hot processes, which includes an essentially rectangular frame, formed by longitudinal and transverse spars connected to each other, in which at least three transverse spars are provided between two longitudinal spars, at least one transverse spar is made from a material, whose heat expansion coefficient differs from the heat expansion coefficient of the material of the other transverse spars or/and at least one transverse spar is connected force-free to at least one transverse support or/and at least one transverse spar is formed from an open profile. | 04-16-2009 |
| 20090168837 | METHOD FOR THE TEMPERATURE MEASUREMENT OF SUBSTRATES, AND VACUUM PROCESSING APPARATUS - A method for measuring the temperature of substrates to be coated is disclosed. The substrates have an opening or a cavity, and the substrates are successively moved past a source of coating material. At least one substrate's temperature is measured during coating by at least one temperature sensor and the measured temperature value is transmitted to a measuring device. The temperature sensor is disposed inside the substrate's opening or cavity so as to prevent coating of the temperature sensor. | 07-02-2009 |
| 20090173280 | VACUUM COATING SYSTEM COMPRISING A TRANSPORT UNIT FOR TRANSPORTING SUBSTRATES - A vacuum coating unit with a transport device for transporting substrates in a transport direction, comprises at least one first endless conveyor running in the transport direction and having a conveyor device guided around at least two deflection rollers. The conveyor device is located at a distance from a guide device extending in the transport direction parallel to the conveyor device of the first endless conveyor in such a way that the substrates can be introduced into the gap between the conveyor device and the guide device and can be moved in the transport direction by the displacement of the conveyor device. | 07-09-2009 |
| 20100178151 | METHOD FOR LOADING AND UNLOADING A TRANSPORT DEVICE - A transport device for transporting elongated substrates through a vacuum coating system comprises an essentially rectangular frame and two groups of holding elements, which are rotatably mounted on opposite sides of the frame in such a manner that any pair of opposite holding elements can be connected to both ends of a substrate. Furthermore, at least one retainer bar is provided that is operatively connected to a group of holding elements in such a manner that the holding elements of this group are moveable in order to increase or decrease by choice their distance from the holding elements of the other group. Also provided are a loading and unloading device for loading and unloading the transport device, and a method for loading and unloading the transport device. | 07-15-2010 |
| 20100230275 | METHOD AND ARRANGEMENT FOR REDUNDANT ANODE SPUTTERING HAVING A DUAL ANODE ARRANGEMENT - In a method in which two anodes are operated alternately opposite each other as plasma discharge anodes and as cathodes for self-cleaning, and the cathodes of the plasma discharge are recurrently briefly reversed in polarity, and an arrangement comprising a cathode and a first and a second anode supplied with voltage by an H-bridge circuit, pole reversal of cathode voltage is effected by a pulse current supply, at least one anode is maintained at positive potential at all times and the other anode intermittently at negative potential during an etching time, and the H-bridge circuit is operationally connected to the pulse current supply, such that at least one anode is at positive potential at all times. | 09-16-2010 |
