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Hainz

Joachim Hainz, Aalen DE

Patent application numberDescriptionPublished
20090015812ILLUMINATION SYSTEM PARTICULARLY FOR MICROLITHOGRAPHY - There is provided an illumination system for scannertype microlithography along a scanning direction with a light source emitting a wavelength ≦193 nm. The illumination system includes a plurality of raster elements. The plurality of raster elements is imaged into an image plane of the illumination system to produce a plurality of images being partially superimposed on a field in the image plane. The field defines a non-rectangular intensity profile in the scanning direction.01-15-2009

Patent applications by Joachim Hainz, Aalen DE

Joachim Hainz, Jena DE

Patent application numberDescriptionPublished
20080225387COLLECTOR FOR ILLUMINATION SYSTEMS WITH A WAVELENGTH LESS THAN OR EQUAL TO 193 nm - Collectors are disclosed. The collectors can be for illumination systems with a wavelength ≦193 nm, including ≦126 nm, and the EUV range. The collectors can serve to receive the light rays emitted from a light source and to illuminate an area in a plane. The collectors can include at least a first mirror shell or a first shell segment as well as a second mirror shell or a second shell segment receiving the light and providing a first illumination and a second illumination in a plane which is located in the light path downstream of the collector. An illumination systems are also disclosed. The illumination systems can be equipped with a collector. Projection exposure apparatuses are also disclosed. The projection exposure apparatuses can include an illumination system. Methods for the manufacture of microstructures by photographic exposure are also disclosed.09-18-2008

Rudiger Hainz, Binzen DE

Patent application numberDescriptionPublished
20080200582High refractive index monomers, compositions and uses thereof - The invention relates to novel sulfur-containing (meth)acrylic monomers and compositions thereof characterized by a high refractive index, for optical and industrial applications. The invention also relates to a method for preparing high refractive index polymeric materials and more specifically to a method for formation of ultraviolet cast optical lenses and compositions thereof comprising the sulfur-containing (meth)acrylic monomers.08-21-2008
20110023754ISOMETRIC ISOINDOLINE YELLOW PIGMENT - Pigment of formula wherein R02-03-2011

Patent applications by Rudiger Hainz, Binzen DE

Simon Hainz, Villach AT

Patent application numberDescriptionPublished
20090190283PREDICTIVE PHASE LOCKED LOOP SYSTEM - A phase locked loop (PLL) circuit includes a first signal detector having a first input terminal configured to receive a varying first input signal, a second input terminal configured to receive a feedback signal that corresponds to the center of the input frequency, and an output terminal configured to provide an output signal corresponding to a phase difference between the first input and feedback signals. A delay estimator has an input terminal configured to receive the output signal from the first phase detector and in response thereto, output a phase difference estimation signal. A variable delay circuit has an input terminal configured to receive the phase difference estimation signal and in response thereto, phase shift the second input signal.07-30-2009
20090273341SYSTEM INCLUDING SIGNAL OFFSET ESTIMATION - A system includes a first circuit configured to convert a first analog signal to a first digital signal. The system includes a second circuit configured to determine an area of the first digital signal above a set value and an area of the first digital signal below the set value to provide a second digital signal indicating an offset of the first analog signal.11-05-2009
20090326860ROTATION SENSING METHOD AND SYSTEM - A sensing system and method. A coded wheel is configured to generate a signal that varies with rotation of the coded wheel. A sensor is configured to sense the varying signal and output a corresponding signal. A correction module is configured to receive the signal output by the sensor and compare the received signal to a stored signal and detect a defect in the coded wheel in response to the comparison.12-31-2009
20100237890SYSTEM THAT MEASURES CHARACTERISTICS OF OUTPUT SIGNAL - A system including a first circuit and a second circuit. The first circuit includes analog components configured to receive an input signal and provide an output signal based on the input signal. The second circuit is configured to measure characteristics of the output signal to test the first circuit. At least one of the output signal and another output signal is fed back to provide the input signal and generate an oscillation in the output signal.09-23-2010

Patent applications by Simon Hainz, Villach AT