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Hata
Akiko Hata, Winchester, MA US
| Patent application number | Description | Published |
|---|---|---|
| 20110152352 | SMAD PROTEINS CONTROL DROSHA-MEDIATED MIRNA MATURATION - The invention, in some aspects, relates to compositions and methods useful for modulating expression of miRNAs that are regulated by the TGF-β/BMP signaling pathway. In some aspects, the invention relates, to oligonucleotides comprising a CAGRN-motif that modulate expression of miRNAs that are regulated by TGF-β/BMP signaling pathway. The invention, in some aspects, relates to composition and methods useful for inhibiting microRNA processing. In some aspects, the invention relates to composition and methods for treating TGF-Beta/BMP mediated disorders. | 06-23-2011 |
Kazuaki Hata, Daito-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20120105682 | IMAGE PICKUP APPARATUS GENERATING COMPOSITE IMAGE - Provided is an image pickup apparatus wherein an image pickup unit executes image pickup processing a plurality of times in relation to movement of the image pickup surface to generate a composite image. In the image pickup apparatus, first information for guiding a direction in which the image pickup surface should be moved and second information for indicating the direction and amount that the image pickup surface has been moved during processing for generating a composite image are displayed on a display unit. | 05-03-2012 |
Kazuhiro Hata, Shiga JP
| Patent application number | Description | Published |
|---|---|---|
| 20120092547 | OPTICAL SYSTEM DRIVE DEVICE, IMAGE CAPTURE DEVICE PROVIDED WITH OPTICAL SYSTEM DRIVE DEVICE, AND MOBILE DEVICE MOUNTED WITH IMAGE CAPTURE DEVICE - An optical system drive device, an image capture device, and a mobile device of the invention includes: an optical system; a urging member; a shape-memory alloy actuator; a current applying section for supplying a current to the actuator; a measurement section for measuring a characteristic value of the actuator; a driving control section for controlling the supply current to the current applying section according to the characteristic value measured by the measurement section; and a signal output section for outputting prescribed signal to the driving control section when the characteristic value of the actuator measured by the measurement section reaches a value corresponding to a target position of the optical system while making the shape-memory alloy of the actuator change the length at least in an extending mode when moving the optical system to the target position. | 04-19-2012 |
Masahiro Hata, Aichi JP
| Patent application number | Description | Published |
|---|---|---|
| 20120088103 | CARBON FIBER BUNDLE THAT DEVELOPS HIGH MECHANICAL PERFORMANCE - Provided is a carbon fiber bundle for obtaining a fiber-reinforced resin having high mechanical characteristics. A carbon fiber bundle formed of single carbon fibers, each of which has no uneven surface structure of 0.6 μm or more in length extending in the longitudinal direction of the single fiber; which has an uneven structure having a difference in height (Rp−v) of 5 to 25 nm between the highest portion and the lowest portion of the surface of the single fiber and having an average roughness Ra of 2 to 6 nm; and which has a ratio of the major axis to the minor axis (major axis/minor axis) of a cross-section of the single fiber of 1.00 to 1.01, wherein a mass of the single fiber per unit length falls within the range of 0.030 to 0.042 mg/m; a strand strength is 5900 MPa or more; a strand elastic modulus measured by the ASTM method is 250 to 380 GPa; and a knot tenacity is 900 N/mm | 04-12-2012 |
| 20120088104 | ACRYLONITRILE SWOLLEN FIBER FOR CARBON FIBER, PRECURSOR FIBER BUNDLE, STABILIZED FIBER BUNDLE, CARBON FIBER BUNDLE AND PRODUCTION METHODS THEREOF - Provided is a carbon fiber bundle for obtaining a fiber-reinforced plastic having high mechanical characteristics. An acrylonitrile swollen fiber for a carbon fiber having openings of 10 nm or more in width in the circumference direction of the swollen fiber at a ratio in the range of 0.3 openings/μm | 04-12-2012 |
Masakatsu Hata, Aichi-Ken JP
| Patent application number | Description | Published |
|---|---|---|
| 20120080045 | HAIR-TREATMENT COMPOSITION AND HAIR-TREATMENT METHOD USING SAME - Provided is a hair-treatment composition containing an amphoteric surfactant having a structure represented by general formula (1) below, and a sugar nonionic surfactant. | 04-05-2012 |
Masakatsu Hata, Aichen-Ken JP
| Patent application number | Description | Published |
|---|---|---|
| 20120100091 | HAIR-TREATMENT COMPOSITION AND HAIR-TREATMENT METHOD USING SAME - Provided is a hair-treatment composition containing: a first amphoteric surfactant having a structure represented by general formula (1) below; at least one type of second amphoteric surfactant selected from the group consisting of fatty acid amide propyldimethylaminoacetic acid betaines, alkyldimethylaminoacetic acid betaines, N-acylaminoethyl-N-2-hydroxyethylaminocarboxylic acid salts and N-acylaminoethyl-N-carboxymethoxyethylaminocarboxylic acid salts fatty acid amide propyldimethylaminoacetic acid betaines, alkyldimethylaminoacetic acid betaines; and an acidic amino acid. In general formula (1), R | 04-26-2012 |
Mitsuhiro Hata, Delmar, NY US
| Patent application number | Description | Published |
|---|---|---|
| 20110065040 | PHOTORESIST COMPOSITION - The present invention provides a photoresist composition comprising a resin, an acid generator and a compound represented by the formula (I): | 03-17-2011 |
| 20110065047 | PHOTORESIST COMPOSITION - The present invention provides a photoresist composition comprising a resin, an acid generator and a compound represented by the formula (I): | 03-17-2011 |
| 20110091818 | PROCESS FOR PRODUCING PHOTORESIST PATTERN - The present invention provides a process for producing a photoresist pattern comprising the following steps (1) to (11): | 04-21-2011 |
| 20110091820 | RESIST PROCESSING METHOD - A resist processing method has: ( | 04-21-2011 |
| 20110123926 | PHOTORESIST COMPOSITION - The present invention provides a photoresist composition comprising a resin, an acid generator and a compound represented by the formula (C1): | 05-26-2011 |
| 20110165521 | PROCESS FOR PRODUCING PHOTORESIST PATTERN - Process for producing a photoresist pattern containing the steps: (A) applying a first photoresist composition containing a resin having a structural unit containing an acid-labile group in its side chain, an acid generator and a cross-linking agent on a substrate to form a first photoresist film, exposing the film to radiation followed by developing the film, to form a first photoresist pattern; (B) making the first photoresist pattern inactive to radiation, insoluble in an alkaline developer or insoluble in a second photoresist composition in step (C); (C) applying a second photoresist composition containing a resin having a structural unit containing an acid-labile group in its side chain and at least one acid generator of formula (I) or (II) defined in the specification, on the first photoresist pattern, to form a second photoresist film, exposing the film to radiation; and (D) developing the exposed film, to form a second photoresist pattern. | 07-07-2011 |
| 20110171586 | RESIST PROCESSING METHOD - A resist processing method having the steps of: (1) forming a first resist film by applying a first resist composition comprising: a resin (A) having an acid-labile group, being insoluble or poorly soluble in alkali aqueous solution, and being rendered soluble in alkali aqueous solution through the action of an acid, a photo acid generator (B) and a cross-linking agent (C) onto a substrate and drying; (2) prebaking the first resist film; (3) exposing to a whole surface of the first resist film, and then exposing the first resist film through a mask; (4) post-exposure baking of the first resist film; (5) developing with a first alkali developer to obtain a first resist pattern; (6) hard-baking the first resist pattern, (7) obtaining a second resist film by applying a second resist composition onto the first resist pattern, and then drying; (8) pre baking the second resist film; (9) exposing the second resist film through a mask; (10) post-exposure baking the second resist film; and (11) developing with a second alkali developer to obtain a second resist pattern. | 07-14-2011 |
| 20110183264 | RESIST PROCESSING METHOD AND USE OF POSITIVE TYPE RESIST COMPOSITION - A resist processing method has the steps of: (1) forming a first resist film by applying a first resist composition comprising: a resin (A) including a structural unit represented by the formula (XX), and having an acid-labile group, being insoluble or poorly soluble in alkali aqueous solution, and being rendered soluble in alkali aqueous solution through the action of an acid, and a photo acid generator (B) onto a substrate and drying; (2) prebaking the first resist film; (3) exposing the first resist film; (4) post-exposure baking of the first resist film; (5) developing with a first alkali developer to obtain a first resist pattern; (6) hard-baking the first resist pattern, (7) obtaining a second resist film by applying a second resist composition onto the first resist pattern, and then drying; (8) pre-baking the second resist film; (9) exposing the second resist film; (10) post-exposure baking the second resist film; and (11) developing with a second alkali developer to obtain a second resist pattern. | 07-28-2011 |
| 20110189618 | RESIST PROCESSING METHOD - A resist processing method comprises the steps of: (1) forming a first resist film by applying a first resist composition comprising: a resin (A) having an acid-labile group, being insoluble or poorly soluble in alkali aqueous solution, and being rendered soluble in alkali aqueous solution through the action of an acid, a photo acid generator (B), a cross-linking agent (C) and an acid amplifier (D) onto a substrate and drying; (2) prebaking the first resist film; (3) exposing to the first resist film; (4) post-exposure baking of the first resist film; (5) developing with a first alkali developer to obtain a first resist pattern; (6) hard-baking the first resist pattern, (7) obtaining a second resist film by applying a second resist composition onto the first resist pattern, and drying; (8) pre-baking the second resist film; (9) exposing the second resist film; (10) post-exposure baking the second resist film; and (11) developing with a second alkali developer to obtain a second resist pattern. | 08-04-2011 |
Mitsuhiro Hata, Gyeonggi-Do KR
| Patent application number | Description | Published |
|---|---|---|
| 20090263732 | MASK PATTERNS INCLUDING GEL LAYERS FOR SEMICONDUCTOR DEVICE FABRICATION - Mask patterns include a resist pattern and a gel layer on a surface of the resist pattern having a junction including hydrogen bonds between a proton donor polymer and a proton acceptor polymer. Methods of forming the mask patterns and methods of fabricating a semiconductor device using the mask patterns as etching masks are also provided. | 10-22-2009 |
Mitsuhiro Hata, Suwon-Si KR
| Patent application number | Description | Published |
|---|---|---|
| 20080305638 | Coating compositions for use in forming patterns and methods of forming patterns - A coating composition for forming etch mask patterns may include a polymer and an organic solvent. The polymer may have an aromatic ring substituted by a vinyl ether functional group. The polymer may be, for example, a Novolak resin partially substituted by a vinyl ether functional group or poly(hydroxystyrene) partially substituted by a vinyl ether functional group. | 12-11-2008 |
Mitsuhiro Hata, Mamaroneck, NY US
| Patent application number | Description | Published |
|---|---|---|
| 20120028188 | PHOTORESIST COMPOSITION - The present invention provides a photoresist composition comprising | 02-02-2012 |
Naoya Hata, Kariya-City JP
| Patent application number | Description | Published |
|---|---|---|
| 20120070711 | BATTERY PACK WITH COOLING PASSAGE - A battery pack includes battery modules each having a battery cell and a battery case housing the battery cell therein. The battery modules are stacked in a stacking direction so that a cooling passage for allowing a cooling medium to flow is defined between opposed surfaces of adjacent battery cases. One of the opposed surfaces has first ribs projecting toward the other of the opposed surfaces and extending parallel to each other along the one. The other of the opposed surfaces has second ribs projecting toward the one of the opposed surfaces and extending parallel to each other along the other. In the cooling passage, the first ribs and the second ribs intersect each other and end portions of the first ribs and end portions of the second ribs are in contact with each other in the stacking direction. | 03-22-2012 |
Yohsuke Hata, Nagoya-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20120107010 | IMAGE FORMING APPARATUS - An image forming apparatus includes: a first process unit and a second process unit arranged in parallel and each having a photosensitive drum configured to form an electrostatic latent image by an exposure and a charging device configured to charge the photosensitive drum; an exposing unit disposed between the first process unit and the second process unit and configured to expose the photosensitive drum of the second process unit; a first flow channel formed between the first process unit and the exposing unit for supplying air to the charging device of the second process unit; and a second flow channel formed in the first process unit and having an outlet for supplying the air to the charging device of the second process unit. | 05-03-2012 |
Yoshihiko Hata, Kouka-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20120094067 | MOISTURE-PERMEABLE WATER-PROOF SHEET FOR BUIILDING MATERIALS - The present invention provides a moisture-permeable waterproof sheet for building materials capable of maintaining an excellent nail hole sealing performance to keep waterproof thereof even after being exposed to severe environmental conditions. The moisture-permeable waterproof sheet 1 for building materials of this invention includes a non-woven fabric layer 2 having a bulk density of 0.01 g/cm | 04-19-2012 |
Yuji Hata, Odawara JP
| Patent application number | Description | Published |
|---|---|---|
| 20120127600 | STORAGE CONTROL DEVICE AND ROTATION SPEED CONTROL METHOD FOR STORAGE DEVICE - To provide a storage control device capable of changing the rotation speed of storage devices. | 05-24-2012 |