Patent application number | Description | Published |
20120104289 | DROPLET GENERATION AND DETECTION DEVICE, AND DROPLET CONTROL DEVICE - A droplet generation and detection device may include: a droplet generation unit for outputting a charged droplet; at least one droplet sensor including a magnetic circuit including a coil configured of an electrically conductive material, the magnetic circuit being disposed such that the charged droplet passes around the magnetic circuit, and a current detection unit for detecting current flowing in the coil and outputting a detection signal; and a signal processing circuit for detecting the charged droplet based on the detection signal. | 05-03-2012 |
20120236273 | TARGET SUPPLY UNIT - A target supply unit may include: a reservoir for storing a target material; a heater provided inside the reservoir for heating the target material stored in the reservoir; a heater power supply for supplying current to the heater; and a target outlet for outputting the target material stored inside the reservoir. | 09-20-2012 |
20120236894 | WAVELENGTH CONVERSION DEVICE, SOLID-STATE LASER APPARATUS, AND LASER SYSTEM - A wavelength conversion device in this disclosure may include: a nonlinear crystal including a first surface; a first film to be joined to the first surface and including at least one layer; and a first prism to be joined to the first film. | 09-20-2012 |
20120241650 | TARGET SUPPLY UNIT AND EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS - A target supply unit may include: a target storage unit for storing a target material thereinside; a target output unit having a through-hole formed therein, through which the target material stored inside the target storage unit is outputted; an electrode having a through-hole formed therein arranged to face the target output unit, the electrode being coated with an electrically conductive material at least on a part of a surface facing the target output unit; and a voltage generator for applying a voltage between the target material and the electrode. | 09-27-2012 |
20120307851 | SYSTEM AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT - A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light. | 12-06-2012 |
20130048878 | TARGET SUPPLY UNIT - A target supply unit includes a nozzle unit having a through-hole to allow a target material to be outputted therethrough. A cover is provided to cover the nozzle unit, the cover having a through-hole to allow the target material to pass therethrough. A discharge device is included to pump out gas inside a space defined by the cover. | 02-28-2013 |
20130126751 | OPTICAL DEVICE, LASER APPARATUS, AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - An optical device may include: a first beam shaping unit configured to transform a first laser beam incident thereon into a second laser beam having an annular cross section; and a first focusing optical element for focusing the second laser beam in a first predetermined location so as to generate a Bessel beam. | 05-23-2013 |
20130208742 | OPTICAL DEVICE, LASER APPARATUS, AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - An optical device may include: an optical module disposed in a beam delivery path of a laser beam; a beam adjusting unit disposed in the beam delivery path for adjusting the beam delivery path of the laser beam; a measuring unit disposed in the beam delivery path for detecting the beam delivery path; and a control unit for controlling the beam adjusting unit based on a detection result of the beam delivery path of the laser beam detected by the measuring unit. | 08-15-2013 |
20130228695 | DEVICE FOR COLLECTING EXTREME ULTRAVIOLET LIGHT - A device for collecting EUV light from a plasma generation region includes first and second EUV collector mirrors. The first EUV collector mirror has a first spheroidal reflective surface and arranged such that a first focus of the first spheroidal reflective surface lies in the plasma generation region and a second focus of the first spheroidal reflective surface lies in a predetermined intermediate focus region. The second EUV collector mirror has a second spheroidal reflective surface and arranged such that a third focus of the second spheroidal reflective surface lies in the plasma generation region and a fourth focus of the second spheroidal reflective surface lies in the predetermined intermediate focus region. | 09-05-2013 |
20130228709 | TARGET SUPPLY DEVICE - A target supply device includes a reservoir for storing a liquid target material, a first electrode electrically connected to the liquid target material stored in the reservoir, a nozzle having a through-hole through which the liquid target material stored in the reservoir is discharged, a first power supply for applying a first potential to the first electrode, a circuit electrically connected to the first electrode and configured to suppress a potential variation of the first electrode, a second electrode provided to face the through-hole in the nozzle, and a second power supply for applying a second potential that is different from the first potential to the second electrode. | 09-05-2013 |
20140008552 | TARGET SUPPLY APPARATUS, CHAMBER, AND EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS - A target supply apparatus mounted in a chamber in which extreme ultraviolet light is generated by introducing a target material and a laser beam into the chamber may include a target generator having a nozzle, a first pipe configured to cover the nozzle, a cover opening provided in the first pipe to allow the target material to pass through the first pipe, and a first valve configured to open and close the cover opening. | 01-09-2014 |
20140374605 | OPTICAL DEVICE, LASER APPARATUS, AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - An optical device may include: an optical module disposed in a beam delivery path of a laser beam; a beam adjusting unit disposed in the beam delivery path for adjusting the beam delivery path of the laser beam; a measuring unit disposed in the beam delivery path for detecting the beam delivery path; and a control unit for controlling the beam adjusting unit based on a detection result of the beam delivery path of the laser beam detected by the measuring unit. | 12-25-2014 |
20150028231 | LASER APPARATUS - A laser apparatus may include a master oscillator configured to output a laser beam, at least one amplifier provided in a beam path of the laser beam, at least one saturable absorber gas cell provided downstream from the at least one amplifier and configured to contain a saturable absorber gas for absorbing a part of the laser beam, the part of the laser beam having a beam intensity equal to or lower than a predetermined beam intensity, a fan provided in the saturable absorber gas cell and configured to cause the saturable absorber gas to circulate, and a heat exchanger provided in the saturable absorber gas cell and configured to cool the saturable absorber gas. | 01-29-2015 |