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Hasegawa, Utsunomiya-Shi
Masanobu Hasegawa, Utsunomiya-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20090213389 | WAVEFRONT ABERRATION MEASURING METHOD, MASK, WAVEFRONT ABERRATION MEASURING DEVICE, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD - A wavefront aberration measuring device includes a mask placed in an object plane of a to-be-tested optical system and having a pattern including a pinhole producing a spherical wave and adjoining diffraction gratings each ruled with lines oriented in a direction different from the other; an illumination optical system that illuminates an area of the mask with light emitted from a light source; a light splitter that splits the light from the pattern transmitted through the to-be-tested optical system; an image pickup unit that takes an image of interference fringes produced by the split light, the image being used in measuring wavefront aberration of the to-be-tested optical system; a detector that detects respective light quantities of respective diffracted beams from the respective illuminated diffraction gratings; and a control unit that controls alignment of the illuminated area of the mask and the pattern in accordance with a detection result. | 08-27-2009 |
Noriyasu Hasegawa, Utsunomiya-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20080198346 | EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING DEVICE - An exposure apparatus, exposing a substrate via liquid, includes a projection optical system that projects a pattern of an original onto the substrate and a substrate stage that holds and moves the substrate. The substrate stage includes a chuck that holds the substrate, a top plate that surrounds the substrate held by the chuck, and a draining mechanism that drains liquid on the top plate. The top plate has a first area and a second area on the surface of the top plate. At least part of the first area is formed between the substrate held by the chuck and the second area. The contact angle of the first area with the liquid is smaller than the contact angle of the second area with the liquid. The draining mechanism drains liquid on the first area. | 08-21-2008 |
| 20090122283 | EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD - An exposure apparatus ( | 05-14-2009 |
| 20100141911 | EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD - An exposure apparatus, exposing a substrate via liquid so as to transfer a pattern of a mask onto the substrate, includes a stage configured to move while holding the substrate. The stage includes a substrate supporting portion on which the substrate is disposed, a supporting surface disposed outside the substrate supporting portion configured to support the liquid together with the substrate, and a frame portion formed so as to surround the supporting surface. The frame portion includes a depression and a member whose top surface is located in a plane including the supporting surface. | 06-10-2010 |
Saori Hasegawa, Utsunomiya-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20100141958 | SHAPE CALCULATION METHOD - A method for calculating a shape includes dividing an aspherical test surface into a plurality of measurement regions configured to overlap with one another, receiving, at a light receiving unit, interference fringes which occur due to interference light generated by light reflected on a reference surface serving as a reference for calculating a shape of the test surface and light reflected by each of the measurement regions, and calculating surface shapes of the measurement regions, and calculating a shape of the test surface by joining the calculated surface shapes, wherein the calculation of surface shapes includes adjusting relative positions of the test surface and the reference surface and adjusting a position of the light receiving unit so that the test surface and the light receiving unit have a conjugate relationship with each other in a state in which the position of the test surface is adjusted. | 06-10-2010 |
Tomoki Hasegawa, Utsunomiya-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20090219635 | LENS DRIVING DEVICE, LENS BARREL, OPTICAL APPARATUS, AND METHOD FOR ASSEMBLING LENS DRIVING DEVICE - A lens driving device is provided that moves a lens support frame in an optical-axis direction through a rack engaging with a feed screw functioning as an output shaft of a driving unit. The rack includes a main rack tooth engaging with the feed screw and a pressing portion facing and elastically holding the feed screw through an urging portion. The pressing portion includes a guiding section for guiding a pressing tooth of the pressing portion to a predetermined regular engagement position in incorporating the feed screw even when the pressing tooth facing and holding the feed screw in the rack of the lens driving device is inclined inward. | 09-03-2009 |
| 20100182696 | LENS BARREL AND OPTICAL APPARATUS INCLUDING THE SAME - The lens barrel has an image blur correction function for correcting an image blur, including: a movable member movable in a direction orthogonal to an optical axis while holding a lens and a driving magnet; and a fixed member for positioning the movable member in an optical axis direction and holding a driving coil and a magnetic member, in which: the driving magnet and the magnetic member constitute a driving portion for moving the movable member in the direction orthogonal to the optical axis; and in a plane orthogonal to the optical axis, a width of the magnetic member in a direction orthogonal to a direction of driving the movable member is larger than a width of the driving magnet in the direction orthogonal to the direction of driving the movable member. | 07-22-2010 |
| 20110091198 | APERTURE UNIT AND LENS BARREL INCLUDING THE SAME - An aperture unit includes three or more diaphragm blades, a base plate that supports the diaphragm blades, a drive lever connected to the diaphragm blades, and an aperture motor that rotates the drive lever, wherein, in a range from a reference aperture value to a specific aperture value, a polygonal aperture is formed by aperture edges of two or more of the three or more diaphragm blades that linearly move in a first direction and an aperture edge of at least one of the three or more diaphragm blades that linearly moves in a second direction opposite to the first direction, and wherein, in a range from the specific aperture value to a closed aperture state, an aperture is formed by aperture edges of two diaphragm blades that move in opposite directions. | 04-21-2011 |
Yasuo Hasegawa, Utsunomiya-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20080259307 | EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD - A scanning exposure apparatus which exposes a substrate is disclosed. The apparatus comprises an illumination system configured to illuminate an illumination region of an original, a projection optical system configured to project a pattern of the original onto the substrate, and a stop configured to shield a flare generating component of flare light which travels from the projection optical system to the substrate, and to pass the remaining component of the flare light. An aperture of the stop has a shape different from a shape of the illumination region, and the aperture of the stop includes a portion whose dimension in a first direction parallel to a scanning direction of the substrate changes in accordance with a distance from the center of the aperture in a second direction perpendicular to the first direction. | 10-23-2008 |