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Harumoto
Akiko Harumoto, Kamigyo-Ku JP
| Patent application number | Description | Published |
|---|---|---|
| 20100081097 | SUBSTRATE PROCESSING APPARATUS - A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block, a cleaning/drying processing block and an interface block. These blocks are arranged in the substrate processing apparatus in the above order. An exposure device is arranged adjacent to the interface block of the substrate processing apparatus. A hydrophobic processing unit is arranged in the resist cover film processing block and applies hydrophobic processing to the substrate before exposure processing. | 04-01-2010 |
Hideaki Harumoto, Yokohama-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20100020088 | GRAPHICS RENDERING DEVICE AND GRAPHICS RENDERING METHOD - When moving images such as three-dimensional graphics, or the like are displayed, high-quality images can be displayed by keeping a display frame rate, suppressing a breakdown of display contents, and making a drawing engine exhibit processing abilities to maximum. A graphics rendering device includes a frame buffer | 01-28-2010 |
Katsumi Harumoto, Saitama-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20090035010 | TONER CONTAINER AND TONER FILLING METHOD - A toner container which is mountable and removable at a main body of an image forming apparatus, the toner container comprising: at least one toner filling port provided in a casing body of the toner container; and a sealing member which covers the toner filling port and a predetermined range of surroundings of the toner filling port, from an outer side of the casing body, for sealing toner inside the casing body, is provided. | 02-05-2009 |
Koki Harumoto, Tokyo JP
| Patent application number | Description | Published |
|---|---|---|
| 20120033181 | FUNDUS OBSERVATION APPARATUS - The fundus observation apparatus | 02-09-2012 |
Masahiko Harumoto, Shimogyo-Ku JP
| Patent application number | Description | Published |
|---|---|---|
| 20080203058 | SUBSTRATE DEVELOPING METHOD AND DEVELOPING APPARATUS - A method for developing a substrate includes a developing step for supplying a developer to the substrate, and a neutralizing and removing step for supplying a treating solution containing a neutralizing material to the substrate to neutralize the developer, and neutralizing the developer and removing the developer from the substrate. In the neutralizing and removing step, the developer is neutralized by the treating solution. This neutralization reaction forms a product (salt) which easily melts into the treating solution and does not precipitate. Thus, the product is removable from the substrate along with the treating solution. Therefore, the developer is inhibited from remaining on the substrate. As a result, it is possible to prevent post-develop defects due to “residues of the developer” or the developer remaining on the substrate. | 08-28-2008 |
Masahiko Harumoto, Kyoto JP
| Patent application number | Description | Published |
|---|---|---|
| 20090103960 | DEVELOPING APPARATUS - A developing apparatus disclosed includes a spin chuck for spinnably holding a substrate, a developer nozzle having a plurality of exhaust ports arranged in a row for discharging a developer, the developer nozzle causing the developer discharged from the exhaust ports to impinge in separate streams on the substrate, a horizontal movement mechanism for moving the developer nozzle in one direction extending to the center of the substrate in plan view while maintaining a direction of arrangement of the exhaust ports in the one direction, thereby to move the developer nozzle between substantially the center and an edge of the substrate in plan view, and a controller for controlling the spin chuck and horizontal movement mechanism to cause the separate streams of the developer discharged from the exhaust ports to impinge spirally on the substrate, thereby to develop the substrate. | 04-23-2009 |
| 20120122038 | DEVELOPING APPARATUS - A method for developing a substrate includes spinning the substrate with a spin holder and discharging a developer to the substrate from a plurality of exhaust ports arranged in a row on a developer feeder. The method also includes causing a moving mechanism to move said developer feeder in one direction extending to a center of the substrate in plan view while maintaining a direction of arrangement of said exhaust ports in said one direction, thereby to move said developer feeder between substantially the center and an edge of the substrate. The method further includes causing the developer discharged from said exhaust ports to impinge in separate streams on the substrate, and causing each of the separate streams to impinge spirally on the substrate, thereby to develop the substrate. At least two of loci of positions of impingement of the developer corresponding to said exhaust ports overlap each other. | 05-17-2012 |
Masahiko Harumoto, Kyoto-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20120006361 | SUBSTRATE CLEANING METHOD AND SUBSTRATE CLEANING DEVICE - A substrate rotates, and a liquid nozzle of a gas/liquid supply nozzle moves to a position above the center of the rotating substrate. In this state, a rinse liquid is discharged from the liquid nozzle onto the rotating substrate. The gas/liquid supply nozzle moves toward a position outside the substrate. A gas nozzle reaches the position above the center of the rotating substrate, so that the gas/liquid supply nozzle temporarily stops. With the gas/liquid supply nozzle stopping, an inert gas is discharged onto the center of the rotating substrate for a given period of time. After that, the gas/liquid supply nozzle again moves toward the position outside the substrate. | 01-12-2012 |
| 20120213501 | APPARATUS FOR AND METHOD OF HEAT-TREATING FILM FORMED ON SURFACE OF SUBSTRATE - The back surface of a substrate having a front surface coated with a resist film is irradiated with flashes of light emitted from flash lamps. Heat conduction from the back surface of the substrate abruptly raised in temperature by the irradiation with flashes of light toward the front surface thereof occurs to heat the resist film formed on the front surface of the substrate, so that a post-applied bake process is performed. After the completion of the post-applied bake process, a cooling plate cools down the substrate. Regardless of the type of resist film formed on the front surface of the substrate, the substrate has a constant absorptance of flashes of light to allow the resist film to be heated to a constant treatment temperature, because the back surface of the substrate is irradiated with flashes of light. | 08-23-2012 |
Michiko Harumoto, Yokohama-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20120328238 | OPTICAL DEVICE - An optical device which reduces coupling loss while improving practicality is provided. A multi-core fiber coupling device is an optical device which couples a multi-core fiber to single core fibers, and includes a first optical system which is located on optical axes of a plurality of beams emitted from the multi-core fiber, and which makes the optical axes of the respective beams non-parallel to each other, thereby making the beams in a state of being separated from each other, and a second optical system S | 12-27-2012 |
Yoshiyuki Harumoto, Osaka JP
| Patent application number | Description | Published |
|---|---|---|
| 20120104406 | THIN-FILM TRANSISTOR, DISPLAY DEVICE, AND MANUFACTURING METHOD FOR THIN-FILM TRANSISTORS - Disclosed is a high-quality, efficiently manufacturable thin film transistor in which leakage current is minimized. The thin film transistor is provided with a semiconductor layer ( | 05-03-2012 |
Yoshiyuki Harumoto, Osaka-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20120001190 | THIN FILM TRANSISTOR AND METHOD OF FABRICATING SAME - The invention provides a thin film transistor that can improve its operating speed by improving crystallinity near a bottom surface of a channel layer. Of laser light irradiated onto an amorphous silicon layer, light transmitted through the amorphous silicon layer is absorbed by a gate electrode | 01-05-2012 |
| 20120091452 | OXIDE SEMICONDUCTOR, THIN FILM TRANSISTOR ARRAY SUBSTRATE AND PRODUCTION METHOD THEREOF, AND DISPLAY DEVICE - The present invention provides an oxide semiconductor capable of achieving a thin film transistor having stable transistor characteristics, a thin film transistor having a channel layer formed of the oxide semiconductor and a production method thereof, and a display device equipped with the thin film transistor. The oxide semiconductor of the present invention is an oxide semiconductor for a thin film transistor. The oxide semiconductor includes indium, gallium, zinc, and oxygen as constituent atoms, and the oxygen content of the oxide semiconductor is 87% to 95% of the stoichiometric condition set as 100%, in terms of atomic units. | 04-19-2012 |
| 20120138923 | THIN FILM TRANSISTOR, METHOD FOR MANUFACTURING SAME, ACTIVE MATRIX SUBSTRATE, DISPLAY PANEL AND DISPLAY DEVICE - The present invention provides a thin film transistor including an oxide semiconductor layer ( | 06-07-2012 |
| 20120218485 | ACTIVE MATRIX SUBSTRATE AND LIQUID CRYSTAL DISPLAY PANEL INCLUDING THE SAME, AND METHOD FOR MANUFACTURING ACTIVE MATRIX SUBSTRATE - An active matrix substrate includes a plurality of pixels arranged in a matrix, a plurality of capacitor lines ( | 08-30-2012 |
| 20120228621 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE, AND DISPLAY DEVICE - An object of this invention is to provide a semiconductor device in which TFTs with high mobility are arranged in both of display and peripheral circuit areas. A semiconductor device fabricating method according to the present invention includes the steps of: irradiating an amorphous silicon layer ( | 09-13-2012 |
| 20120241750 | SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING SAME - A semiconductor device includes: a thin film transistor having a gate line ( | 09-27-2012 |
| 20120326144 | THIN FILM TRANSISTOR SUBSTRATE AND METHOD FOR MANUFACTURING SAME - A method includes: a step of forming a gate electrode ( | 12-27-2012 |