Patent application number | Description | Published |
20090015951 | PROJECTION OBJECTIVE AND METHOD FOR ITS MANUFACTURE - A method of manufacturing a projection objective ( | 01-15-2009 |
20100007866 | METHOD FOR PRODUCING FACET MIRRORS AND PROJECTION EXPOSURE APPARATUS - The disclosure relates to methods for producing mirrors, in particular facet mirrors, and projection exposure apparatuses equipped with the mirrors. | 01-14-2010 |
20100067653 | OPTICAL ELEMENT FOR RADIATION IN THE EUV AND/OR SOFT X-RAY REGION AND AN OPTICAL SYSTEM WITH AT LEAST ONE OPTICAL ELEMENT - An optical element, especially a normal-incidence collector mirror, for radiation in the EUV and/or soft X-ray region of wavelengths is described. The element has a substrate, a multilayer coating with an optically active region, and a capacitor, having a first and a second capacitor electrode. At least one layer of the multilayer coating serves as the first capacitor electrode. At least one dielectric layer is provided between the two capacitor electrodes. Also described is an optical system with at least one optical element, having a first electrode arranged in the vicinity of the optical element. | 03-18-2010 |
20100265481 | IMAGING OPTICAL SYSTEM AND PROJECTION EXPOSURE INSTALLATION - An imaging optical system has a plurality of mirrors. These image an object field in an object plane into an image field in an image plane. In the imaging optical system, the ratio of a maximum angle of incidence of imaging light) on reflection surfaces of the mirrors and an image-side numerical aperture of the imaging optical system is less than 33.8°. This can result in an imaging optical system which offers good conditions for a reflective coating of the mirror, with which a low reflection loss can be achieved for imaging light when passing through the imaging optical system, in particular even at wavelengths in the EUV range of less than 10 nm. | 10-21-2010 |
20110122392 | MICROLITHOGRAPHY ILLUMINATION SYSTEM AND MICROLITHOGRAPHY ILLUMINATION OPTICAL UNIT - An illumination optical unit for microlithography illuminates an object field with illumination light. The unit includes a first facet mirror that has a plurality of first facets, and a second facet mirror that has a plurality of second facets. The unit has facet pairs which include respectively a facet of the first facet mirror and a facet of the second facet mirror which predefine a plurality of illumination channels for illuminating the object field. At least some of the illumination channels have in each case an assigned polarization element for predefining an individual polarization state of the illumination light guided in the respective illumination channel. | 05-26-2011 |
20110222144 | METHOD FOR PRODUCING A MULTILAYER COATING, OPTICAL ELEMENT AND OPTICAL ARRANGEMENT - A method for producing a multilayer coating ( | 09-15-2011 |
20120229784 | MIRROR FOR USE IN A MICROLITHOGRAPHY PROJECTION EXPOSURE APPARATUS - A mirror including a substrate and a reflective coating that includes a first group of layers and a second group of layers arranged between the substrate and the first group of layers. Both the first and second groups of layers include a plurality of alternating first material layers and second material layers, arranged one above another. The refractive index of the first material for radiation in the range of 5-30 nm is greater than the refractive index of the second material in that wavelength range. The first group of layers is configured to have a number of layers that is greater than 20, such that, upon irradiation with radiation having a wavelength in the range of 5-30 nm, less than 20% of the radiation reaches the second group of layers, which has a layer thickness variation for correcting the surface form of the mirror. | 09-13-2012 |
20130100426 | METHOD FOR PRODUCING FACET MIRRORS AND PROJECTION EXPOSURE APPARATUS - The disclosure relates to methods for producing mirrors, in particular facet mirrors, and projection exposure apparatuses equipped with the mirrors. | 04-25-2013 |
20130242278 | Projection objective of a microlithographic projection exposure apparatus designed forEUV and a method of optically adjusting a projection objective - The invention concerns a projection objective of a microlithographic projection exposure apparatus designed for EUV, for imaging an object plane illuminated in operation of the projection exposure apparatus into an image plane, wherein the projection objective has at least one mirror segment arrangement ( | 09-19-2013 |
20140022525 | Deflection Mirror and Projection Exposure Apparatus for Microlithography Comprising Such a Deflection Mirror - A deflection mirror ( | 01-23-2014 |
20140132941 | IMAGING OPTICAL SYSTEM AND PROJECTION EXPOSURE SYSTEM INCLUDING THE SAME - An imaging optical system has a plurality of mirrors. These image an object field in an object plane into an image field in an image plane. In the imaging optical system, the ratio of a maximum angle of incidence of imaging light) on reflection surfaces of the mirrors and an image-side numerical aperture of the imaging optical system is less than 33.8°. This can result in an imaging optical system which offers good conditions for a reflective coating of the mirror, with which a low reflection loss can be achieved for imaging light when passing through the imaging optical system, in particular even at wavelengths in the EUV range of less than 10 nm. | 05-15-2014 |